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dc.creatorStojadinović, Stevan
dc.creatorTadić, Nenad
dc.creatorĆirić, Aleksandar
dc.creatorVasilić, Rastko
dc.date.accessioned2025-07-09T12:19:10Z
dc.date.available2025-07-09T12:19:10Z
dc.date.issued2018
dc.identifier.issn0925-3467
dc.identifier.urihttps://vinar.vin.bg.ac.rs/handle/123456789/15157
dc.description.abstractPlasma electrolytic oxidation was used for synthesis of Eu3+ doped monoclinic HfO2 coatings on hafnium substrate. Results of photoluminescence (PL) measurements show the existence of two distinct regions: one that is related to the blue emission originating from oxygen vacancy defects in HfO2 and the other one characterized with a series of sharp orange-red emission peaks related to f–f transitions of Eu3+ from excited level 5D0 to lower levels 7FJ (J = 0, 1, 2, 3, and 4). PL peaks appearing in excitation spectra of obtained coatings are attributed either to charge transfer state of Eu3+ or to direct excitation of the Eu3+ ground state 7F0 into higher levels of the 4f-manifold. PL of formed coatings increases with PEO time due to an increase of oxygen vacancy defects and the content of Eu3+. Acquired experimental data suggest that hypersensitive electrical dipole transition is much more intense than the magnetic dipole transition, indicating that Eu3+ ions occupy a non-inversion symmetry sites.en
dc.relationinfo:eu-repo/grantAgreement/MESTD/Basic Research (BR or ON)/171035/RS//
dc.rightsrestrictedAccess
dc.sourceOptical Materialsen
dc.subjectPhotoluminescenceen
dc.subjectPlasma electrolytic oxidationen
dc.subjectHfO2en
dc.subjectEu3+en
dc.titlePhotoluminescence properties of Eu3+ doped HfO2 coatings formed by plasma electrolytic oxidation of hafniumen
dc.typearticleen
dc.rights.licenseARRen
dc.citation.volume77
dc.citation.spage19
dc.citation.epage24
dc.identifier.doi10.1016/j.optmat.2018.01.014
dc.citation.rankM21
dc.type.versionpublishedVersion
dc.identifier.scopus2-s2.0-85041462617


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