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dc.creatorRistic, Goran S.
dc.creatorVasovic, Nikola D.
dc.creatorKovačević, Milojko
dc.creatorJaksic, Aleksandar B.
dc.date.accessioned2018-03-01T22:09:19Z
dc.date.available2018-03-01T22:09:19Z
dc.date.issued2011
dc.identifier.issn0168-583X
dc.identifier.issn1872-9584
dc.identifier.urihttps://vinar.vin.bg.ac.rs/handle/123456789/4608
dc.description.abstractThe RADFETs (pMOS dosimeters) were irradiated by ionizing radiation from Co-60 gamma-ray source to dose of 230 Gy(Si) without gate bias, and their reproducibility and sensitivity to radiation were investigated. The completely automatic system containing switching matrix have been used, enabling very reliable measurements of RADFET electrical characteristics. Two sample types from each RADFET chip, with the same gate oxide thickness, but different geometry (channel width and length), were investigated. The samples have shown good reproducibility of the threshold voltage shift during irradiation, i.e., the radiation sensitivity was similar for all samples. Using MG and CP techniques, it has been shown that the slow switching (border) trap density is negligible, but the fixed trap density saturates and the fast switching trap density is linear. (C) 2011 Elsevier B.V. All rights reserved.en
dc.relationinfo:eu-repo/grantAgreement/EC/FP7/207122/EU//
dc.relationinfo:eu-repo/grantAgreement/MESTD/Integrated and Interdisciplinary Research (IIR or III)/43011/RS//
dc.rightsrestrictedAccessen
dc.sourceNuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atomsen
dc.subjectpMOS dosimeteren
dc.subjectRadiation dosimetersen
dc.subjectRADFETsen
dc.subjectMOS transistorsen
dc.subjectIrradiationen
dc.subjectSensitivityen
dc.subjectReproducibilityen
dc.titleThe sensitivity of 100 nm RADFETs with zero gate bias up to dose of 230 Gy(Si)en
dc.typearticleen
dcterms.abstractЈаксиц, Aлександар Б.; Ковацевић Милојко; Ристиц, Горан С.; Васовиц, Никола Д.;
dc.citation.volume269
dc.citation.issue23
dc.citation.spage2703
dc.citation.epage2708
dc.identifier.wos000298072000002
dc.identifier.doi10.1016/j.nimb.2011.08.015
dc.citation.rankM22
dc.identifier.scopus2-s2.0-80053172815


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