TiN thin films deposited by ion beam sputtering: effects of energetic particles bombardment
Nema prikaza
Autori
Popovic, NBogdanov, Žarko
Goncić, Bratislav
Zec, Slavica
Rakočević, Zlatko Lj.
Zlatanovic, M
Peruško, Davor
Članak u časopisu
Metapodaci
Prikaz svih podataka o dokumentuApstrakt
The low energy broad argon ion beam (1.35-2.0) keV was used for sputtering of a Ti target in an atmosphere of nitrogen gas to form TiN films. During deposition the growing thin film was under argon ion irradiation from the beam periphery. The influence of the ion beam energy (E-b) and average energy delivered by assisting ions to condensing film atoms (E-n) on TiN film properties was investigated. The titanium nitride thin films were deposited at a low working pressure of 1 x 10(-4) mbar and at ambient substrate temperature. XRD analysis revealed the formation of a delta-TiN phase with preferred (220) orientation for the stoichiometric composition of TiN films (RBS). The increase of both the intensity of the (220) peak and TiN film crystallite dimension with increasing the energy of Ti target bombarding Ar+ ions (E-b) was observed. By increasing the average ion energy per deposited metal atom (E-n) the (220) peak intensity and crystallite dimension decrease and a complete loss of (220)... orientation at E-n close to 162 eV/at was found. In the range of E-n considered, the TiN films grain size decreases leading to the nanostructured surface as revealed by the STM analysis. The incident angle and energy of the assisted bombarding strongly influence the film-preferred orientation and sub-microstructure. (C) 2003 Elsevier B.V. All rights reserved.
Ključne reči:
TiN sputtering / X-ray diffraction / nanosructuresIzvor:
Thin Solid Films, 2004, 459, 1-2, 286-291Napomena:
- 8th European Vacuum Congress (EVC-8)/2nd Annual Conference of the German-Vacuum-Society (DVG), Jun 23-26, 2003, Berlin, Germany
DOI: 10.1016/j.tsf.2003.12.130
ISSN: 0040-6090
WoS: 000222217100065
Scopus: 2-s2.0-2942534391
Kolekcije
Institucija/grupa
VinčaTY - JOUR AU - Popovic, N AU - Bogdanov, Žarko AU - Goncić, Bratislav AU - Zec, Slavica AU - Rakočević, Zlatko Lj. AU - Zlatanovic, M AU - Peruško, Davor PY - 2004 UR - https://vinar.vin.bg.ac.rs/handle/123456789/6452 AB - The low energy broad argon ion beam (1.35-2.0) keV was used for sputtering of a Ti target in an atmosphere of nitrogen gas to form TiN films. During deposition the growing thin film was under argon ion irradiation from the beam periphery. The influence of the ion beam energy (E-b) and average energy delivered by assisting ions to condensing film atoms (E-n) on TiN film properties was investigated. The titanium nitride thin films were deposited at a low working pressure of 1 x 10(-4) mbar and at ambient substrate temperature. XRD analysis revealed the formation of a delta-TiN phase with preferred (220) orientation for the stoichiometric composition of TiN films (RBS). The increase of both the intensity of the (220) peak and TiN film crystallite dimension with increasing the energy of Ti target bombarding Ar+ ions (E-b) was observed. By increasing the average ion energy per deposited metal atom (E-n) the (220) peak intensity and crystallite dimension decrease and a complete loss of (220) orientation at E-n close to 162 eV/at was found. In the range of E-n considered, the TiN films grain size decreases leading to the nanostructured surface as revealed by the STM analysis. The incident angle and energy of the assisted bombarding strongly influence the film-preferred orientation and sub-microstructure. (C) 2003 Elsevier B.V. All rights reserved. T2 - Thin Solid Films T1 - TiN thin films deposited by ion beam sputtering: effects of energetic particles bombardment VL - 459 IS - 1-2 SP - 286 EP - 291 DO - 10.1016/j.tsf.2003.12.130 ER -
@article{ author = "Popovic, N and Bogdanov, Žarko and Goncić, Bratislav and Zec, Slavica and Rakočević, Zlatko Lj. and Zlatanovic, M and Peruško, Davor", year = "2004", abstract = "The low energy broad argon ion beam (1.35-2.0) keV was used for sputtering of a Ti target in an atmosphere of nitrogen gas to form TiN films. During deposition the growing thin film was under argon ion irradiation from the beam periphery. The influence of the ion beam energy (E-b) and average energy delivered by assisting ions to condensing film atoms (E-n) on TiN film properties was investigated. The titanium nitride thin films were deposited at a low working pressure of 1 x 10(-4) mbar and at ambient substrate temperature. XRD analysis revealed the formation of a delta-TiN phase with preferred (220) orientation for the stoichiometric composition of TiN films (RBS). The increase of both the intensity of the (220) peak and TiN film crystallite dimension with increasing the energy of Ti target bombarding Ar+ ions (E-b) was observed. By increasing the average ion energy per deposited metal atom (E-n) the (220) peak intensity and crystallite dimension decrease and a complete loss of (220) orientation at E-n close to 162 eV/at was found. In the range of E-n considered, the TiN films grain size decreases leading to the nanostructured surface as revealed by the STM analysis. The incident angle and energy of the assisted bombarding strongly influence the film-preferred orientation and sub-microstructure. (C) 2003 Elsevier B.V. All rights reserved.", journal = "Thin Solid Films", title = "TiN thin films deposited by ion beam sputtering: effects of energetic particles bombardment", volume = "459", number = "1-2", pages = "286-291", doi = "10.1016/j.tsf.2003.12.130" }
Popovic, N., Bogdanov, Ž., Goncić, B., Zec, S., Rakočević, Z. Lj., Zlatanovic, M.,& Peruško, D.. (2004). TiN thin films deposited by ion beam sputtering: effects of energetic particles bombardment. in Thin Solid Films, 459(1-2), 286-291. https://doi.org/10.1016/j.tsf.2003.12.130
Popovic N, Bogdanov Ž, Goncić B, Zec S, Rakočević ZL, Zlatanovic M, Peruško D. TiN thin films deposited by ion beam sputtering: effects of energetic particles bombardment. in Thin Solid Films. 2004;459(1-2):286-291. doi:10.1016/j.tsf.2003.12.130 .
Popovic, N, Bogdanov, Žarko, Goncić, Bratislav, Zec, Slavica, Rakočević, Zlatko Lj., Zlatanovic, M, Peruško, Davor, "TiN thin films deposited by ion beam sputtering: effects of energetic particles bombardment" in Thin Solid Films, 459, no. 1-2 (2004):286-291, https://doi.org/10.1016/j.tsf.2003.12.130 . .