TY  - JOUR
AU  - Novaković, Mirjana M.
AU  - Traverse, A.
AU  - Popović, Maja
AU  - Lieb, K. P.
AU  - Zhang, Kun
AU  - Bibić, Nataša M.
PY  - 2012
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/6964
AB  - We report on modifications of 280-nm thin polycrystalline CrN layers caused by vanadium ion implantation. The CrN layers were deposited at 150 degrees C by d.c. reactive sputtering on Si(100) wafers and then implanted at room temperature with 80-keV V+ ions to fluences of 1 x 10(17) and 2 x 10(17) ions/cm(2). Rutherford backscattering spectroscopy, cross-sectional transmission electron microscopy, and X-ray diffraction were used to characterize changes in the structural properties of the films. Their optical and electrical properties were analyzed by infrared spectroscopy in reflection mode and electrical resistivity measurements. CrN was found to keep its cubic structure under the conditions of vanadium ion implantation used here. The initially partially non-metallic CrN layer displays metallic character under implantation, which may be related to the possible formation of Cr1-xVxN.
T2  - Radiation Effects and Defects in Solids
T1  - Microstructural and opto-electrical properties of chromium nitride films implanted with vanadium ions
VL  - 167
IS  - 7
SP  - 496
EP  - 505
DO  - 10.1080/10420150.2012.656639
ER  - 

@article{
author = "Novaković, Mirjana M. and Traverse, A. and Popović, Maja and Lieb, K. P. and Zhang, Kun and Bibić, Nataša M.",
year = "2012",
abstract = "We report on modifications of 280-nm thin polycrystalline CrN layers caused by vanadium ion implantation. The CrN layers were deposited at 150 degrees C by d.c. reactive sputtering on Si(100) wafers and then implanted at room temperature with 80-keV V+ ions to fluences of 1 x 10(17) and 2 x 10(17) ions/cm(2). Rutherford backscattering spectroscopy, cross-sectional transmission electron microscopy, and X-ray diffraction were used to characterize changes in the structural properties of the films. Their optical and electrical properties were analyzed by infrared spectroscopy in reflection mode and electrical resistivity measurements. CrN was found to keep its cubic structure under the conditions of vanadium ion implantation used here. The initially partially non-metallic CrN layer displays metallic character under implantation, which may be related to the possible formation of Cr1-xVxN.",
journal = "Radiation Effects and Defects in Solids",
title = "Microstructural and opto-electrical properties of chromium nitride films implanted with vanadium ions",
volume = "167",
number = "7",
pages = "496-505",
doi = "10.1080/10420150.2012.656639"
}

Novaković, M. M., Traverse, A., Popović, M., Lieb, K. P., Zhang, K.,& Bibić, N. M.. (2012). Microstructural and opto-electrical properties of chromium nitride films implanted with vanadium ions. in Radiation Effects and Defects in Solids, 167(7), 496-505.
https://doi.org/10.1080/10420150.2012.656639

Novaković MM, Traverse A, Popović M, Lieb KP, Zhang K, Bibić NM. Microstructural and opto-electrical properties of chromium nitride films implanted with vanadium ions. in Radiation Effects and Defects in Solids. 2012;167(7):496-505.
doi:10.1080/10420150.2012.656639 .

Novaković, Mirjana M., Traverse, A., Popović, Maja, Lieb, K. P., Zhang, Kun, Bibić, Nataša M., "Microstructural and opto-electrical properties of chromium nitride films implanted with vanadium ions" in Radiation Effects and Defects in Solids, 167, no. 7 (2012):496-505,
https://doi.org/10.1080/10420150.2012.656639 . .