TY  - CONF
AU  - Potočnik, Jelena
AU  - Božinović, Nevena
AU  - Popović, M.
AU  - Nenadović, Miloš
AU  - Novaković, Mirjana
PY  - 2023
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/11804
AB  - We have investigated the effect of thickness and deposition conditions on the structural and optical properties of nanostructured copper (Cu) thin films, deposited using e-beam glancing angle deposition. In the first series of experiments, samples were deposited in the form of helical nanostructures, to the thicknesses of 160 nm, 280 nm, 450 nm and 780 nm. The second set of the samples was fabricated in the form of zigzag and square-spiral nanostructures to a thickness of approximately 300 nm, by using different azimuthal rotations (φ = 180o, 90o, 45o, 22.5o and 11o). Field-emission scanning electron microscopy and high-resolution transmission electron microscopy were utilized to explore morphological and structural properties, while optical studies were done using spectroscopic ellipsometry. The results showed that for both series of the samples the deposited structures are porous with nanometer-sized particles. Detailed analyses of optical properties revealed that the thickness of the films had a significant impact on the dielectric function of Cu structures. With increasing the thickness from 160 nm to 780 nm the surface plasmon resonance (SPR) peak was shifted from 1.31 eV to 1.05 eV. Changes in SPR peak position were associated with the growth mechanism and the size of deposited nanostructures. For the second series of the samples, it was found that as the azimuthal rotation decreases, deposited nanostructures become more porous with larger number of grown arms. Optical analysis showed that the properties of the grown Cu films are greatly influenced by the deposition conditions. By decreasing the φ parameter, SPR peak was shifted from 1.19 eV to 0.75 eV, which can be correlated with the size distribution and agglomeration of Cu nanoparticles.
PB  - Belgrade : Vinča Institute of Nuclear Sciences
C3  - PHOTONICA2023 : 9th International School and Conference on Photonics : book of abstracts; August 28 - September 1, 2023; Belgrade
T1  - Helical and square-spiral copper nanostructures: The effect of thickness and deposition conditions on the structural and optical properties
SP  - 60
EP  - 60
UR  - https://hdl.handle.net/21.15107/rcub_vinar_11804
ER  - 

@conference{
author = "Potočnik, Jelena and Božinović, Nevena and Popović, M. and Nenadović, Miloš and Novaković, Mirjana",
year = "2023",
abstract = "We have investigated the effect of thickness and deposition conditions on the structural and optical properties of nanostructured copper (Cu) thin films, deposited using e-beam glancing angle deposition. In the first series of experiments, samples were deposited in the form of helical nanostructures, to the thicknesses of 160 nm, 280 nm, 450 nm and 780 nm. The second set of the samples was fabricated in the form of zigzag and square-spiral nanostructures to a thickness of approximately 300 nm, by using different azimuthal rotations (φ = 180o, 90o, 45o, 22.5o and 11o). Field-emission scanning electron microscopy and high-resolution transmission electron microscopy were utilized to explore morphological and structural properties, while optical studies were done using spectroscopic ellipsometry. The results showed that for both series of the samples the deposited structures are porous with nanometer-sized particles. Detailed analyses of optical properties revealed that the thickness of the films had a significant impact on the dielectric function of Cu structures. With increasing the thickness from 160 nm to 780 nm the surface plasmon resonance (SPR) peak was shifted from 1.31 eV to 1.05 eV. Changes in SPR peak position were associated with the growth mechanism and the size of deposited nanostructures. For the second series of the samples, it was found that as the azimuthal rotation decreases, deposited nanostructures become more porous with larger number of grown arms. Optical analysis showed that the properties of the grown Cu films are greatly influenced by the deposition conditions. By decreasing the φ parameter, SPR peak was shifted from 1.19 eV to 0.75 eV, which can be correlated with the size distribution and agglomeration of Cu nanoparticles.",
publisher = "Belgrade : Vinča Institute of Nuclear Sciences",
journal = "PHOTONICA2023 : 9th International School and Conference on Photonics : book of abstracts; August 28 - September 1, 2023; Belgrade",
title = "Helical and square-spiral copper nanostructures: The effect of thickness and deposition conditions on the structural and optical properties",
pages = "60-60",
url = "https://hdl.handle.net/21.15107/rcub_vinar_11804"
}

Potočnik, J., Božinović, N., Popović, M., Nenadović, M.,& Novaković, M.. (2023). Helical and square-spiral copper nanostructures: The effect of thickness and deposition conditions on the structural and optical properties. in PHOTONICA2023 : 9th International School and Conference on Photonics : book of abstracts; August 28 - September 1, 2023; Belgrade
Belgrade : Vinča Institute of Nuclear Sciences., 60-60.
https://hdl.handle.net/21.15107/rcub_vinar_11804

Potočnik J, Božinović N, Popović M, Nenadović M, Novaković M. Helical and square-spiral copper nanostructures: The effect of thickness and deposition conditions on the structural and optical properties. in PHOTONICA2023 : 9th International School and Conference on Photonics : book of abstracts; August 28 - September 1, 2023; Belgrade. 2023;:60-60.
https://hdl.handle.net/21.15107/rcub_vinar_11804 .

Potočnik, Jelena, Božinović, Nevena, Popović, M., Nenadović, Miloš, Novaković, Mirjana, "Helical and square-spiral copper nanostructures: The effect of thickness and deposition conditions on the structural and optical properties" in PHOTONICA2023 : 9th International School and Conference on Photonics : book of abstracts; August 28 - September 1, 2023; Belgrade (2023):60-60,
https://hdl.handle.net/21.15107/rcub_vinar_11804 .

TY  - CONF
AU  - Popović, M.
AU  - Novaković, Mirjana
AU  - Pjević, Dejan
AU  - Vana, D.
AU  - Jugović, Dragana
AU  - Noga, Pavol
PY  - 2023
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/11805
AB  - The ion implantation technique has a number of advantages over conventional methods for the improvement of thin films that offer the various possibilities of their use in different industrial and technological fields. Herein, we present the effects of metal ion implantation on the structural and optical properties of TiN thin films. TiN films of 170 nm thickness were grown by d.c. reactive sputtering on Si (100) wafers and then irradiated at 5×1016 ions/cm2 with either Au, Ag, or Cu ions by using two different energies per each implanted metal. The results showed that as deposited TiN crystallizes in form of fcc cubic structure, with the crystallites preferentially oriented along the (111) plane. For all implanted layers the cubic crystallographic structure was preserved, but compared to as deposited TiN the crystallites were smaller and the lattice was contracted. Besides, the surface compositional analysis of as deposited sample showed the coexistence of TiN, TiO2 and TiOxNy phases and this was related to the surface oxidation of the films due to the exposure to air. After implantation, the results were almost similar for all metals, showing an increase in TiO2 contribution and the formation of pure metallic Au and Ag phases, while copper is in the Cu2+ state, which is attributed to Cu(II)-oxide and Cu(OH)2. The microstructural characteristics including defect formation, changes in the crystallite size and lattice contraction, and also growth of different metallic phases during implantations were correlated with the findings of the optical characterization of the implanted films. For as deposited film we found energy gap of 2.91 eV, which was lower than the value typical for TiN. After implantation the gap was shifted to higher energies, while at the visible part of the region, additional energy levels, at photon energies below 2.9 eV were observed. Further, all implanted films showed degraded photocatalytic activity compared to as deposited TiN, among which Cu-implanted samples exhibited the best photocatalytic performances. The lower photocatalytic activity of Au and Ag-implanted films compared to Cu implantations was ascribed to larger structural defects and formation of less favorable electronic states.
PB  - Belgrade : Vinča Institute of Nuclear Sciences
C3  - PHOTONICA2023 : 9th International School and Conference on Photonics : book of abstracts; August 28 - September 1, 2023; Belgrade
T1  - Metal ion-implanted TiN thin films: Induced effects on structural and optical properties
SP  - 63
EP  - 63
UR  - https://hdl.handle.net/21.15107/rcub_vinar_11805
ER  - 

@conference{
author = "Popović, M. and Novaković, Mirjana and Pjević, Dejan and Vana, D. and Jugović, Dragana and Noga, Pavol",
year = "2023",
abstract = "The ion implantation technique has a number of advantages over conventional methods for the improvement of thin films that offer the various possibilities of their use in different industrial and technological fields. Herein, we present the effects of metal ion implantation on the structural and optical properties of TiN thin films. TiN films of 170 nm thickness were grown by d.c. reactive sputtering on Si (100) wafers and then irradiated at 5×1016 ions/cm2 with either Au, Ag, or Cu ions by using two different energies per each implanted metal. The results showed that as deposited TiN crystallizes in form of fcc cubic structure, with the crystallites preferentially oriented along the (111) plane. For all implanted layers the cubic crystallographic structure was preserved, but compared to as deposited TiN the crystallites were smaller and the lattice was contracted. Besides, the surface compositional analysis of as deposited sample showed the coexistence of TiN, TiO2 and TiOxNy phases and this was related to the surface oxidation of the films due to the exposure to air. After implantation, the results were almost similar for all metals, showing an increase in TiO2 contribution and the formation of pure metallic Au and Ag phases, while copper is in the Cu2+ state, which is attributed to Cu(II)-oxide and Cu(OH)2. The microstructural characteristics including defect formation, changes in the crystallite size and lattice contraction, and also growth of different metallic phases during implantations were correlated with the findings of the optical characterization of the implanted films. For as deposited film we found energy gap of 2.91 eV, which was lower than the value typical for TiN. After implantation the gap was shifted to higher energies, while at the visible part of the region, additional energy levels, at photon energies below 2.9 eV were observed. Further, all implanted films showed degraded photocatalytic activity compared to as deposited TiN, among which Cu-implanted samples exhibited the best photocatalytic performances. The lower photocatalytic activity of Au and Ag-implanted films compared to Cu implantations was ascribed to larger structural defects and formation of less favorable electronic states.",
publisher = "Belgrade : Vinča Institute of Nuclear Sciences",
journal = "PHOTONICA2023 : 9th International School and Conference on Photonics : book of abstracts; August 28 - September 1, 2023; Belgrade",
title = "Metal ion-implanted TiN thin films: Induced effects on structural and optical properties",
pages = "63-63",
url = "https://hdl.handle.net/21.15107/rcub_vinar_11805"
}

Popović, M., Novaković, M., Pjević, D., Vana, D., Jugović, D.,& Noga, P.. (2023). Metal ion-implanted TiN thin films: Induced effects on structural and optical properties. in PHOTONICA2023 : 9th International School and Conference on Photonics : book of abstracts; August 28 - September 1, 2023; Belgrade
Belgrade : Vinča Institute of Nuclear Sciences., 63-63.
https://hdl.handle.net/21.15107/rcub_vinar_11805

Popović M, Novaković M, Pjević D, Vana D, Jugović D, Noga P. Metal ion-implanted TiN thin films: Induced effects on structural and optical properties. in PHOTONICA2023 : 9th International School and Conference on Photonics : book of abstracts; August 28 - September 1, 2023; Belgrade. 2023;:63-63.
https://hdl.handle.net/21.15107/rcub_vinar_11805 .

Popović, M., Novaković, Mirjana, Pjević, Dejan, Vana, D., Jugović, Dragana, Noga, Pavol, "Metal ion-implanted TiN thin films: Induced effects on structural and optical properties" in PHOTONICA2023 : 9th International School and Conference on Photonics : book of abstracts; August 28 - September 1, 2023; Belgrade (2023):63-63,
https://hdl.handle.net/21.15107/rcub_vinar_11805 .

TY  - CONF
AU  - Nešić, M.
AU  - Popović, M.
AU  - Galović, Slobodanka
AU  - Miletić, V.
AU  - Kostić, Lj.
PY  - 2023
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/11819
AB  - In transmission gas-microphone photoacoustics, in order to protect the microphone and improve the Signal to Noise Ratio of the experiment, a thin non-transparent layer is applied on the surface of the sample. When the applied layer is not illuminated – the incident light is passed through the sample, instead, and all the transmitted radiation is absorbed at the non-illuminated side of the system – optical absorption properties of the sample are preserved in the recorded photoacoustic response [1-3]. Thermoelastic component of photoacoustic response is based on the integral of temperature distribution in the sample. However, in the described configuration, the amplitude ratio and the phase difference of surface temperature variations can notably influence the direction and the intensity of the thermoelastic movement of the sample, thus modifying the induced photoacoustic response. Herein, the analysis of surface temperature variations is done, aimed at the prediction of thermoelastic component of the induced photoacoustic response, and the sensitivity of the described model to the alterations of optical absorption coefficient is analyzed and discussed.
PB  - Belgrade : Vinča Institute of Nuclear Sciences
C3  - PHOTONICA2023 : 9th International School and Conference on Photonics : book of abstracts; August 28 - September 1, 2023; Belgrade
T1  - The analysis of the influence of optical absorbance on photothermally induced surface temperature variations in a thin sample of high optical transparence
SP  - 123
EP  - 123
UR  - https://hdl.handle.net/21.15107/rcub_vinar_11819
ER  - 

@conference{
author = "Nešić, M. and Popović, M. and Galović, Slobodanka and Miletić, V. and Kostić, Lj.",
year = "2023",
abstract = "In transmission gas-microphone photoacoustics, in order to protect the microphone and improve the Signal to Noise Ratio of the experiment, a thin non-transparent layer is applied on the surface of the sample. When the applied layer is not illuminated – the incident light is passed through the sample, instead, and all the transmitted radiation is absorbed at the non-illuminated side of the system – optical absorption properties of the sample are preserved in the recorded photoacoustic response [1-3]. Thermoelastic component of photoacoustic response is based on the integral of temperature distribution in the sample. However, in the described configuration, the amplitude ratio and the phase difference of surface temperature variations can notably influence the direction and the intensity of the thermoelastic movement of the sample, thus modifying the induced photoacoustic response. Herein, the analysis of surface temperature variations is done, aimed at the prediction of thermoelastic component of the induced photoacoustic response, and the sensitivity of the described model to the alterations of optical absorption coefficient is analyzed and discussed.",
publisher = "Belgrade : Vinča Institute of Nuclear Sciences",
journal = "PHOTONICA2023 : 9th International School and Conference on Photonics : book of abstracts; August 28 - September 1, 2023; Belgrade",
title = "The analysis of the influence of optical absorbance on photothermally induced surface temperature variations in a thin sample of high optical transparence",
pages = "123-123",
url = "https://hdl.handle.net/21.15107/rcub_vinar_11819"
}

Nešić, M., Popović, M., Galović, S., Miletić, V.,& Kostić, Lj.. (2023). The analysis of the influence of optical absorbance on photothermally induced surface temperature variations in a thin sample of high optical transparence. in PHOTONICA2023 : 9th International School and Conference on Photonics : book of abstracts; August 28 - September 1, 2023; Belgrade
Belgrade : Vinča Institute of Nuclear Sciences., 123-123.
https://hdl.handle.net/21.15107/rcub_vinar_11819

Nešić M, Popović M, Galović S, Miletić V, Kostić L. The analysis of the influence of optical absorbance on photothermally induced surface temperature variations in a thin sample of high optical transparence. in PHOTONICA2023 : 9th International School and Conference on Photonics : book of abstracts; August 28 - September 1, 2023; Belgrade. 2023;:123-123.
https://hdl.handle.net/21.15107/rcub_vinar_11819 .

Nešić, M., Popović, M., Galović, Slobodanka, Miletić, V., Kostić, Lj., "The analysis of the influence of optical absorbance on photothermally induced surface temperature variations in a thin sample of high optical transparence" in PHOTONICA2023 : 9th International School and Conference on Photonics : book of abstracts; August 28 - September 1, 2023; Belgrade (2023):123-123,
https://hdl.handle.net/21.15107/rcub_vinar_11819 .

TY  - CONF
AU  - Rajić, Vladimir
AU  - Marković, Smilja
AU  - Popović, M.
AU  - Novaković, M.
AU  - Veselinović, Ljiljana
AU  - Stojković Simatović, Ivana
AU  - Škapin, Srečo Davor
AU  - Stojanović, S.
AU  - Rac, Vladislav
PY  - 2023
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/11554
AB  - Zink oxide-based materials have a great potential to be applied in photo and electro catalysts, opto-electronic (indoor illumination, LED), etc. Attractiveness of ZnO is attributed to wide bandgap energy at room temperature (3.37 eV), high electron mobility and transfer efficiency (115-155 cm2·V-1·s-1), large exciton binding energy (60 meV), intrinsic stability, nontoxicity, environmental compatibility and also, simple and not expensive synthesis procedure. A lot of different approaches can be used to modify the bandgap (i.e. optical absorption) of ZnO materials: metal and nonmetal ion doping, hydrogenation, the incorporation of crystalline defects in the form of V and I, modification of particles morphology and surface topology, etc. In this study, eco-friendly and rapid microwave processing of a precipitate was used to produce Fe-doped ZnO nanoparticles with 5, 10, 15 and 20 at.% of Fe (Zn1-xFeyO(1-x+1.5y)). The influence of different amount of Fe substituted Zn in ZnO on the crystal structure, morphological, textural, and optical properties as well as on functionality of ZnO particles was investigated. The crystal structure and phase purity of the Zn1-xFeyO(1-x+1.5y) particles were determined by X-ray diffraction (XRD), Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy and X-ray photoelectron spectroscopy (XPS). Effects of the Fe3+ amount on particles morphology and texture properties were observed with field emission scanning electron microscopy (FE–SEM), transmission electron microscopy (TEM) and nitrogen adsorption–desorption isotherm, respectively. Optical properties were studied using UV-Vis diffuse reflectance and photoluminescence spectroscopy. Functionality of ZnO particles was studied due to their photocatalytic and electrochemical activities. Photocatalytic activity was examined via decolorization of methylene blue under direct sunlight irradiation. Electrochemical behavior of the ZnO samples as anode material was evaluated by linear sweep voltammetry in 0.5 M Na2SO4 electrolyte.
PB  - Belgrade : Vinča Institute of Nuclear Sciences
C3  - PHOTONICA2023 : 9th International School and Conference on Photonics : book of abstracts; August 28 - September 1, 2023; Belgrade
T1  - Crystal structure, optical properties and photo/electrocatalytic activity of nanostructured Zn1-xFeyO(1-x+1.5y)
SP  - 34
UR  - https://hdl.handle.net/21.15107/rcub_vinar_11554
ER  - 

@conference{
author = "Rajić, Vladimir and Marković, Smilja and Popović, M. and Novaković, M. and Veselinović, Ljiljana and Stojković Simatović, Ivana and Škapin, Srečo Davor and Stojanović, S. and Rac, Vladislav",
year = "2023",
abstract = "Zink oxide-based materials have a great potential to be applied in photo and electro catalysts, opto-electronic (indoor illumination, LED), etc. Attractiveness of ZnO is attributed to wide bandgap energy at room temperature (3.37 eV), high electron mobility and transfer efficiency (115-155 cm2·V-1·s-1), large exciton binding energy (60 meV), intrinsic stability, nontoxicity, environmental compatibility and also, simple and not expensive synthesis procedure. A lot of different approaches can be used to modify the bandgap (i.e. optical absorption) of ZnO materials: metal and nonmetal ion doping, hydrogenation, the incorporation of crystalline defects in the form of V and I, modification of particles morphology and surface topology, etc. In this study, eco-friendly and rapid microwave processing of a precipitate was used to produce Fe-doped ZnO nanoparticles with 5, 10, 15 and 20 at.% of Fe (Zn1-xFeyO(1-x+1.5y)). The influence of different amount of Fe substituted Zn in ZnO on the crystal structure, morphological, textural, and optical properties as well as on functionality of ZnO particles was investigated. The crystal structure and phase purity of the Zn1-xFeyO(1-x+1.5y) particles were determined by X-ray diffraction (XRD), Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy and X-ray photoelectron spectroscopy (XPS). Effects of the Fe3+ amount on particles morphology and texture properties were observed with field emission scanning electron microscopy (FE–SEM), transmission electron microscopy (TEM) and nitrogen adsorption–desorption isotherm, respectively. Optical properties were studied using UV-Vis diffuse reflectance and photoluminescence spectroscopy. Functionality of ZnO particles was studied due to their photocatalytic and electrochemical activities. Photocatalytic activity was examined via decolorization of methylene blue under direct sunlight irradiation. Electrochemical behavior of the ZnO samples as anode material was evaluated by linear sweep voltammetry in 0.5 M Na2SO4 electrolyte.",
publisher = "Belgrade : Vinča Institute of Nuclear Sciences",
journal = "PHOTONICA2023 : 9th International School and Conference on Photonics : book of abstracts; August 28 - September 1, 2023; Belgrade",
title = "Crystal structure, optical properties and photo/electrocatalytic activity of nanostructured Zn1-xFeyO(1-x+1.5y)",
pages = "34",
url = "https://hdl.handle.net/21.15107/rcub_vinar_11554"
}

Rajić, V., Marković, S., Popović, M., Novaković, M., Veselinović, L., Stojković Simatović, I., Škapin, S. D., Stojanović, S.,& Rac, V.. (2023). Crystal structure, optical properties and photo/electrocatalytic activity of nanostructured Zn1-xFeyO(1-x+1.5y). in PHOTONICA2023 : 9th International School and Conference on Photonics : book of abstracts; August 28 - September 1, 2023; Belgrade
Belgrade : Vinča Institute of Nuclear Sciences., 34.
https://hdl.handle.net/21.15107/rcub_vinar_11554

Rajić V, Marković S, Popović M, Novaković M, Veselinović L, Stojković Simatović I, Škapin SD, Stojanović S, Rac V. Crystal structure, optical properties and photo/electrocatalytic activity of nanostructured Zn1-xFeyO(1-x+1.5y). in PHOTONICA2023 : 9th International School and Conference on Photonics : book of abstracts; August 28 - September 1, 2023; Belgrade. 2023;:34.
https://hdl.handle.net/21.15107/rcub_vinar_11554 .

Rajić, Vladimir, Marković, Smilja, Popović, M., Novaković, M., Veselinović, Ljiljana, Stojković Simatović, Ivana, Škapin, Srečo Davor, Stojanović, S., Rac, Vladislav, "Crystal structure, optical properties and photo/electrocatalytic activity of nanostructured Zn1-xFeyO(1-x+1.5y)" in PHOTONICA2023 : 9th International School and Conference on Photonics : book of abstracts; August 28 - September 1, 2023; Belgrade (2023):34,
https://hdl.handle.net/21.15107/rcub_vinar_11554 .

TY  - CONF
AU  - Popović, M.
AU  - Novaković, Mirjana M.
AU  - Rajić, Vladimir
PY  - 2021
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/10905
AB  - The control of optical properties of titanium nitride is of great interest especially in the area of plasmonics where titanium nitride can successfully change and overcome most of the drawbacks of plasmonic metals [1,2]. In this study we have investigated the structural and optical changes of 260 nm thick TiN thin film induced by sequential implantation of 200 keV Au and 150 keV Ag ions. During implantation Au ion fluence was kept constant at 1.0×1016 ions/cm2 while the silver ion fluence was varied from 4.0×1016 ions/cm2 to 13×1016 ions/cm2 . After implantation the films were annealed at 500ºC, for 1 hour. The samples were analyzed by means of X-ray diffraction and spectroscopic ellipsometry measurements. The changes in dielectric function spectra of TiN induced by Au/Ag ion implantation and post-implantation annealing were analyzed and discussed in detail. The parameters of the fit including screened and unscreened plasma frequency as well as Drude broadening were studied with respect to the ion fluences and annealing temperature, and they were correlated with the structural changes of TiN. It was found that the real part of dielectric constant becomes less negative after implantation (Fig. 1a). Simultaneously, imaginary part decreases meaning that the titanium nitride possesses lower optical losses after implantation (Fig. 1b). Besides this, the overall metallic character of titanium nitride in the visible and near infrared region is retained. Further, we have demonstrated that subsequent annealing at 500°C continues to change the both real and imaginary part of dielectric constant in the same direction as in the case of ion implantation, thus leaving the films with much lower optical losses. Our findings suggest that the optical properties of the TiN films can be tailored by varying the ion fluence of incident metal ions as well as by post-implantation annealing processing.
PB  - Belgrade : Institute of Physics Belgrade
C3  - PHOTONICA2021 : 8th International School and Conference on Photonics and HEMMAGINERO workshop : Abstracts of Tutorial, Keynote, Invited Lectures, Progress Reports and Contributed Papers; August 23-27, 2021; Belgrade
T1  - Effect of Au/Ag ion implantation and subsequent thermal annealing on optical properties of titanium nitride thin films
SP  - 84
UR  - https://hdl.handle.net/21.15107/rcub_vinar_10905
ER  - 

@conference{
author = "Popović, M. and Novaković, Mirjana M. and Rajić, Vladimir",
year = "2021",
abstract = "The control of optical properties of titanium nitride is of great interest especially in the area of plasmonics where titanium nitride can successfully change and overcome most of the drawbacks of plasmonic metals [1,2]. In this study we have investigated the structural and optical changes of 260 nm thick TiN thin film induced by sequential implantation of 200 keV Au and 150 keV Ag ions. During implantation Au ion fluence was kept constant at 1.0×1016 ions/cm2 while the silver ion fluence was varied from 4.0×1016 ions/cm2 to 13×1016 ions/cm2 . After implantation the films were annealed at 500ºC, for 1 hour. The samples were analyzed by means of X-ray diffraction and spectroscopic ellipsometry measurements. The changes in dielectric function spectra of TiN induced by Au/Ag ion implantation and post-implantation annealing were analyzed and discussed in detail. The parameters of the fit including screened and unscreened plasma frequency as well as Drude broadening were studied with respect to the ion fluences and annealing temperature, and they were correlated with the structural changes of TiN. It was found that the real part of dielectric constant becomes less negative after implantation (Fig. 1a). Simultaneously, imaginary part decreases meaning that the titanium nitride possesses lower optical losses after implantation (Fig. 1b). Besides this, the overall metallic character of titanium nitride in the visible and near infrared region is retained. Further, we have demonstrated that subsequent annealing at 500°C continues to change the both real and imaginary part of dielectric constant in the same direction as in the case of ion implantation, thus leaving the films with much lower optical losses. Our findings suggest that the optical properties of the TiN films can be tailored by varying the ion fluence of incident metal ions as well as by post-implantation annealing processing.",
publisher = "Belgrade : Institute of Physics Belgrade",
journal = "PHOTONICA2021 : 8th International School and Conference on Photonics and HEMMAGINERO workshop : Abstracts of Tutorial, Keynote, Invited Lectures, Progress Reports and Contributed Papers; August 23-27, 2021; Belgrade",
title = "Effect of Au/Ag ion implantation and subsequent thermal annealing on optical properties of titanium nitride thin films",
pages = "84",
url = "https://hdl.handle.net/21.15107/rcub_vinar_10905"
}

Popović, M., Novaković, M. M.,& Rajić, V.. (2021). Effect of Au/Ag ion implantation and subsequent thermal annealing on optical properties of titanium nitride thin films. in PHOTONICA2021 : 8th International School and Conference on Photonics and HEMMAGINERO workshop : Abstracts of Tutorial, Keynote, Invited Lectures, Progress Reports and Contributed Papers; August 23-27, 2021; Belgrade
Belgrade : Institute of Physics Belgrade., 84.
https://hdl.handle.net/21.15107/rcub_vinar_10905

Popović M, Novaković MM, Rajić V. Effect of Au/Ag ion implantation and subsequent thermal annealing on optical properties of titanium nitride thin films. in PHOTONICA2021 : 8th International School and Conference on Photonics and HEMMAGINERO workshop : Abstracts of Tutorial, Keynote, Invited Lectures, Progress Reports and Contributed Papers; August 23-27, 2021; Belgrade. 2021;:84.
https://hdl.handle.net/21.15107/rcub_vinar_10905 .

Popović, M., Novaković, Mirjana M., Rajić, Vladimir, "Effect of Au/Ag ion implantation and subsequent thermal annealing on optical properties of titanium nitride thin films" in PHOTONICA2021 : 8th International School and Conference on Photonics and HEMMAGINERO workshop : Abstracts of Tutorial, Keynote, Invited Lectures, Progress Reports and Contributed Papers; August 23-27, 2021; Belgrade (2021):84,
https://hdl.handle.net/21.15107/rcub_vinar_10905 .

TY  - CONF
AU  - Potočnik, Jelena
AU  - Popović, M.
PY  - 2021
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/10904
AB  - In the present study we have investigated the influence of the nickel (Ni) thin films thicknesses on their structural, magnetic and optical properties. Nickel vertical posts were deposited by Glancing Angle Deposition technique, at the angle of 85o .The films were grown to the thicknesses of 50 nm, 80 nm, 110 nm and 140 nm onto the glass slide substrates, which were rotated at the constant rate during the deposition process. After the deposition, the samples were characterized by Scanning ElectronMicroscopy (SEM) and it was found that the thin films are porous and that the diameter of the columns increases from 18 nm to 29 nm with increasing thickness.X-ray photoelectron spectroscopy was used in order to determine the chemical composition of the samples, as well as the identification of the compounds present in the deposited thin films. It was shown that the metallic Ni is the dominant component, while the deconvolution of the oxygen line revealed the presence of NiO and Ni(OH)2. Magnetic measurements of Ni thin films were accomplished by Magneto-Optical Kerr effect Microscope at room temperature. Based on the obtained results it can be seen that the deposited nickel samples possess uniaxial magnetic anisotropy. Also, it was noticed that the coercivity increases with thickness up to 150 Oe, for the 110 nm thick sample and then decreases to the value of 115 Oe. For thinner films, magnetic properties are mainly affected by the diameter of the columns, while for the thicker samples, the mechanism of the column growth determines their characteristics. Optical and electrical properties of nanostructured nickel thin films were investigated by spectroscopic ellipsometry and four-point probe, respectively. According to the ellipsometric measurementsit was found that as the thickness of the deposited samples increases plasma frequency (ωp) also increases, and the damping factor (Γd) decreases. An increase in the plasma frequency means that the density of conducting electrons is higher forthe thicker samples, while the decrease in Γd indicates their better structural arrangement and lower concentration of defects.From the ellipsometric measurements, also, was observed the decrease of the refractive index values with increasing the film thickness, which is due to the lower optical density of the samples. Besides, higher values of the column width of the thicker Ni films lead to the reduced scattering of the conduction electrons at their boundaries and consequently increase both conductivity and extinction coefficient. Indeed, four-point probe measurements revealed that the electrical resistivity decreases from 4.98102μΩcm to 0.44102μΩcm, with increase film thickness from 50 nm to 140 nm. Lower values of electrical resistivity are probably due to the larger column diameter and lower defects density, as a result of column connecting during the film growth.
PB  - Belgrade : Institute of Physics Belgrade
C3  - PHOTONICA2021 : 8th International School and Conference on Photonics and HEMMAGINERO workshop : Abstracts of Tutorial, Keynote, Invited Lectures, Progress Reports and Contributed Papers; August 23-27, 2021; Belgrade
T1  - Nickel vertical posts: Influence of thickness on magnetic and optical properties
SP  - 79
UR  - https://hdl.handle.net/21.15107/rcub_vinar_10904
ER  - 

@conference{
author = "Potočnik, Jelena and Popović, M.",
year = "2021",
abstract = "In the present study we have investigated the influence of the nickel (Ni) thin films thicknesses on their structural, magnetic and optical properties. Nickel vertical posts were deposited by Glancing Angle Deposition technique, at the angle of 85o .The films were grown to the thicknesses of 50 nm, 80 nm, 110 nm and 140 nm onto the glass slide substrates, which were rotated at the constant rate during the deposition process. After the deposition, the samples were characterized by Scanning ElectronMicroscopy (SEM) and it was found that the thin films are porous and that the diameter of the columns increases from 18 nm to 29 nm with increasing thickness.X-ray photoelectron spectroscopy was used in order to determine the chemical composition of the samples, as well as the identification of the compounds present in the deposited thin films. It was shown that the metallic Ni is the dominant component, while the deconvolution of the oxygen line revealed the presence of NiO and Ni(OH)2. Magnetic measurements of Ni thin films were accomplished by Magneto-Optical Kerr effect Microscope at room temperature. Based on the obtained results it can be seen that the deposited nickel samples possess uniaxial magnetic anisotropy. Also, it was noticed that the coercivity increases with thickness up to 150 Oe, for the 110 nm thick sample and then decreases to the value of 115 Oe. For thinner films, magnetic properties are mainly affected by the diameter of the columns, while for the thicker samples, the mechanism of the column growth determines their characteristics. Optical and electrical properties of nanostructured nickel thin films were investigated by spectroscopic ellipsometry and four-point probe, respectively. According to the ellipsometric measurementsit was found that as the thickness of the deposited samples increases plasma frequency (ωp) also increases, and the damping factor (Γd) decreases. An increase in the plasma frequency means that the density of conducting electrons is higher forthe thicker samples, while the decrease in Γd indicates their better structural arrangement and lower concentration of defects.From the ellipsometric measurements, also, was observed the decrease of the refractive index values with increasing the film thickness, which is due to the lower optical density of the samples. Besides, higher values of the column width of the thicker Ni films lead to the reduced scattering of the conduction electrons at their boundaries and consequently increase both conductivity and extinction coefficient. Indeed, four-point probe measurements revealed that the electrical resistivity decreases from 4.98102μΩcm to 0.44102μΩcm, with increase film thickness from 50 nm to 140 nm. Lower values of electrical resistivity are probably due to the larger column diameter and lower defects density, as a result of column connecting during the film growth.",
publisher = "Belgrade : Institute of Physics Belgrade",
journal = "PHOTONICA2021 : 8th International School and Conference on Photonics and HEMMAGINERO workshop : Abstracts of Tutorial, Keynote, Invited Lectures, Progress Reports and Contributed Papers; August 23-27, 2021; Belgrade",
title = "Nickel vertical posts: Influence of thickness on magnetic and optical properties",
pages = "79",
url = "https://hdl.handle.net/21.15107/rcub_vinar_10904"
}

Potočnik, J.,& Popović, M.. (2021). Nickel vertical posts: Influence of thickness on magnetic and optical properties. in PHOTONICA2021 : 8th International School and Conference on Photonics and HEMMAGINERO workshop : Abstracts of Tutorial, Keynote, Invited Lectures, Progress Reports and Contributed Papers; August 23-27, 2021; Belgrade
Belgrade : Institute of Physics Belgrade., 79.
https://hdl.handle.net/21.15107/rcub_vinar_10904

Potočnik J, Popović M. Nickel vertical posts: Influence of thickness on magnetic and optical properties. in PHOTONICA2021 : 8th International School and Conference on Photonics and HEMMAGINERO workshop : Abstracts of Tutorial, Keynote, Invited Lectures, Progress Reports and Contributed Papers; August 23-27, 2021; Belgrade. 2021;:79.
https://hdl.handle.net/21.15107/rcub_vinar_10904 .

Potočnik, Jelena, Popović, M., "Nickel vertical posts: Influence of thickness on magnetic and optical properties" in PHOTONICA2021 : 8th International School and Conference on Photonics and HEMMAGINERO workshop : Abstracts of Tutorial, Keynote, Invited Lectures, Progress Reports and Contributed Papers; August 23-27, 2021; Belgrade (2021):79,
https://hdl.handle.net/21.15107/rcub_vinar_10904 .

TY  - CONF
AU  - Stepanović, O.
AU  - Popović, M.
AU  - Novaković, Miroslav M.
AU  - Nenadović, Miloš
AU  - Potočnik, Jelena
AU  - Rakočević, Zlatko Lj.
PY  - 2019
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/10877
AB  - In this paper we report a study on the effects of implanted In+ ions into GaAs and Si - semiconductors with direct and indirect band gap, respectively. Both systems, (In,Ga)As and (In)Si, are of great interest for fundamental investigations of their structures as well as for the development of technological applications with enhanced electronic and optical properties. In+ ions were implanted into n-type GaAs (100) and n-type Si (100) at acceleration energy of 60 keV and the fluences of 1×1014 ion/cm2, 5×1014 ion/cm2, 1×1015 ion/cm2 and 2×1015ion/cm2.It is well known that after ion implantation process substrate crystal structure is quite damaged due to the formation of point defects and dislocations which can strongly influence the semiconducting properties. In order to remove structural damage, after implantation all samples were annealed by rapid thermal annealing at temperatures 900oC1000oC. As-implanted and annealed samples were characterized for the structural changes and results are presented together with optical and sheet resistance measurements. Change in crystallinity of the samples was monitored by transmission electron microscopy, while chemical composition was determined by energy dispersive X-ray spectroscopy. Spectroscopic ellipsometry in the wavelength range 260 nm-2066 nm was performed in order to determine optical parameters and change in energy band gap. Atomic force microscopy was used to determine changes in surface roughness. Damage introduction during ion irradiation and its removal during a thermal annealing are key issues which are highlighted.
PB  - Belgrade : Serbian Ceramic Society
C3  - Advanced Ceramics and Application : 8th Serbian Ceramic Society Conference : program and the book of abstracts; September 23-25, 2019; Belgrade
T1  - Indium ion implantation effects on the structural, optical and electrical properties of GaAs and Si wafers
SP  - 50
UR  - https://hdl.handle.net/21.15107/rcub_vinar_10877
ER  - 

@conference{
author = "Stepanović, O. and Popović, M. and Novaković, Miroslav M. and Nenadović, Miloš and Potočnik, Jelena and Rakočević, Zlatko Lj.",
year = "2019",
abstract = "In this paper we report a study on the effects of implanted In+ ions into GaAs and Si - semiconductors with direct and indirect band gap, respectively. Both systems, (In,Ga)As and (In)Si, are of great interest for fundamental investigations of their structures as well as for the development of technological applications with enhanced electronic and optical properties. In+ ions were implanted into n-type GaAs (100) and n-type Si (100) at acceleration energy of 60 keV and the fluences of 1×1014 ion/cm2, 5×1014 ion/cm2, 1×1015 ion/cm2 and 2×1015ion/cm2.It is well known that after ion implantation process substrate crystal structure is quite damaged due to the formation of point defects and dislocations which can strongly influence the semiconducting properties. In order to remove structural damage, after implantation all samples were annealed by rapid thermal annealing at temperatures 900oC1000oC. As-implanted and annealed samples were characterized for the structural changes and results are presented together with optical and sheet resistance measurements. Change in crystallinity of the samples was monitored by transmission electron microscopy, while chemical composition was determined by energy dispersive X-ray spectroscopy. Spectroscopic ellipsometry in the wavelength range 260 nm-2066 nm was performed in order to determine optical parameters and change in energy band gap. Atomic force microscopy was used to determine changes in surface roughness. Damage introduction during ion irradiation and its removal during a thermal annealing are key issues which are highlighted.",
publisher = "Belgrade : Serbian Ceramic Society",
journal = "Advanced Ceramics and Application : 8th Serbian Ceramic Society Conference : program and the book of abstracts; September 23-25, 2019; Belgrade",
title = "Indium ion implantation effects on the structural, optical and electrical properties of GaAs and Si wafers",
pages = "50",
url = "https://hdl.handle.net/21.15107/rcub_vinar_10877"
}

Stepanović, O., Popović, M., Novaković, M. M., Nenadović, M., Potočnik, J.,& Rakočević, Z. Lj.. (2019). Indium ion implantation effects on the structural, optical and electrical properties of GaAs and Si wafers. in Advanced Ceramics and Application : 8th Serbian Ceramic Society Conference : program and the book of abstracts; September 23-25, 2019; Belgrade
Belgrade : Serbian Ceramic Society., 50.
https://hdl.handle.net/21.15107/rcub_vinar_10877

Stepanović O, Popović M, Novaković MM, Nenadović M, Potočnik J, Rakočević ZL. Indium ion implantation effects on the structural, optical and electrical properties of GaAs and Si wafers. in Advanced Ceramics and Application : 8th Serbian Ceramic Society Conference : program and the book of abstracts; September 23-25, 2019; Belgrade. 2019;:50.
https://hdl.handle.net/21.15107/rcub_vinar_10877 .

Stepanović, O., Popović, M., Novaković, Miroslav M., Nenadović, Miloš, Potočnik, Jelena, Rakočević, Zlatko Lj., "Indium ion implantation effects on the structural, optical and electrical properties of GaAs and Si wafers" in Advanced Ceramics and Application : 8th Serbian Ceramic Society Conference : program and the book of abstracts; September 23-25, 2019; Belgrade (2019):50,
https://hdl.handle.net/21.15107/rcub_vinar_10877 .

TY  - CONF
AU  - Popović, M.
AU  - Novaković, M.
AU  - Peruško, Davor
AU  - Radović, Ivan
AU  - Milinović, Velimir
AU  - Mitrić, M.
AU  - Milosavljević, M.
PY  - 2007
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/12672
AB  - Titanium-nitrude layers are interesting as hard coathings, wear and corrosion protection materials. In general, their functional properties depend on their microstructure, i. e. the mean grain size, grain boundaries, crystalline defects, preferred orientation, surface and interface morphology, etc. Here we present a study of the micro-structural changes induced in TiN layers by irradiation with argon ions. Titanium nitride thin films were deposited by reactive ion sputtering on (100) Si to a thickness of ~250nm. After deposition the films were implanted with 120keV argon ions to the fluences of 1x1015 and 1x1016ions/cm2. Structural characterisation of the samples was performed by cross-sectional transmission electron microscopy, x-ray diffraction and Rutherford backscattering spectrometry. It was found that ion irradiation induces local micro-structural changes, formation of nanoparticles and defects. We also measured their electrical resistivity with a four point probe. The induced crystalline defects yield an increase of electrical resistivity after ion irradiation.
PB  - Belgrade : Institute of Technical Sciences of SASA
C3  - YUCOMAT 2007 : 9th Annual Conference YUCOMAT 2007 : Programme and the book of abstracts
T1  - A study of microstructural changes in TiN thin films induced by ion implantation
SP  - 69
EP  - 69
UR  - https://hdl.handle.net/21.15107/rcub_vinar_12672
ER  - 

@conference{
author = "Popović, M. and Novaković, M. and Peruško, Davor and Radović, Ivan and Milinović, Velimir and Mitrić, M. and Milosavljević, M.",
year = "2007",
abstract = "Titanium-nitrude layers are interesting as hard coathings, wear and corrosion protection materials. In general, their functional properties depend on their microstructure, i. e. the mean grain size, grain boundaries, crystalline defects, preferred orientation, surface and interface morphology, etc. Here we present a study of the micro-structural changes induced in TiN layers by irradiation with argon ions. Titanium nitride thin films were deposited by reactive ion sputtering on (100) Si to a thickness of ~250nm. After deposition the films were implanted with 120keV argon ions to the fluences of 1x1015 and 1x1016ions/cm2. Structural characterisation of the samples was performed by cross-sectional transmission electron microscopy, x-ray diffraction and Rutherford backscattering spectrometry. It was found that ion irradiation induces local micro-structural changes, formation of nanoparticles and defects. We also measured their electrical resistivity with a four point probe. The induced crystalline defects yield an increase of electrical resistivity after ion irradiation.",
publisher = "Belgrade : Institute of Technical Sciences of SASA",
journal = "YUCOMAT 2007 : 9th Annual Conference YUCOMAT 2007 : Programme and the book of abstracts",
title = "A study of microstructural changes in TiN thin films induced by ion implantation",
pages = "69-69",
url = "https://hdl.handle.net/21.15107/rcub_vinar_12672"
}

Popović, M., Novaković, M., Peruško, D., Radović, I., Milinović, V., Mitrić, M.,& Milosavljević, M.. (2007). A study of microstructural changes in TiN thin films induced by ion implantation. in YUCOMAT 2007 : 9th Annual Conference YUCOMAT 2007 : Programme and the book of abstracts
Belgrade : Institute of Technical Sciences of SASA., 69-69.
https://hdl.handle.net/21.15107/rcub_vinar_12672

Popović M, Novaković M, Peruško D, Radović I, Milinović V, Mitrić M, Milosavljević M. A study of microstructural changes in TiN thin films induced by ion implantation. in YUCOMAT 2007 : 9th Annual Conference YUCOMAT 2007 : Programme and the book of abstracts. 2007;:69-69.
https://hdl.handle.net/21.15107/rcub_vinar_12672 .

Popović, M., Novaković, M., Peruško, Davor, Radović, Ivan, Milinović, Velimir, Mitrić, M., Milosavljević, M., "A study of microstructural changes in TiN thin films induced by ion implantation" in YUCOMAT 2007 : 9th Annual Conference YUCOMAT 2007 : Programme and the book of abstracts (2007):69-69,
https://hdl.handle.net/21.15107/rcub_vinar_12672 .

TY  - CONF
AU  - Popović, M.
AU  - Novaković, M.
AU  - Peruško, Davor
AU  - Radović, Ivan
AU  - Milinović, Velimir
AU  - Mitrić, M.
AU  - Bibić, Nataša
AU  - Milosavljević, M.
PY  - 2006
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/12671
AB  - study of the microstructural changes in TiN films induced by implantation of nitrogen or argon ions is presented. Titanium nitride thin films were deposited by reactive ion sputtering from a 99.9% Ti target, with an argon ion beam in a nitrogen ambient. The base pressure in the chamber was ~ 2x10-6 mbar, N2 partial pressure 3x10-4 mbar, and Ar partial pressure 1x10-3 mbar. The films were deposited on (100) Si substrates, to a thickness of 200 nm, at a rate of ~ 7 nm/min, at ambient temperature. After deposition the films were implanted with 80 keV nitrogen ions or 120 keV argon ions, to the fluences from 1-15x1015 ions/cm2. The ion beam was uniformly scanned over an area of 2x2 cm2 on the target, and the beam current was held at ~ 1 A/cm2 in order to avoid heating of the samples during ion irradiation. The implantation energy was chosen to give the projected ion range within the deposited layers, in order to minimize the influence of the substrate on the induced structural changes. Structural analysis of the samples was performed by cross-sectional transmission electron microscopy, xray diffraction, and Rutherford backscattering spectrometry. While ion implantation is mainly used to improve adhesion of these layers to the substrate, our primary interest was to study microstructural changes induced within the layers. We have correlated these changes with the ion implantation parameters, i.e. the ion mass, energy and fluence.
PB  - Belgrade : Institute of Technical Sciences of SASA
C3  - YUCOMAT 2006 : 8th Annual Conference YUCOMAT 2006 : Programme and the book of abstracts
T1  - Microstructural changes in TiN thin films induced by ion implantation
SP  - 100
EP  - 100
UR  - https://hdl.handle.net/21.15107/rcub_vinar_12671
ER  - 

@conference{
author = "Popović, M. and Novaković, M. and Peruško, Davor and Radović, Ivan and Milinović, Velimir and Mitrić, M. and Bibić, Nataša and Milosavljević, M.",
year = "2006",
abstract = "study of the microstructural changes in TiN films induced by implantation of nitrogen or argon ions is presented. Titanium nitride thin films were deposited by reactive ion sputtering from a 99.9% Ti target, with an argon ion beam in a nitrogen ambient. The base pressure in the chamber was ~ 2x10-6 mbar, N2 partial pressure 3x10-4 mbar, and Ar partial pressure 1x10-3 mbar. The films were deposited on (100) Si substrates, to a thickness of 200 nm, at a rate of ~ 7 nm/min, at ambient temperature. After deposition the films were implanted with 80 keV nitrogen ions or 120 keV argon ions, to the fluences from 1-15x1015 ions/cm2. The ion beam was uniformly scanned over an area of 2x2 cm2 on the target, and the beam current was held at ~ 1 A/cm2 in order to avoid heating of the samples during ion irradiation. The implantation energy was chosen to give the projected ion range within the deposited layers, in order to minimize the influence of the substrate on the induced structural changes. Structural analysis of the samples was performed by cross-sectional transmission electron microscopy, xray diffraction, and Rutherford backscattering spectrometry. While ion implantation is mainly used to improve adhesion of these layers to the substrate, our primary interest was to study microstructural changes induced within the layers. We have correlated these changes with the ion implantation parameters, i.e. the ion mass, energy and fluence.",
publisher = "Belgrade : Institute of Technical Sciences of SASA",
journal = "YUCOMAT 2006 : 8th Annual Conference YUCOMAT 2006 : Programme and the book of abstracts",
title = "Microstructural changes in TiN thin films induced by ion implantation",
pages = "100-100",
url = "https://hdl.handle.net/21.15107/rcub_vinar_12671"
}

Popović, M., Novaković, M., Peruško, D., Radović, I., Milinović, V., Mitrić, M., Bibić, N.,& Milosavljević, M.. (2006). Microstructural changes in TiN thin films induced by ion implantation. in YUCOMAT 2006 : 8th Annual Conference YUCOMAT 2006 : Programme and the book of abstracts
Belgrade : Institute of Technical Sciences of SASA., 100-100.
https://hdl.handle.net/21.15107/rcub_vinar_12671

Popović M, Novaković M, Peruško D, Radović I, Milinović V, Mitrić M, Bibić N, Milosavljević M. Microstructural changes in TiN thin films induced by ion implantation. in YUCOMAT 2006 : 8th Annual Conference YUCOMAT 2006 : Programme and the book of abstracts. 2006;:100-100.
https://hdl.handle.net/21.15107/rcub_vinar_12671 .

Popović, M., Novaković, M., Peruško, Davor, Radović, Ivan, Milinović, Velimir, Mitrić, M., Bibić, Nataša, Milosavljević, M., "Microstructural changes in TiN thin films induced by ion implantation" in YUCOMAT 2006 : 8th Annual Conference YUCOMAT 2006 : Programme and the book of abstracts (2006):100-100,
https://hdl.handle.net/21.15107/rcub_vinar_12671 .

TY  - CONF
AU  - Peruško, Davor
AU  - Mitrić, M.
AU  - Bibić, Nataša
AU  - Petrović, S.
AU  - Popović, M.
AU  - Novaković, M.
AU  - Radović, Ivan
AU  - Milosavljević, M.
PY  - 2006
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/12666
AB  - Nitrogen ion implantations were performed on AISI 1045 steel substrates. The ion energy was 40 keV and the ion doses were from 5x1016 – 5x1017 ions cm-2. On such substrates we have deposited 1.3 μm thick TiN coatings. Structural characterizations were performed by grazing incidence X-ray diffraction analysis (GXRD), normal X-ray diffraction analysis (XRD), and scanning electron microscopy (SEM). Microhardness was measured by Vicker`s method. The obtained results indicate that the formation of iron nitrides occurred in the near surface region of the substrates. This effect is more pronounced for higher implantation doses. Structure of the deposited TiN coatings shows a dependence on the implanted doses. Ion implantation and deposition of hard TiN coatings induce an increase of microhardness of this low performance steel for more than eight times.
PB  - Belgrade : Institute of Technical Sciences of SASA
C3  - YUCOMAT 2006 : 8th Annual Conference YUCOMAT 2006 : Programme and the book of abstracts
T1  - GXRD analysis of TiN coatings deposited on ion implanted stainless steel
SP  - 67
EP  - 67
UR  - https://hdl.handle.net/21.15107/rcub_vinar_12666
ER  - 

@conference{
author = "Peruško, Davor and Mitrić, M. and Bibić, Nataša and Petrović, S. and Popović, M. and Novaković, M. and Radović, Ivan and Milosavljević, M.",
year = "2006",
abstract = "Nitrogen ion implantations were performed on AISI 1045 steel substrates. The ion energy was 40 keV and the ion doses were from 5x1016 – 5x1017 ions cm-2. On such substrates we have deposited 1.3 μm thick TiN coatings. Structural characterizations were performed by grazing incidence X-ray diffraction analysis (GXRD), normal X-ray diffraction analysis (XRD), and scanning electron microscopy (SEM). Microhardness was measured by Vicker`s method. The obtained results indicate that the formation of iron nitrides occurred in the near surface region of the substrates. This effect is more pronounced for higher implantation doses. Structure of the deposited TiN coatings shows a dependence on the implanted doses. Ion implantation and deposition of hard TiN coatings induce an increase of microhardness of this low performance steel for more than eight times.",
publisher = "Belgrade : Institute of Technical Sciences of SASA",
journal = "YUCOMAT 2006 : 8th Annual Conference YUCOMAT 2006 : Programme and the book of abstracts",
title = "GXRD analysis of TiN coatings deposited on ion implanted stainless steel",
pages = "67-67",
url = "https://hdl.handle.net/21.15107/rcub_vinar_12666"
}

Peruško, D., Mitrić, M., Bibić, N., Petrović, S., Popović, M., Novaković, M., Radović, I.,& Milosavljević, M.. (2006). GXRD analysis of TiN coatings deposited on ion implanted stainless steel. in YUCOMAT 2006 : 8th Annual Conference YUCOMAT 2006 : Programme and the book of abstracts
Belgrade : Institute of Technical Sciences of SASA., 67-67.
https://hdl.handle.net/21.15107/rcub_vinar_12666

Peruško D, Mitrić M, Bibić N, Petrović S, Popović M, Novaković M, Radović I, Milosavljević M. GXRD analysis of TiN coatings deposited on ion implanted stainless steel. in YUCOMAT 2006 : 8th Annual Conference YUCOMAT 2006 : Programme and the book of abstracts. 2006;:67-67.
https://hdl.handle.net/21.15107/rcub_vinar_12666 .

Peruško, Davor, Mitrić, M., Bibić, Nataša, Petrović, S., Popović, M., Novaković, M., Radović, Ivan, Milosavljević, M., "GXRD analysis of TiN coatings deposited on ion implanted stainless steel" in YUCOMAT 2006 : 8th Annual Conference YUCOMAT 2006 : Programme and the book of abstracts (2006):67-67,
https://hdl.handle.net/21.15107/rcub_vinar_12666 .