Microstructural and opto-electrical properties of chromium nitride films implanted with vanadium ions
Апстракт
We report on modifications of 280-nm thin polycrystalline CrN layers caused by vanadium ion implantation. The CrN layers were deposited at 150 degrees C by d.c. reactive sputtering on Si(100) wafers and then implanted at room temperature with 80-keV V+ ions to fluences of 1 x 10(17) and 2 x 10(17) ions/cm(2). Rutherford backscattering spectroscopy, cross-sectional transmission electron microscopy, and X-ray diffraction were used to characterize changes in the structural properties of the films. Their optical and electrical properties were analyzed by infrared spectroscopy in reflection mode and electrical resistivity measurements. CrN was found to keep its cubic structure under the conditions of vanadium ion implantation used here. The initially partially non-metallic CrN layer displays metallic character under implantation, which may be related to the possible formation of Cr1-xVxN.
Кључне речи:
CrN hard coatings / metal ion irradiation / TEM / RBS / XRD / IRИзвор:
Radiation Effects and Defects in Solids, 2012, 167, 7, 496-505Финансирање / пројекти:
- Функционални, функционализовани и усавршени нано материјали (RS-MESTD-Integrated and Interdisciplinary Research (IIR or III)-45005)
- Deutsche Forschungsgemeinschaft, French-Serbian CNRS-MSTD bilateral collaboration [23119]
Напомена:
- REM-4 Conference, Sep 18-22, 2011, Padova, Italy
DOI: 10.1080/10420150.2012.656639
ISSN: 1042-0150; 1029-4953
WoS: 000305760300007
Scopus: 2-s2.0-84863481660
Колекције
Институција/група
VinčaTY - JOUR AU - Novaković, Mirjana M. AU - Traverse, A. AU - Popović, Maja AU - Lieb, K. P. AU - Zhang, Kun AU - Bibić, Nataša M. PY - 2012 UR - https://vinar.vin.bg.ac.rs/handle/123456789/6964 AB - We report on modifications of 280-nm thin polycrystalline CrN layers caused by vanadium ion implantation. The CrN layers were deposited at 150 degrees C by d.c. reactive sputtering on Si(100) wafers and then implanted at room temperature with 80-keV V+ ions to fluences of 1 x 10(17) and 2 x 10(17) ions/cm(2). Rutherford backscattering spectroscopy, cross-sectional transmission electron microscopy, and X-ray diffraction were used to characterize changes in the structural properties of the films. Their optical and electrical properties were analyzed by infrared spectroscopy in reflection mode and electrical resistivity measurements. CrN was found to keep its cubic structure under the conditions of vanadium ion implantation used here. The initially partially non-metallic CrN layer displays metallic character under implantation, which may be related to the possible formation of Cr1-xVxN. T2 - Radiation Effects and Defects in Solids T1 - Microstructural and opto-electrical properties of chromium nitride films implanted with vanadium ions VL - 167 IS - 7 SP - 496 EP - 505 DO - 10.1080/10420150.2012.656639 ER -
@article{ author = "Novaković, Mirjana M. and Traverse, A. and Popović, Maja and Lieb, K. P. and Zhang, Kun and Bibić, Nataša M.", year = "2012", abstract = "We report on modifications of 280-nm thin polycrystalline CrN layers caused by vanadium ion implantation. The CrN layers were deposited at 150 degrees C by d.c. reactive sputtering on Si(100) wafers and then implanted at room temperature with 80-keV V+ ions to fluences of 1 x 10(17) and 2 x 10(17) ions/cm(2). Rutherford backscattering spectroscopy, cross-sectional transmission electron microscopy, and X-ray diffraction were used to characterize changes in the structural properties of the films. Their optical and electrical properties were analyzed by infrared spectroscopy in reflection mode and electrical resistivity measurements. CrN was found to keep its cubic structure under the conditions of vanadium ion implantation used here. The initially partially non-metallic CrN layer displays metallic character under implantation, which may be related to the possible formation of Cr1-xVxN.", journal = "Radiation Effects and Defects in Solids", title = "Microstructural and opto-electrical properties of chromium nitride films implanted with vanadium ions", volume = "167", number = "7", pages = "496-505", doi = "10.1080/10420150.2012.656639" }
Novaković, M. M., Traverse, A., Popović, M., Lieb, K. P., Zhang, K.,& Bibić, N. M.. (2012). Microstructural and opto-electrical properties of chromium nitride films implanted with vanadium ions. in Radiation Effects and Defects in Solids, 167(7), 496-505. https://doi.org/10.1080/10420150.2012.656639
Novaković MM, Traverse A, Popović M, Lieb KP, Zhang K, Bibić NM. Microstructural and opto-electrical properties of chromium nitride films implanted with vanadium ions. in Radiation Effects and Defects in Solids. 2012;167(7):496-505. doi:10.1080/10420150.2012.656639 .
Novaković, Mirjana M., Traverse, A., Popović, Maja, Lieb, K. P., Zhang, Kun, Bibić, Nataša M., "Microstructural and opto-electrical properties of chromium nitride films implanted with vanadium ions" in Radiation Effects and Defects in Solids, 167, no. 7 (2012):496-505, https://doi.org/10.1080/10420150.2012.656639 . .