Thermodynamic consideration of Si-N and Si-H-N systems for silicon nitride powder production in thermal plasma
Само за регистроване кориснике
1996
Чланак у часопису (Објављена верзија)
Метаподаци
Приказ свих података о документуАпстракт
The results of equilibrium composition and total enthalpy computation in the temperature range of 1000-6000 K and at 1 bar for Si-N and Si-H-N systems are presented in the paper. These data enable temperature and energy parameters determination and optimization of the process for ultrafine silicon nitride powder production, in which silicon powder evaporation in a nitrogen thermal plasma is followed by quenching with nitrogen or ammonia.
Извор:
Ceramics International, 1996, 22, 3, 179-186
DOI: 10.1016/0272-8842(95)00072-0
ISSN: 0272-8842
WoS: A1996UH86700001
Scopus: 2-s2.0-0029734503
Колекције
Институција/група
VinčaTY - JOUR AU - Kostić, Života G. AU - Stefanović, Predrag Lj. AU - Pavlović, Pavle B. PY - 1996 UR - https://vinar.vin.bg.ac.rs/handle/123456789/1978 AB - The results of equilibrium composition and total enthalpy computation in the temperature range of 1000-6000 K and at 1 bar for Si-N and Si-H-N systems are presented in the paper. These data enable temperature and energy parameters determination and optimization of the process for ultrafine silicon nitride powder production, in which silicon powder evaporation in a nitrogen thermal plasma is followed by quenching with nitrogen or ammonia. T2 - Ceramics International T1 - Thermodynamic consideration of Si-N and Si-H-N systems for silicon nitride powder production in thermal plasma VL - 22 IS - 3 SP - 179 EP - 186 DO - 10.1016/0272-8842(95)00072-0 ER -
@article{ author = "Kostić, Života G. and Stefanović, Predrag Lj. and Pavlović, Pavle B.", year = "1996", abstract = "The results of equilibrium composition and total enthalpy computation in the temperature range of 1000-6000 K and at 1 bar for Si-N and Si-H-N systems are presented in the paper. These data enable temperature and energy parameters determination and optimization of the process for ultrafine silicon nitride powder production, in which silicon powder evaporation in a nitrogen thermal plasma is followed by quenching with nitrogen or ammonia.", journal = "Ceramics International", title = "Thermodynamic consideration of Si-N and Si-H-N systems for silicon nitride powder production in thermal plasma", volume = "22", number = "3", pages = "179-186", doi = "10.1016/0272-8842(95)00072-0" }
Kostić, Ž. G., Stefanović, P. Lj.,& Pavlović, P. B.. (1996). Thermodynamic consideration of Si-N and Si-H-N systems for silicon nitride powder production in thermal plasma. in Ceramics International, 22(3), 179-186. https://doi.org/10.1016/0272-8842(95)00072-0
Kostić ŽG, Stefanović PL, Pavlović PB. Thermodynamic consideration of Si-N and Si-H-N systems for silicon nitride powder production in thermal plasma. in Ceramics International. 1996;22(3):179-186. doi:10.1016/0272-8842(95)00072-0 .
Kostić, Života G., Stefanović, Predrag Lj., Pavlović, Pavle B., "Thermodynamic consideration of Si-N and Si-H-N systems for silicon nitride powder production in thermal plasma" in Ceramics International, 22, no. 3 (1996):179-186, https://doi.org/10.1016/0272-8842(95)00072-0 . .