TY  - JOUR
AU  - Pjević, Dejan J.
AU  - Obradović, Marko O.
AU  - Marinković, Tijana
AU  - Grce, Ana
AU  - Milosavljević, Momir
AU  - Grieseler, Rolf
AU  - Kups, Thomas
AU  - Wilke, Marcus
AU  - Schaaf, Peter
PY  - 2015
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/436
AB  - The influence of sputtering parameters and annealing on the structure and optical properties of TiO2 thin films deposited by RF magnetron sputtering is reported. A pure TiO2 target was used to deposit the films on Si(100) and glass substrates, and Ar/O-2 gas mixture was used for sputtering. It was found that both the structure and the optical properties of the films depend on deposition parameters and annealing. In all cases the as deposited films were oxygen deficient, which could be compensated by post deposition annealing. Changes in the Ar/O-2 mass flow rate affected the films from an amorphous like structure for samples deposited without oxygen to a structure where nano crystalline Futile phase is detected in those deposited with O-2. Annealing of the samples yielded growth of both, ruffle and anatase phases, the ratio depending on the added oxygen content. Increasing mass flow rate of O-2 and annealing are responsible for lowering of the energy band gap values and the increase in refractive index of the films. The results can be interesting towards the development of TiO2 thin films with defined structure and properties. (C) 2015 Elsevier EN. All rights reserved.
T2  - Physica B: Condensed Matter
T1  - Properties of sputtered TiO2 thin films as a function of deposition and annealing parameters
VL  - 463
SP  - 20
EP  - 25
DO  - 10.1016/j.physb.2015.01.037
ER  - 

@article{
author = "Pjević, Dejan J. and Obradović, Marko O. and Marinković, Tijana and Grce, Ana and Milosavljević, Momir and Grieseler, Rolf and Kups, Thomas and Wilke, Marcus and Schaaf, Peter",
year = "2015",
abstract = "The influence of sputtering parameters and annealing on the structure and optical properties of TiO2 thin films deposited by RF magnetron sputtering is reported. A pure TiO2 target was used to deposit the films on Si(100) and glass substrates, and Ar/O-2 gas mixture was used for sputtering. It was found that both the structure and the optical properties of the films depend on deposition parameters and annealing. In all cases the as deposited films were oxygen deficient, which could be compensated by post deposition annealing. Changes in the Ar/O-2 mass flow rate affected the films from an amorphous like structure for samples deposited without oxygen to a structure where nano crystalline Futile phase is detected in those deposited with O-2. Annealing of the samples yielded growth of both, ruffle and anatase phases, the ratio depending on the added oxygen content. Increasing mass flow rate of O-2 and annealing are responsible for lowering of the energy band gap values and the increase in refractive index of the films. The results can be interesting towards the development of TiO2 thin films with defined structure and properties. (C) 2015 Elsevier EN. All rights reserved.",
journal = "Physica B: Condensed Matter",
title = "Properties of sputtered TiO2 thin films as a function of deposition and annealing parameters",
volume = "463",
pages = "20-25",
doi = "10.1016/j.physb.2015.01.037"
}

Pjević, D. J., Obradović, M. O., Marinković, T., Grce, A., Milosavljević, M., Grieseler, R., Kups, T., Wilke, M.,& Schaaf, P.. (2015). Properties of sputtered TiO2 thin films as a function of deposition and annealing parameters. in Physica B: Condensed Matter, 463, 20-25.
https://doi.org/10.1016/j.physb.2015.01.037

Pjević DJ, Obradović MO, Marinković T, Grce A, Milosavljević M, Grieseler R, Kups T, Wilke M, Schaaf P. Properties of sputtered TiO2 thin films as a function of deposition and annealing parameters. in Physica B: Condensed Matter. 2015;463:20-25.
doi:10.1016/j.physb.2015.01.037 .

Pjević, Dejan J., Obradović, Marko O., Marinković, Tijana, Grce, Ana, Milosavljević, Momir, Grieseler, Rolf, Kups, Thomas, Wilke, Marcus, Schaaf, Peter, "Properties of sputtered TiO2 thin films as a function of deposition and annealing parameters" in Physica B: Condensed Matter, 463 (2015):20-25,
https://doi.org/10.1016/j.physb.2015.01.037 . .