Electrophoretic deposition of thin alumina films from water suspension
Апстракт
Alumina water suspensions have been prepared for thin alumina film deposition on steel. The type and quantity of deflocculant have been determined using zeta potential and viscosimetric measurements. The deposition was performed under the constant deposition voltage between 30 and 250 V. The morphology of electrodeposited alumina films was investigated using the optical microscopy coupled with image analysis, which enables the determination of pore number, percentage of film surface covered by pores and mean pore diameter, and scanning electron microscopy (SEM). It was shown that alumina films of the highest thickness and the lowest porosity can be formed at lower applied voltage and for longer deposition time. The minimum of alumina films porosity, obtained at the lowest deposition voltage of 30 V, can be explained by smaller amount of evolved hydrogen on the cathode during electrodeposition process. (C) 2002 Elsevier Science B.V. All rights reserved.
Кључне речи:
electrodeposition / alumina suspension / steel / image analysis / porosityИзвор:
Colloids and Surfaces. A: Physicochemical and Engineering Aspects, 2002, 209, 1, 47-55
DOI: 10.1016/S0927-7757(02)00138-3
ISSN: 0927-7757
WoS: 000177577300005
Scopus: 2-s2.0-0037019615
Колекције
Институција/група
VinčaTY - JOUR AU - Simović, Kornelija AU - Mišković-Stanković, Vesna B. AU - Kićević, Dušan M. AU - Jovanic, P PY - 2002 UR - https://vinar.vin.bg.ac.rs/handle/123456789/2542 AB - Alumina water suspensions have been prepared for thin alumina film deposition on steel. The type and quantity of deflocculant have been determined using zeta potential and viscosimetric measurements. The deposition was performed under the constant deposition voltage between 30 and 250 V. The morphology of electrodeposited alumina films was investigated using the optical microscopy coupled with image analysis, which enables the determination of pore number, percentage of film surface covered by pores and mean pore diameter, and scanning electron microscopy (SEM). It was shown that alumina films of the highest thickness and the lowest porosity can be formed at lower applied voltage and for longer deposition time. The minimum of alumina films porosity, obtained at the lowest deposition voltage of 30 V, can be explained by smaller amount of evolved hydrogen on the cathode during electrodeposition process. (C) 2002 Elsevier Science B.V. All rights reserved. T2 - Colloids and Surfaces. A: Physicochemical and Engineering Aspects T1 - Electrophoretic deposition of thin alumina films from water suspension VL - 209 IS - 1 SP - 47 EP - 55 DO - 10.1016/S0927-7757(02)00138-3 ER -
@article{ author = "Simović, Kornelija and Mišković-Stanković, Vesna B. and Kićević, Dušan M. and Jovanic, P", year = "2002", abstract = "Alumina water suspensions have been prepared for thin alumina film deposition on steel. The type and quantity of deflocculant have been determined using zeta potential and viscosimetric measurements. The deposition was performed under the constant deposition voltage between 30 and 250 V. The morphology of electrodeposited alumina films was investigated using the optical microscopy coupled with image analysis, which enables the determination of pore number, percentage of film surface covered by pores and mean pore diameter, and scanning electron microscopy (SEM). It was shown that alumina films of the highest thickness and the lowest porosity can be formed at lower applied voltage and for longer deposition time. The minimum of alumina films porosity, obtained at the lowest deposition voltage of 30 V, can be explained by smaller amount of evolved hydrogen on the cathode during electrodeposition process. (C) 2002 Elsevier Science B.V. All rights reserved.", journal = "Colloids and Surfaces. A: Physicochemical and Engineering Aspects", title = "Electrophoretic deposition of thin alumina films from water suspension", volume = "209", number = "1", pages = "47-55", doi = "10.1016/S0927-7757(02)00138-3" }
Simović, K., Mišković-Stanković, V. B., Kićević, D. M.,& Jovanic, P.. (2002). Electrophoretic deposition of thin alumina films from water suspension. in Colloids and Surfaces. A: Physicochemical and Engineering Aspects, 209(1), 47-55. https://doi.org/10.1016/S0927-7757(02)00138-3
Simović K, Mišković-Stanković VB, Kićević DM, Jovanic P. Electrophoretic deposition of thin alumina films from water suspension. in Colloids and Surfaces. A: Physicochemical and Engineering Aspects. 2002;209(1):47-55. doi:10.1016/S0927-7757(02)00138-3 .
Simović, Kornelija, Mišković-Stanković, Vesna B., Kićević, Dušan M., Jovanic, P, "Electrophoretic deposition of thin alumina films from water suspension" in Colloids and Surfaces. A: Physicochemical and Engineering Aspects, 209, no. 1 (2002):47-55, https://doi.org/10.1016/S0927-7757(02)00138-3 . .