Influence of substrate temperature and annealing on structural and optical properties of TiO2 films deposited by reactive e-beam evaporation
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Аутори
Pjević, Dejan J.![](/themes/MirageVinar/images/orcid.png)
Marinković, Tijana
Savić, Jasmina
![](/themes/MirageVinar/images/orcid.png)
Bundaleski, Nenad
![](/themes/MirageVinar/images/orcid.png)
Obradović, Marko O.
![](/themes/MirageVinar/images/orcid.png)
Milosavljević, Momir
![](/themes/MirageVinar/images/orcid.png)
Kulik, M.
Чланак у часопису (Објављена верзија)
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The influence of deposition and post-deposition annealing parameters on the structure and optical properties of TiO2 thin films synthesized by reactive e-beam evaporation is reported. Pure Ti (99.9%) was evaporated in oxygen atmosphere to form thin films on Si (100) and glass substrates. Depositions were conducted on substrates held at room temperature and at 200-400 degrees C heated substrates. Post-deposition annealing was done for 3 h at 500 degrees C in air. Compositional and structural studies were performed by Rutherford backscattering spectrometry, X-ray diffraction, and X-ray photoelectron spectroscopy, and optical properties were studied by ultraviolet-visible spectroscopy and analytically by pointwise unconstrained minimization approach method. It was found that both the structure and optical properties of the films are strongly influenced by the deposition and processing parameters. All deposited samples showed good stoichiometry of Ti:O similar to 1:2. Depending on the subs...trate temperature and oxygen pressure in the chamber during the deposition, anatase-rutile mixed films were obtained, and in some cases TiO and Ti2O3 phases were observed. Substrate deposition temperature appears to play the major role on the final structure of the films, while post-deposition annealing adds up for the lack of oxygen in some cases and invokes crystal grain growth of already initiated phases. The results can be interesting towards the development of TiO2 thin films with defined structure and optical properties. (C) 2015 Elsevier B.V. All rights reserved.
Кључне речи:
TiO2 thin films / Reactive evaporation / Optical properties / Rutherford backscattering spectrometry / X-ray photoemission spectroscopyИзвор:
Thin Solid Films, 2015, 591, 224-229Напомена:
- 16th International Conference on Thin Films (ICTF), Oct 13-16, 2014, Dubrovnik, Croatia
DOI: 10.1016/j.tsf.2015.03.012
ISSN: 0040-6090
WoS: 000362008000014
Scopus: 2-s2.0-84942817560
Колекције
Институција/група
VinčaTY - JOUR AU - Pjević, Dejan J. AU - Marinković, Tijana AU - Savić, Jasmina AU - Bundaleski, Nenad AU - Obradović, Marko O. AU - Milosavljević, Momir AU - Kulik, M. PY - 2015 UR - https://vinar.vin.bg.ac.rs/handle/123456789/7079 AB - The influence of deposition and post-deposition annealing parameters on the structure and optical properties of TiO2 thin films synthesized by reactive e-beam evaporation is reported. Pure Ti (99.9%) was evaporated in oxygen atmosphere to form thin films on Si (100) and glass substrates. Depositions were conducted on substrates held at room temperature and at 200-400 degrees C heated substrates. Post-deposition annealing was done for 3 h at 500 degrees C in air. Compositional and structural studies were performed by Rutherford backscattering spectrometry, X-ray diffraction, and X-ray photoelectron spectroscopy, and optical properties were studied by ultraviolet-visible spectroscopy and analytically by pointwise unconstrained minimization approach method. It was found that both the structure and optical properties of the films are strongly influenced by the deposition and processing parameters. All deposited samples showed good stoichiometry of Ti:O similar to 1:2. Depending on the substrate temperature and oxygen pressure in the chamber during the deposition, anatase-rutile mixed films were obtained, and in some cases TiO and Ti2O3 phases were observed. Substrate deposition temperature appears to play the major role on the final structure of the films, while post-deposition annealing adds up for the lack of oxygen in some cases and invokes crystal grain growth of already initiated phases. The results can be interesting towards the development of TiO2 thin films with defined structure and optical properties. (C) 2015 Elsevier B.V. All rights reserved. T2 - Thin Solid Films T1 - Influence of substrate temperature and annealing on structural and optical properties of TiO2 films deposited by reactive e-beam evaporation VL - 591 SP - 224 EP - 229 DO - 10.1016/j.tsf.2015.03.012 ER -
@article{ author = "Pjević, Dejan J. and Marinković, Tijana and Savić, Jasmina and Bundaleski, Nenad and Obradović, Marko O. and Milosavljević, Momir and Kulik, M.", year = "2015", abstract = "The influence of deposition and post-deposition annealing parameters on the structure and optical properties of TiO2 thin films synthesized by reactive e-beam evaporation is reported. Pure Ti (99.9%) was evaporated in oxygen atmosphere to form thin films on Si (100) and glass substrates. Depositions were conducted on substrates held at room temperature and at 200-400 degrees C heated substrates. Post-deposition annealing was done for 3 h at 500 degrees C in air. Compositional and structural studies were performed by Rutherford backscattering spectrometry, X-ray diffraction, and X-ray photoelectron spectroscopy, and optical properties were studied by ultraviolet-visible spectroscopy and analytically by pointwise unconstrained minimization approach method. It was found that both the structure and optical properties of the films are strongly influenced by the deposition and processing parameters. All deposited samples showed good stoichiometry of Ti:O similar to 1:2. Depending on the substrate temperature and oxygen pressure in the chamber during the deposition, anatase-rutile mixed films were obtained, and in some cases TiO and Ti2O3 phases were observed. Substrate deposition temperature appears to play the major role on the final structure of the films, while post-deposition annealing adds up for the lack of oxygen in some cases and invokes crystal grain growth of already initiated phases. The results can be interesting towards the development of TiO2 thin films with defined structure and optical properties. (C) 2015 Elsevier B.V. All rights reserved.", journal = "Thin Solid Films", title = "Influence of substrate temperature and annealing on structural and optical properties of TiO2 films deposited by reactive e-beam evaporation", volume = "591", pages = "224-229", doi = "10.1016/j.tsf.2015.03.012" }
Pjević, D. J., Marinković, T., Savić, J., Bundaleski, N., Obradović, M. O., Milosavljević, M.,& Kulik, M.. (2015). Influence of substrate temperature and annealing on structural and optical properties of TiO2 films deposited by reactive e-beam evaporation. in Thin Solid Films, 591, 224-229. https://doi.org/10.1016/j.tsf.2015.03.012
Pjević DJ, Marinković T, Savić J, Bundaleski N, Obradović MO, Milosavljević M, Kulik M. Influence of substrate temperature and annealing on structural and optical properties of TiO2 films deposited by reactive e-beam evaporation. in Thin Solid Films. 2015;591:224-229. doi:10.1016/j.tsf.2015.03.012 .
Pjević, Dejan J., Marinković, Tijana, Savić, Jasmina, Bundaleski, Nenad, Obradović, Marko O., Milosavljević, Momir, Kulik, M., "Influence of substrate temperature and annealing on structural and optical properties of TiO2 films deposited by reactive e-beam evaporation" in Thin Solid Films, 591 (2015):224-229, https://doi.org/10.1016/j.tsf.2015.03.012 . .