Structural changes induced by argon ion irradiation in TiN thin films
Апстракт
In this work, the effects of 120 keV Ar+ ion implantation on the structural properties of TiN thin films were investigated. TiN layers were deposited by d.c. reactive sputtering on Si(100) wafers at room temperature or at 150°C. The thickness of TiN layers was ~240 nm. After deposition the samples were irradiated with 120 keV argon ions to the fluencies of 1×10^15 and 1×10^16 ions/cm2. Structural characterisation was performed with Rutherford backscattering spectroscopy (RBS), cross-sectional transmission electron microscopy (XTEM), grazing angle X-ray diffraction (XRD) and atomic force microscopy (AFM). It was found that the argon ion irradiation induced the changes in the lattice constant, mean grain size, micro-strain and surface morphology of the TiN layers. The observed micro-structural changes are due to the formation of the high density damage region in the TiN thin film structure.
Кључне речи:
TiN / ion implantation / TEM / AFMИзвор:
Processing and Application of Ceramics, 2011, 5, 1, 19-23Финансирање / пројекти:
- Модификација, синтеза и анализа наноструктурних материјала јонским сноповима, гама зрачењем и вакуумским депоновањем (RS-MESTD-MPN2006-2010-141013)
Напомена:
- Paper presented at 4th Serbian Conference on Electron Microscopy, Belgrade, Serbia, 2010
URI
https://doaj.org/article/dc9f3939725e4c5f8759a8d53940e662https://vinar.vin.bg.ac.rs/handle/123456789/7704
Колекције
Институција/група
VinčaTY - JOUR AU - Popović, Maja AU - Novaković, Mirjana M. AU - Rakočević, Zlatko Lj. AU - Bibić, Nataša M. PY - 2011 UR - https://doaj.org/article/dc9f3939725e4c5f8759a8d53940e662 UR - https://vinar.vin.bg.ac.rs/handle/123456789/7704 AB - In this work, the effects of 120 keV Ar+ ion implantation on the structural properties of TiN thin films were investigated. TiN layers were deposited by d.c. reactive sputtering on Si(100) wafers at room temperature or at 150°C. The thickness of TiN layers was ~240 nm. After deposition the samples were irradiated with 120 keV argon ions to the fluencies of 1×10^15 and 1×10^16 ions/cm2. Structural characterisation was performed with Rutherford backscattering spectroscopy (RBS), cross-sectional transmission electron microscopy (XTEM), grazing angle X-ray diffraction (XRD) and atomic force microscopy (AFM). It was found that the argon ion irradiation induced the changes in the lattice constant, mean grain size, micro-strain and surface morphology of the TiN layers. The observed micro-structural changes are due to the formation of the high density damage region in the TiN thin film structure. T2 - Processing and Application of Ceramics T1 - Structural changes induced by argon ion irradiation in TiN thin films VL - 5 IS - 1 SP - 19 EP - 23 DO - 10.2298/PAC1101019P ER -
@article{ author = "Popović, Maja and Novaković, Mirjana M. and Rakočević, Zlatko Lj. and Bibić, Nataša M.", year = "2011", abstract = "In this work, the effects of 120 keV Ar+ ion implantation on the structural properties of TiN thin films were investigated. TiN layers were deposited by d.c. reactive sputtering on Si(100) wafers at room temperature or at 150°C. The thickness of TiN layers was ~240 nm. After deposition the samples were irradiated with 120 keV argon ions to the fluencies of 1×10^15 and 1×10^16 ions/cm2. Structural characterisation was performed with Rutherford backscattering spectroscopy (RBS), cross-sectional transmission electron microscopy (XTEM), grazing angle X-ray diffraction (XRD) and atomic force microscopy (AFM). It was found that the argon ion irradiation induced the changes in the lattice constant, mean grain size, micro-strain and surface morphology of the TiN layers. The observed micro-structural changes are due to the formation of the high density damage region in the TiN thin film structure.", journal = "Processing and Application of Ceramics", title = "Structural changes induced by argon ion irradiation in TiN thin films", volume = "5", number = "1", pages = "19-23", doi = "10.2298/PAC1101019P" }
Popović, M., Novaković, M. M., Rakočević, Z. Lj.,& Bibić, N. M.. (2011). Structural changes induced by argon ion irradiation in TiN thin films. in Processing and Application of Ceramics, 5(1), 19-23. https://doi.org/10.2298/PAC1101019P
Popović M, Novaković MM, Rakočević ZL, Bibić NM. Structural changes induced by argon ion irradiation in TiN thin films. in Processing and Application of Ceramics. 2011;5(1):19-23. doi:10.2298/PAC1101019P .
Popović, Maja, Novaković, Mirjana M., Rakočević, Zlatko Lj., Bibić, Nataša M., "Structural changes induced by argon ion irradiation in TiN thin films" in Processing and Application of Ceramics, 5, no. 1 (2011):19-23, https://doi.org/10.2298/PAC1101019P . .