Ion implantation induced structural changes in reactively sputtered Cr-N layers on Si substrates
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2007
Authors
Novaković, Mirjana M.Popović, Maja
Peruško, Davor
Milinović, Velimir
Radović, Ivan
Bibić, Nataša M.
Mitrić, Miodrag
Milosavljević, Momir
Article (Published version)
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This paper presents a study of the structure and composition of reactively sputtered Cr-N layers as a function of deposition parameters, and the effects of ion implantation on these structures. The layers were deposited on (1 0 0) Si substrates to a thickness of 240-280 nm, at different nitrogen partial pressure, and subsequently irradiated with 120 keV Ar ions. Structural characterisation of the samples was performed with Rutherford backscattering spectroscopy, transmission electron microscopy and X-ray diffraction analysis. We also measured their electrical resistivity with a four point probe. It was found that the layers grow in form of columnar structures, and their composition, Cr2N or CrN, strongly depends on the nitrogen partial pressure during deposition. Ion irradiation induces local micro-structural changes, formation of nano-particles and defects, which can be nicely correlated to the measured electrical resistivity. (c) 2007 Elsevier B.V. All rights reserved.
Keywords:
CrN hard coatings / ion implantation / TEM analysis / ion beam modificationSource:
Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms, 2007, 257, 782-785Funding / projects:
- Modifikacija, sinteza i analiza nanostrukturnih materijala jonskim snopovima, gama zračenjem i vakuumskim deponovanjem (RS-MESTD-MPN2006-2010-141013)
Note:
- 15th International Conference on Ion Beam Modification of Materials, Sep 18-22, 2006, Taormina, Italy
DOI: 10.1016/j.nimb.2007.01.112
ISSN: 0168-583X
WoS: 000246165500176
Scopus: 2-s2.0-33947714857
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VinčaTY - JOUR AU - Novaković, Mirjana M. AU - Popović, Maja AU - Peruško, Davor AU - Milinović, Velimir AU - Radović, Ivan AU - Bibić, Nataša M. AU - Mitrić, Miodrag AU - Milosavljević, Momir PY - 2007 UR - https://vinar.vin.bg.ac.rs/handle/123456789/6656 AB - This paper presents a study of the structure and composition of reactively sputtered Cr-N layers as a function of deposition parameters, and the effects of ion implantation on these structures. The layers were deposited on (1 0 0) Si substrates to a thickness of 240-280 nm, at different nitrogen partial pressure, and subsequently irradiated with 120 keV Ar ions. Structural characterisation of the samples was performed with Rutherford backscattering spectroscopy, transmission electron microscopy and X-ray diffraction analysis. We also measured their electrical resistivity with a four point probe. It was found that the layers grow in form of columnar structures, and their composition, Cr2N or CrN, strongly depends on the nitrogen partial pressure during deposition. Ion irradiation induces local micro-structural changes, formation of nano-particles and defects, which can be nicely correlated to the measured electrical resistivity. (c) 2007 Elsevier B.V. All rights reserved. T2 - Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms T1 - Ion implantation induced structural changes in reactively sputtered Cr-N layers on Si substrates VL - 257 SP - 782 EP - 785 DO - 10.1016/j.nimb.2007.01.112 ER -
@article{ author = "Novaković, Mirjana M. and Popović, Maja and Peruško, Davor and Milinović, Velimir and Radović, Ivan and Bibić, Nataša M. and Mitrić, Miodrag and Milosavljević, Momir", year = "2007", abstract = "This paper presents a study of the structure and composition of reactively sputtered Cr-N layers as a function of deposition parameters, and the effects of ion implantation on these structures. The layers were deposited on (1 0 0) Si substrates to a thickness of 240-280 nm, at different nitrogen partial pressure, and subsequently irradiated with 120 keV Ar ions. Structural characterisation of the samples was performed with Rutherford backscattering spectroscopy, transmission electron microscopy and X-ray diffraction analysis. We also measured their electrical resistivity with a four point probe. It was found that the layers grow in form of columnar structures, and their composition, Cr2N or CrN, strongly depends on the nitrogen partial pressure during deposition. Ion irradiation induces local micro-structural changes, formation of nano-particles and defects, which can be nicely correlated to the measured electrical resistivity. (c) 2007 Elsevier B.V. All rights reserved.", journal = "Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms", title = "Ion implantation induced structural changes in reactively sputtered Cr-N layers on Si substrates", volume = "257", pages = "782-785", doi = "10.1016/j.nimb.2007.01.112" }
Novaković, M. M., Popović, M., Peruško, D., Milinović, V., Radović, I., Bibić, N. M., Mitrić, M.,& Milosavljević, M.. (2007). Ion implantation induced structural changes in reactively sputtered Cr-N layers on Si substrates. in Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms, 257, 782-785. https://doi.org/10.1016/j.nimb.2007.01.112
Novaković MM, Popović M, Peruško D, Milinović V, Radović I, Bibić NM, Mitrić M, Milosavljević M. Ion implantation induced structural changes in reactively sputtered Cr-N layers on Si substrates. in Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms. 2007;257:782-785. doi:10.1016/j.nimb.2007.01.112 .
Novaković, Mirjana M., Popović, Maja, Peruško, Davor, Milinović, Velimir, Radović, Ivan, Bibić, Nataša M., Mitrić, Miodrag, Milosavljević, Momir, "Ion implantation induced structural changes in reactively sputtered Cr-N layers on Si substrates" in Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms, 257 (2007):782-785, https://doi.org/10.1016/j.nimb.2007.01.112 . .