TY  - JOUR
AU  - Novaković, Mirjana M.
AU  - Popović, Maja
AU  - Peruško, Davor
AU  - Radović, Ivan
AU  - Milinović, Velimir
AU  - Milosavljević, Momir
PY  - 2007
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/6582
AB  - We present a study of the micro-structural changes induced in Cr-N layers by irradiation with argon ions. The layers were deposited by reactive ion sputtering on (100) Si wafers, to a thickness of 240-280 nm, at different nitrogen partial pressures and different substrate temperatures. The samples were subsequently irradiated with 120 keV Ar+, to 1x10(15) and 1x10(16) ions/cm(2). Structural characterization was performed with Rutherford backscattering spectroscopy, x-ray diffraction analysis and transmission electron microscopy, and we also did electrical resistivity measurements on the samples. It has been found that the layers grow in the form of a polycrystalline columnar structure, with a columnar width of a few tens of nm. The layer composition, Cr2N or CrN, strongly depends on the nitrogen partial pressure during deposition. Ion irradiation induces local micro-structural changes, formation of nano-particles and defects, though the structures retain their polycrystalline nature. The induced crystalline defects yield an increase of electrical resistivity after ion irradiation.
T2  - Materials Science Forum
T1  - Ion Implantation Induced Modifications in Reactively Sputtered Cr-N Layers on Si Substrates
VL  - 555
SP  - 35
EP  - 40
DO  - 10.4028/www.scientific.net/MSF.555.35
ER  - 

@article{
author = "Novaković, Mirjana M. and Popović, Maja and Peruško, Davor and Radović, Ivan and Milinović, Velimir and Milosavljević, Momir",
year = "2007",
abstract = "We present a study of the micro-structural changes induced in Cr-N layers by irradiation with argon ions. The layers were deposited by reactive ion sputtering on (100) Si wafers, to a thickness of 240-280 nm, at different nitrogen partial pressures and different substrate temperatures. The samples were subsequently irradiated with 120 keV Ar+, to 1x10(15) and 1x10(16) ions/cm(2). Structural characterization was performed with Rutherford backscattering spectroscopy, x-ray diffraction analysis and transmission electron microscopy, and we also did electrical resistivity measurements on the samples. It has been found that the layers grow in the form of a polycrystalline columnar structure, with a columnar width of a few tens of nm. The layer composition, Cr2N or CrN, strongly depends on the nitrogen partial pressure during deposition. Ion irradiation induces local micro-structural changes, formation of nano-particles and defects, though the structures retain their polycrystalline nature. The induced crystalline defects yield an increase of electrical resistivity after ion irradiation.",
journal = "Materials Science Forum",
title = "Ion Implantation Induced Modifications in Reactively Sputtered Cr-N Layers on Si Substrates",
volume = "555",
pages = "35-40",
doi = "10.4028/www.scientific.net/MSF.555.35"
}

Novaković, M. M., Popović, M., Peruško, D., Radović, I., Milinović, V.,& Milosavljević, M.. (2007). Ion Implantation Induced Modifications in Reactively Sputtered Cr-N Layers on Si Substrates. in Materials Science Forum, 555, 35-40.
https://doi.org/10.4028/www.scientific.net/MSF.555.35

Novaković MM, Popović M, Peruško D, Radović I, Milinović V, Milosavljević M. Ion Implantation Induced Modifications in Reactively Sputtered Cr-N Layers on Si Substrates. in Materials Science Forum. 2007;555:35-40.
doi:10.4028/www.scientific.net/MSF.555.35 .

Novaković, Mirjana M., Popović, Maja, Peruško, Davor, Radović, Ivan, Milinović, Velimir, Milosavljević, Momir, "Ion Implantation Induced Modifications in Reactively Sputtered Cr-N Layers on Si Substrates" in Materials Science Forum, 555 (2007):35-40,
https://doi.org/10.4028/www.scientific.net/MSF.555.35 . .

TY  - JOUR
AU  - Peruško, Davor
AU  - Bibić, Nataša M.
AU  - Petrović, Suzana
AU  - Popović, Maja
AU  - Novaković, Mirjana M.
AU  - Radović, Ivan
AU  - Milosavljević, Momir
PY  - 2007
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/6677
AB  - The effects of nitrogen pre-implantation of AISI C1045 steel substrates on the properties of deposited TiN coatings were investigated. Nitrogen ion implantations were performed at 40 keV, to the fluences from 5x10(16)-5x10(17) ions/cm(2). On so prepared substrates we deposited 1.3 mu m thick TiN layers by reactive sputtering. Structural characterizations of the samples were performed by grazing incidence X-ray diffraction analysis (GXRD), standard X-ray diffraction analysis (XRD), and scanning electron microscopy (SEM). Microhardness was measured by Vickers method. The obtained results indicate the formation of iron-nitrides in the near surface region of the substrates, more pronounced for higher implanted fluences. The structure of the deposited TiN coatings shows a strong dependence on the pre-implantation of the substrates, which is attributed to the changed local structure at the surface. Ion implantation and deposition of hard TiN coatings induce an increase of the microhardness of this low performance steel of more than eight times.
T2  - Materials Science Forum
T1  - Properties of TiN coatings deposited on nitrogen ion implanted steel C1045
VL  - 555
SP  - 59
EP  - 64
DO  - 10.4028/www.scientific.net/MSF.555.59
ER  - 

@article{
author = "Peruško, Davor and Bibić, Nataša M. and Petrović, Suzana and Popović, Maja and Novaković, Mirjana M. and Radović, Ivan and Milosavljević, Momir",
year = "2007",
abstract = "The effects of nitrogen pre-implantation of AISI C1045 steel substrates on the properties of deposited TiN coatings were investigated. Nitrogen ion implantations were performed at 40 keV, to the fluences from 5x10(16)-5x10(17) ions/cm(2). On so prepared substrates we deposited 1.3 mu m thick TiN layers by reactive sputtering. Structural characterizations of the samples were performed by grazing incidence X-ray diffraction analysis (GXRD), standard X-ray diffraction analysis (XRD), and scanning electron microscopy (SEM). Microhardness was measured by Vickers method. The obtained results indicate the formation of iron-nitrides in the near surface region of the substrates, more pronounced for higher implanted fluences. The structure of the deposited TiN coatings shows a strong dependence on the pre-implantation of the substrates, which is attributed to the changed local structure at the surface. Ion implantation and deposition of hard TiN coatings induce an increase of the microhardness of this low performance steel of more than eight times.",
journal = "Materials Science Forum",
title = "Properties of TiN coatings deposited on nitrogen ion implanted steel C1045",
volume = "555",
pages = "59-64",
doi = "10.4028/www.scientific.net/MSF.555.59"
}

Peruško, D., Bibić, N. M., Petrović, S., Popović, M., Novaković, M. M., Radović, I.,& Milosavljević, M.. (2007). Properties of TiN coatings deposited on nitrogen ion implanted steel C1045. in Materials Science Forum, 555, 59-64.
https://doi.org/10.4028/www.scientific.net/MSF.555.59

Peruško D, Bibić NM, Petrović S, Popović M, Novaković MM, Radović I, Milosavljević M. Properties of TiN coatings deposited on nitrogen ion implanted steel C1045. in Materials Science Forum. 2007;555:59-64.
doi:10.4028/www.scientific.net/MSF.555.59 .

Peruško, Davor, Bibić, Nataša M., Petrović, Suzana, Popović, Maja, Novaković, Mirjana M., Radović, Ivan, Milosavljević, Momir, "Properties of TiN coatings deposited on nitrogen ion implanted steel C1045" in Materials Science Forum, 555 (2007):59-64,
https://doi.org/10.4028/www.scientific.net/MSF.555.59 . .