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Analysis of SiO2 thin film deposited by reactive sputtering
(Materials Science Forum, 2006)
SiO2 layers were deposited by reactive d.c ion sputtering (using 1 keV Ar+ ion gun) from a high purity silicon target in an oxygen ambient. The base pressure in the deposition chamber was 4.7-10(-9) mbar, and the substrate ...
Cd1-xMnxS nanoparticles: Far-infrared phonon spectroscopy
(Materials Science Forum, 2005)
Phonon spectra of Cd1-xMnxS (x = 0; 0.01; 0.05; 0.1; 0.15; 0.3) nanoparticles (d similar to 4.5 rim) have been investigated by far-infrared reflection (FIR) (spectral range 40 - 600 cm(-1), temperature range 80-300 K) and ...