The effect of various parameters on the structure of W-Ti thin films

Abstract

The properties of W-Ti thin films/coatings deposited by sputtering on various substrates have been studied. Structural analyses were made by X-ray diffraction and scanning tunneling microscopy. The results have shown that the crystal structure of W-Ti coatings has the same structure as tungsten; the presence of titanium gave rise to the expansion of the alpha-tungsten lattice. Microstructural features-grain size and morphology-mean surface roughness depend on substrate properties and thickness of the coatings. For the same thickness of deposited coatings, different inicrostructure features have been obtained as a function of substrate structure. The mean surface roughness and the grain size increase with increasing thickness of deposits on the same substrate.