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Determination of the experimental conditions for SiO2 deposition by reactive sputtering

dc.creatorRadović, Ivan
dc.creatorSerruys, Y.
dc.creatorLimoge, Y.
dc.creatorJaoul, O.
dc.creatorPoissonnet, S.
dc.creatorBibić, Nataša
dc.date.accessioned2024-02-21T09:37:12Z
dc.date.available2024-02-21T09:37:12Z
dc.date.issued2005
dc.identifier.urihttps://vinar.vin.bg.ac.rs/handle/123456789/12849
dc.formatapplication/pdf
dc.languageen
dc.publisherČačak : Technical Faculty
dc.rightsopenAccess
dc.rights.urihttps://creativecommons.org/licenses/by-nc-nd/4.0/
dc.sourceVI Scientific Meeting Physics and Technology of Materials - FITEM '05en
dc.subjectSiO2en
dc.subjectthin filmsen
dc.subjectreactive sputteringen
dc.subjectRBS analysisen
dc.subjectelectron microprobeen
dc.titleDetermination of the experimental conditions for SiO2 deposition by reactive sputteringen
dc.typeconferenceObject
dc.rights.licenseBY-NC-ND
dc.citation.spage19
dc.citation.epage19
dc.type.versionpublishedVersion
dc.identifier.fulltexthttp://vinar.vin.bg.ac.rs/bitstream/id/35476/pdfresizer.com-pdf-crop.pdf
dc.identifier.rcubhttps://hdl.handle.net/21.15107/rcub_vinar_12849


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