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Microstructural and opto-electrical properties of chromium nitride films implanted with vanadium ions
dc.creator | Novaković, Mirjana M. | |
dc.creator | Traverse, A. | |
dc.creator | Popović, Maja | |
dc.creator | Lieb, K. P. | |
dc.creator | Zhang, Kun | |
dc.creator | Bibić, Nataša M. | |
dc.date.accessioned | 2018-03-03T14:49:16Z | |
dc.date.available | 2018-03-03T14:49:16Z | |
dc.date.issued | 2012 | |
dc.identifier.issn | 1042-0150 | |
dc.identifier.issn | 1029-4953 | |
dc.identifier.uri | https://vinar.vin.bg.ac.rs/handle/123456789/6964 | |
dc.description.abstract | We report on modifications of 280-nm thin polycrystalline CrN layers caused by vanadium ion implantation. The CrN layers were deposited at 150 degrees C by d.c. reactive sputtering on Si(100) wafers and then implanted at room temperature with 80-keV V+ ions to fluences of 1 x 10(17) and 2 x 10(17) ions/cm(2). Rutherford backscattering spectroscopy, cross-sectional transmission electron microscopy, and X-ray diffraction were used to characterize changes in the structural properties of the films. Their optical and electrical properties were analyzed by infrared spectroscopy in reflection mode and electrical resistivity measurements. CrN was found to keep its cubic structure under the conditions of vanadium ion implantation used here. The initially partially non-metallic CrN layer displays metallic character under implantation, which may be related to the possible formation of Cr1-xVxN. | en |
dc.relation | info:eu-repo/grantAgreement/MESTD/Integrated and Interdisciplinary Research (IIR or III)/45005/RS// | |
dc.relation | Deutsche Forschungsgemeinschaft, French-Serbian CNRS-MSTD bilateral collaboration [23119] | |
dc.rights | restrictedAccess | en |
dc.source | Radiation Effects and Defects in Solids | en |
dc.subject | CrN hard coatings | en |
dc.subject | metal ion irradiation | en |
dc.subject | TEM | en |
dc.subject | RBS | en |
dc.subject | XRD | en |
dc.subject | IR | en |
dc.title | Microstructural and opto-electrical properties of chromium nitride films implanted with vanadium ions | en |
dc.type | article | en |
dcterms.abstract | Зханг, К.; Лиеб, К. П.; Бибиц, Н.; Новаковић Мирјана; Поповић Маја; Траверсе, A.; | |
dc.citation.volume | 167 | |
dc.citation.issue | 7 | |
dc.citation.spage | 496 | |
dc.citation.epage | 505 | |
dc.identifier.wos | 000305760300007 | |
dc.identifier.doi | 10.1080/10420150.2012.656639 | |
dc.citation.rank | M23 | |
dc.description.other | REM-4 Conference, Sep 18-22, 2011, Padova, Italy | en |
dc.identifier.scopus | 2-s2.0-84863481660 |
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