Structure and morphology of nano-sized W-Ti/Si thin films
2006
Authors
Petrović, SuzanaAdnađević, Borivoj
Peruško, Davor
Popovic, Nada
Bundaleski, Nenad
Radović, Milan
Gaković, Biljana M.
Rakočević, Zlatko Lj.
Article
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Thin films were deposited by d.c. sputtering onto a Silicon Substrate. The influence of the W-Ti thin film thickness to its structural and morphological characteristics of a nano-scale were studied. The phase composition and grain size were studied by X-ray diffraction (XRD), while the surface morphology and surface roughness were determined by scanning tunneling microscopy (STM). The analysis of the phase composition show that the thin films had a polycrystalline structure they were composed of a b.c.c. W phase with the presence of a h.c.p. Ti phase. The XRD peak in the scattering angle interval of 38 degrees-43 degrees was interpreted as an overlap of peaks corresponding to the W(110) and Ti(101) planes. The grain size and the mean surface roughness both increase with the thikness of the thin film. The chemical composition of the thin film surface was also analysed by low energy ions scattering (LEIS). The results show the surface segregation of titanium, as well as a substantial pre...sence of oxygen an the surface.
Keywords:
PVD W-Ti thin film / scanning tunnelling microscopy (STM) / low energy ions scattering (LEIS) / X-ray diffraction (XRD)Source:
Journal of the Serbian Chemical Society, 2006, 71, 8-9, 969-976
DOI: 10.2298/JSC0609969P
ISSN: 0352-5139
WoS: 000242464100014
Scopus: 2-s2.0-33751424871
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VinčaTY - JOUR AU - Petrović, Suzana AU - Adnađević, Borivoj AU - Peruško, Davor AU - Popovic, Nada AU - Bundaleski, Nenad AU - Radović, Milan AU - Gaković, Biljana M. AU - Rakočević, Zlatko Lj. PY - 2006 UR - https://vinar.vin.bg.ac.rs/handle/123456789/3123 AB - Thin films were deposited by d.c. sputtering onto a Silicon Substrate. The influence of the W-Ti thin film thickness to its structural and morphological characteristics of a nano-scale were studied. The phase composition and grain size were studied by X-ray diffraction (XRD), while the surface morphology and surface roughness were determined by scanning tunneling microscopy (STM). The analysis of the phase composition show that the thin films had a polycrystalline structure they were composed of a b.c.c. W phase with the presence of a h.c.p. Ti phase. The XRD peak in the scattering angle interval of 38 degrees-43 degrees was interpreted as an overlap of peaks corresponding to the W(110) and Ti(101) planes. The grain size and the mean surface roughness both increase with the thikness of the thin film. The chemical composition of the thin film surface was also analysed by low energy ions scattering (LEIS). The results show the surface segregation of titanium, as well as a substantial presence of oxygen an the surface. T2 - Journal of the Serbian Chemical Society T1 - Structure and morphology of nano-sized W-Ti/Si thin films VL - 71 IS - 8-9 SP - 969 EP - 976 DO - 10.2298/JSC0609969P ER -
@article{ author = "Petrović, Suzana and Adnađević, Borivoj and Peruško, Davor and Popovic, Nada and Bundaleski, Nenad and Radović, Milan and Gaković, Biljana M. and Rakočević, Zlatko Lj.", year = "2006", abstract = "Thin films were deposited by d.c. sputtering onto a Silicon Substrate. The influence of the W-Ti thin film thickness to its structural and morphological characteristics of a nano-scale were studied. The phase composition and grain size were studied by X-ray diffraction (XRD), while the surface morphology and surface roughness were determined by scanning tunneling microscopy (STM). The analysis of the phase composition show that the thin films had a polycrystalline structure they were composed of a b.c.c. W phase with the presence of a h.c.p. Ti phase. The XRD peak in the scattering angle interval of 38 degrees-43 degrees was interpreted as an overlap of peaks corresponding to the W(110) and Ti(101) planes. The grain size and the mean surface roughness both increase with the thikness of the thin film. The chemical composition of the thin film surface was also analysed by low energy ions scattering (LEIS). The results show the surface segregation of titanium, as well as a substantial presence of oxygen an the surface.", journal = "Journal of the Serbian Chemical Society", title = "Structure and morphology of nano-sized W-Ti/Si thin films", volume = "71", number = "8-9", pages = "969-976", doi = "10.2298/JSC0609969P" }
Petrović, S., Adnađević, B., Peruško, D., Popovic, N., Bundaleski, N., Radović, M., Gaković, B. M.,& Rakočević, Z. Lj.. (2006). Structure and morphology of nano-sized W-Ti/Si thin films. in Journal of the Serbian Chemical Society, 71(8-9), 969-976. https://doi.org/10.2298/JSC0609969P
Petrović S, Adnađević B, Peruško D, Popovic N, Bundaleski N, Radović M, Gaković BM, Rakočević ZL. Structure and morphology of nano-sized W-Ti/Si thin films. in Journal of the Serbian Chemical Society. 2006;71(8-9):969-976. doi:10.2298/JSC0609969P .
Petrović, Suzana, Adnađević, Borivoj, Peruško, Davor, Popovic, Nada, Bundaleski, Nenad, Radović, Milan, Gaković, Biljana M., Rakočević, Zlatko Lj., "Structure and morphology of nano-sized W-Ti/Si thin films" in Journal of the Serbian Chemical Society, 71, no. 8-9 (2006):969-976, https://doi.org/10.2298/JSC0609969P . .