Electrical and optical characteristics of Ta2O5 thin films deposited by electron-beam vapor deposition
Apstrakt
Ta2O5 is a material with good perspectives for many applications in modern electronics and information technologies. Several deposition techniques of thin Ta2O5 films have been suggested. Reliable information is still needed, however, on structural, electrical and optical parameters of the films, and their dependence on the deposition technique. We have deposited Ta2O5 thin films by electron-beam evaporation of Ta2O5 powder onto Si, tantalum and glass substrates. The resistivity of the films with various thicknesses was measured by four-point probe method before and after annealing in an oxygen atmosphere. The reflectance in the IR region depending on the substrate and film thickness was shown.
Ključne reči:
deposition / thin films / optical properties / oxidation / Ta2O5Izvor:
Plasma Processes and Polymers, 2006, 3, 2, 174-178Napomena:
- 14th Biannual International Summer School on Vacuum, Electron and Ion Technologies, Sep 12-16, 2005, Burgas, Bulgaria
DOI: 10.1002/ppap.200500110
ISSN: 1612-8850
WoS: 000235628300014
Scopus: 2-s2.0-33644527901
Kolekcije
Institucija/grupa
VinčaTY - JOUR AU - Todorova, Z AU - Donkov, N AU - Ristić, Zoran AU - Bundaleski, Nenad AU - Petrović, Suzana AU - Petkov, M PY - 2006 UR - https://vinar.vin.bg.ac.rs/handle/123456789/6568 AB - Ta2O5 is a material with good perspectives for many applications in modern electronics and information technologies. Several deposition techniques of thin Ta2O5 films have been suggested. Reliable information is still needed, however, on structural, electrical and optical parameters of the films, and their dependence on the deposition technique. We have deposited Ta2O5 thin films by electron-beam evaporation of Ta2O5 powder onto Si, tantalum and glass substrates. The resistivity of the films with various thicknesses was measured by four-point probe method before and after annealing in an oxygen atmosphere. The reflectance in the IR region depending on the substrate and film thickness was shown. T2 - Plasma Processes and Polymers T1 - Electrical and optical characteristics of Ta2O5 thin films deposited by electron-beam vapor deposition VL - 3 IS - 2 SP - 174 EP - 178 DO - 10.1002/ppap.200500110 ER -
@article{ author = "Todorova, Z and Donkov, N and Ristić, Zoran and Bundaleski, Nenad and Petrović, Suzana and Petkov, M", year = "2006", abstract = "Ta2O5 is a material with good perspectives for many applications in modern electronics and information technologies. Several deposition techniques of thin Ta2O5 films have been suggested. Reliable information is still needed, however, on structural, electrical and optical parameters of the films, and their dependence on the deposition technique. We have deposited Ta2O5 thin films by electron-beam evaporation of Ta2O5 powder onto Si, tantalum and glass substrates. The resistivity of the films with various thicknesses was measured by four-point probe method before and after annealing in an oxygen atmosphere. The reflectance in the IR region depending on the substrate and film thickness was shown.", journal = "Plasma Processes and Polymers", title = "Electrical and optical characteristics of Ta2O5 thin films deposited by electron-beam vapor deposition", volume = "3", number = "2", pages = "174-178", doi = "10.1002/ppap.200500110" }
Todorova, Z., Donkov, N., Ristić, Z., Bundaleski, N., Petrović, S.,& Petkov, M.. (2006). Electrical and optical characteristics of Ta2O5 thin films deposited by electron-beam vapor deposition. in Plasma Processes and Polymers, 3(2), 174-178. https://doi.org/10.1002/ppap.200500110
Todorova Z, Donkov N, Ristić Z, Bundaleski N, Petrović S, Petkov M. Electrical and optical characteristics of Ta2O5 thin films deposited by electron-beam vapor deposition. in Plasma Processes and Polymers. 2006;3(2):174-178. doi:10.1002/ppap.200500110 .
Todorova, Z, Donkov, N, Ristić, Zoran, Bundaleski, Nenad, Petrović, Suzana, Petkov, M, "Electrical and optical characteristics of Ta2O5 thin films deposited by electron-beam vapor deposition" in Plasma Processes and Polymers, 3, no. 2 (2006):174-178, https://doi.org/10.1002/ppap.200500110 . .