ELICSIR - Enhancement of Sceintific Excellence and Innovation Potential in Electronic Instrumentation for Ionising Radiation Environments

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Publications

Commercial P-Channel Power VDMOSFET as X-ray Dosimeter

Ristić, Goran S.; Ilić, Stefan; Veljković, Sandra; Jevtić, Aleksandar S.; Dimitrijević, Strahinja; Palma, Alberto J.; Stanković, Srboljub; Anđelković, Marko S.

(2022)

TY  - JOUR
AU  - Ristić, Goran S.
AU  - Ilić, Stefan
AU  - Veljković, Sandra
AU  - Jevtić, Aleksandar S.
AU  - Dimitrijević, Strahinja
AU  - Palma, Alberto J.
AU  - Stanković, Srboljub
AU  - Anđelković, Marko S.
PY  - 2022
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/10240
AB  - The possibility of using commercial p-channel power vertical double-diffused metal-oxide-semiconductor field-effect transistors (VDMOSFETs) as X-ray sensors is investigated in this case study. In this aspect, the dependence of sensitivity on both the gate voltage and the mean energy for three X-ray beams is examined. The eight gate voltages from 0 to 21 V are applied, and the dependence of the sensitivity on the gate voltage is well fitted using the proposed equation. Regarding X-ray energy, the sensitivity first increases and then decreases as a consequence of the behavior of the mass energy-absorption coefficients and is the largest for RQR8 beam. As the mass energy-absorption coefficients of SiO2 are not found in the literature, the mass energy-absorption coefficients of silicon are used. The behavior of irradiated transistors during annealing at room temperature without gate polarization is also considered.
T2  - Electronics
T1  - Commercial P-Channel Power VDMOSFET as X-ray Dosimeter
VL  - 11
IS  - 6
SP  - 918
DO  - 10.3390/electronics11060918
ER  - 
@article{
author = "Ristić, Goran S. and Ilić, Stefan and Veljković, Sandra and Jevtić, Aleksandar S. and Dimitrijević, Strahinja and Palma, Alberto J. and Stanković, Srboljub and Anđelković, Marko S.",
year = "2022",
abstract = "The possibility of using commercial p-channel power vertical double-diffused metal-oxide-semiconductor field-effect transistors (VDMOSFETs) as X-ray sensors is investigated in this case study. In this aspect, the dependence of sensitivity on both the gate voltage and the mean energy for three X-ray beams is examined. The eight gate voltages from 0 to 21 V are applied, and the dependence of the sensitivity on the gate voltage is well fitted using the proposed equation. Regarding X-ray energy, the sensitivity first increases and then decreases as a consequence of the behavior of the mass energy-absorption coefficients and is the largest for RQR8 beam. As the mass energy-absorption coefficients of SiO2 are not found in the literature, the mass energy-absorption coefficients of silicon are used. The behavior of irradiated transistors during annealing at room temperature without gate polarization is also considered.",
journal = "Electronics",
title = "Commercial P-Channel Power VDMOSFET as X-ray Dosimeter",
volume = "11",
number = "6",
pages = "918",
doi = "10.3390/electronics11060918"
}
Ristić, G. S., Ilić, S., Veljković, S., Jevtić, A. S., Dimitrijević, S., Palma, A. J., Stanković, S.,& Anđelković, M. S.. (2022). Commercial P-Channel Power VDMOSFET as X-ray Dosimeter. in Electronics, 11(6), 918.
https://doi.org/10.3390/electronics11060918
Ristić GS, Ilić S, Veljković S, Jevtić AS, Dimitrijević S, Palma AJ, Stanković S, Anđelković MS. Commercial P-Channel Power VDMOSFET as X-ray Dosimeter. in Electronics. 2022;11(6):918.
doi:10.3390/electronics11060918 .
Ristić, Goran S., Ilić, Stefan, Veljković, Sandra, Jevtić, Aleksandar S., Dimitrijević, Strahinja, Palma, Alberto J., Stanković, Srboljub, Anđelković, Marko S., "Commercial P-Channel Power VDMOSFET as X-ray Dosimeter" in Electronics, 11, no. 6 (2022):918,
https://doi.org/10.3390/electronics11060918 . .
6
2

Stacked floating gate MOSFET as a passive dosimeter

Ilić, Stefan D.; Anđelković, Marko; Carvajal, Miguel Ángel; Duane, Russell; Sarajlić, Milija; Stanković, Srboljub; Ristić, Goran

(RAD Centre, Niš, Serbia, 2022)

TY  - CONF
AU  - Ilić, Stefan D.
AU  - Anđelković, Marko
AU  - Carvajal, Miguel Ángel
AU  - Duane, Russell
AU  - Sarajlić, Milija
AU  - Stanković, Srboljub
AU  - Ristić, Goran
PY  - 2022
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/11117
AB  - Introduction. The approach to increase the sensitivity of semiconductor radiation dosimeter with a stacked design was presented for the thick oxide pMOS transistors, also known as RadFETs (A. Kelleher et al., IEEE transactions on nuclear science 42, 1995). The sensitivity is increasing with the number of RadFETs in stacked structure, but there were limitations because of the diode reverse breakdown voltage during readout current (B. O’Connell et al., In Proceedings of the Third European Conference on Radiation and its Effects on Components and Systems, 1995). Further improvement of the stacked RadFETs device enables detecting a minimum absorbed dose of less than 50 Gy for a 20 V power supply (B. O’Connell et al., Fifth European Conference on Radiation and Its Effects on Components and Systems, 1999). Floating gate MOSFET is a modified structure of MOSFET with another polysilicon gate surrounded by oxide. The advantages of the floating gate MOSFET as a radiation dosimeter are that it does not require thick oxide fabrication and the highest sensitivity is for the zero-bias at the control gate during irradiation (S. Ilić et al., Sensors 20 (11), 2020). Experimental setup. Commercial floating gate MOSFETs designed by Advanced Linear Devices Inc. were used in this paper. Four transistors were connected in the stacked structure (drain and control gate are shorted and connected to the source of the next stacked transistor), and their threshold voltage drift values were measured before and after each irradiation portion with the same conditions. The experiment was performed at the Institute of Nuclear Sciences “Vinča”, Belgrade, Serbia. Radiation source Co-60 was used for irradiation of the components, with the following portions of the absorbed dose (Si): 10 Gy, 10 Gy, 10 Gy, 20 Gy, 50 Gy, 400 Gy, 500 Gy, 4 mGy, 45 mGy, 50 mGy, respectively (absorbed dose was 100 mGy in total). All measurements were performed in a test fixture with triax cables by Keithley 2636A Source Measure Unit. During irradiation, all stacked transistors were zero-biased. Results. Observing the threshold voltage drift of the four stacked floating gate MOS transistors, we noticed that the stack of two transistors has the most stable reading values over time (smallest drift). Considering this, we analyzed only two stacked floating gate MOS transistors as a passive dosimeter for the low doses. The results show that it is possible to detect the first portion of 10 Gy at which the sensitivity of the two stacked transistors is 23 V/Gy. For the next same portion, the sensitivity is 17 V/Gy, while for the third, the value is 7 V/Gy. However, for the next 20 Gy, there is a tiny shift, and the sensitivity is only 1 V/Gy. Decreased sensitivity with absorbed dose is a feature of the floating gate MOSFET that has been observed before for much higher doses (S. Ilić et al., Sensors 20 (11), 2020). There is a large overlap in the threshold voltage drift values for the next four radiation portions. However, for the last two largest portions, 45 and 50 mGy, there is a significant threshold voltage shift with no overlapping, and thus it is possible to determine the sensitivity of 0.0226 and 0.0214 V/Gy, respectively. Conclusions. Using a floating gate MOSFET as a low-dose passive dosimeter is possible, but recharging the floating gate and reusing this device for higher total ionizing doses should be investigated.
PB  - RAD Centre, Niš, Serbia
C3  - RAD 2022 : 10th Jubilee International Conference on Radiation in Various Fields of Research : book of abstracts; June 13-17; Herceg Novi, Montenegro
T1  - Stacked floating gate MOSFET as a passive dosimeter
SP  - 113
DO  - 10.21175/rad.spr.abstr.book.2022.26.12
ER  - 
@conference{
author = "Ilić, Stefan D. and Anđelković, Marko and Carvajal, Miguel Ángel and Duane, Russell and Sarajlić, Milija and Stanković, Srboljub and Ristić, Goran",
year = "2022",
abstract = "Introduction. The approach to increase the sensitivity of semiconductor radiation dosimeter with a stacked design was presented for the thick oxide pMOS transistors, also known as RadFETs (A. Kelleher et al., IEEE transactions on nuclear science 42, 1995). The sensitivity is increasing with the number of RadFETs in stacked structure, but there were limitations because of the diode reverse breakdown voltage during readout current (B. O’Connell et al., In Proceedings of the Third European Conference on Radiation and its Effects on Components and Systems, 1995). Further improvement of the stacked RadFETs device enables detecting a minimum absorbed dose of less than 50 Gy for a 20 V power supply (B. O’Connell et al., Fifth European Conference on Radiation and Its Effects on Components and Systems, 1999). Floating gate MOSFET is a modified structure of MOSFET with another polysilicon gate surrounded by oxide. The advantages of the floating gate MOSFET as a radiation dosimeter are that it does not require thick oxide fabrication and the highest sensitivity is for the zero-bias at the control gate during irradiation (S. Ilić et al., Sensors 20 (11), 2020). Experimental setup. Commercial floating gate MOSFETs designed by Advanced Linear Devices Inc. were used in this paper. Four transistors were connected in the stacked structure (drain and control gate are shorted and connected to the source of the next stacked transistor), and their threshold voltage drift values were measured before and after each irradiation portion with the same conditions. The experiment was performed at the Institute of Nuclear Sciences “Vinča”, Belgrade, Serbia. Radiation source Co-60 was used for irradiation of the components, with the following portions of the absorbed dose (Si): 10 Gy, 10 Gy, 10 Gy, 20 Gy, 50 Gy, 400 Gy, 500 Gy, 4 mGy, 45 mGy, 50 mGy, respectively (absorbed dose was 100 mGy in total). All measurements were performed in a test fixture with triax cables by Keithley 2636A Source Measure Unit. During irradiation, all stacked transistors were zero-biased. Results. Observing the threshold voltage drift of the four stacked floating gate MOS transistors, we noticed that the stack of two transistors has the most stable reading values over time (smallest drift). Considering this, we analyzed only two stacked floating gate MOS transistors as a passive dosimeter for the low doses. The results show that it is possible to detect the first portion of 10 Gy at which the sensitivity of the two stacked transistors is 23 V/Gy. For the next same portion, the sensitivity is 17 V/Gy, while for the third, the value is 7 V/Gy. However, for the next 20 Gy, there is a tiny shift, and the sensitivity is only 1 V/Gy. Decreased sensitivity with absorbed dose is a feature of the floating gate MOSFET that has been observed before for much higher doses (S. Ilić et al., Sensors 20 (11), 2020). There is a large overlap in the threshold voltage drift values for the next four radiation portions. However, for the last two largest portions, 45 and 50 mGy, there is a significant threshold voltage shift with no overlapping, and thus it is possible to determine the sensitivity of 0.0226 and 0.0214 V/Gy, respectively. Conclusions. Using a floating gate MOSFET as a low-dose passive dosimeter is possible, but recharging the floating gate and reusing this device for higher total ionizing doses should be investigated.",
publisher = "RAD Centre, Niš, Serbia",
journal = "RAD 2022 : 10th Jubilee International Conference on Radiation in Various Fields of Research : book of abstracts; June 13-17; Herceg Novi, Montenegro",
title = "Stacked floating gate MOSFET as a passive dosimeter",
pages = "113",
doi = "10.21175/rad.spr.abstr.book.2022.26.12"
}
Ilić, S. D., Anđelković, M., Carvajal, M. Á., Duane, R., Sarajlić, M., Stanković, S.,& Ristić, G.. (2022). Stacked floating gate MOSFET as a passive dosimeter. in RAD 2022 : 10th Jubilee International Conference on Radiation in Various Fields of Research : book of abstracts; June 13-17; Herceg Novi, Montenegro
RAD Centre, Niš, Serbia., 113.
https://doi.org/10.21175/rad.spr.abstr.book.2022.26.12
Ilić SD, Anđelković M, Carvajal MÁ, Duane R, Sarajlić M, Stanković S, Ristić G. Stacked floating gate MOSFET as a passive dosimeter. in RAD 2022 : 10th Jubilee International Conference on Radiation in Various Fields of Research : book of abstracts; June 13-17; Herceg Novi, Montenegro. 2022;:113.
doi:10.21175/rad.spr.abstr.book.2022.26.12 .
Ilić, Stefan D., Anđelković, Marko, Carvajal, Miguel Ángel, Duane, Russell, Sarajlić, Milija, Stanković, Srboljub, Ristić, Goran, "Stacked floating gate MOSFET as a passive dosimeter" in RAD 2022 : 10th Jubilee International Conference on Radiation in Various Fields of Research : book of abstracts; June 13-17; Herceg Novi, Montenegro (2022):113,
https://doi.org/10.21175/rad.spr.abstr.book.2022.26.12 . .

Response of Commercial P-Channel Power VDMOS Transistors to Ionizing Irradiation and Bias Temperature Stress

Veljković, Sandra; Mitrović, Nikola; Davidović, Vojkan; Golubović, Snežana; Djorić-Veljković, Snežana; Paskaleva, Albena; Spassov, Dencho; Stanković, Srboljub; Andjelković, Marko; Prijić, Zoran; Manić, Ivica; Prijić, Aneta; Ristić, Goran; Danković, Danijel

(2022)

TY  - JOUR
AU  - Veljković, Sandra
AU  - Mitrović, Nikola
AU  - Davidović, Vojkan
AU  - Golubović, Snežana
AU  - Djorić-Veljković, Snežana
AU  - Paskaleva, Albena
AU  - Spassov, Dencho
AU  - Stanković, Srboljub
AU  - Andjelković, Marko
AU  - Prijić, Zoran
AU  - Manić, Ivica
AU  - Prijić, Aneta
AU  - Ristić, Goran
AU  - Danković, Danijel
PY  - 2022
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/12130
AB  - n this paper, the e®ects of successively applied static/pulsed negative bias temperature (NBT)stress and irradiation on commercial p-channel power vertical double-di®used metal-oxidesemiconductor (VDMOS) transistors are investigated. To further illustrate the impacts of thesestresses on the power devices, the relative contributions of gate oxide charge (Not) and interfacetraps (Nit) to threshold voltage shifts are shown and studied. It was shown that when irradi-ation without gate voltage is used, the duration of the pre-irradiation static NBT stress has aslightly larger e®ect on the radiation response of power VDMOS transistors. Regarding the factthat the investigated components are more likely to function in the dynamic mode than thestatic mode in practice, additional analysis was focused on the results obtained during thepulsed NBT stress after irradiation. For the components subjected to the pulsed NBT stressafter the irradiation, the e®ects ofNotneutralization andNitpassivation (usually related toannealing) are more enhanced than the components subjected to the static NBT stress, becauseonly a high temperature is applied during the pulse-o® state. It was observed that in devicespreviously irradiated with gate voltage applied, the decrease of threshold voltage shift is sig-ni ̄cantly greater during the pulsed NBT stress than during the static NBT stress
T2  - Journal of Circuits, Systems and Computers
T1  - Response of Commercial P-Channel Power VDMOS Transistors to Ionizing Irradiation and Bias Temperature Stress
VL  - 31
IS  - 18
SP  - 2240003
DO  - 10.1142/S0218126622400035
ER  - 
@article{
author = "Veljković, Sandra and Mitrović, Nikola and Davidović, Vojkan and Golubović, Snežana and Djorić-Veljković, Snežana and Paskaleva, Albena and Spassov, Dencho and Stanković, Srboljub and Andjelković, Marko and Prijić, Zoran and Manić, Ivica and Prijić, Aneta and Ristić, Goran and Danković, Danijel",
year = "2022",
abstract = "n this paper, the e®ects of successively applied static/pulsed negative bias temperature (NBT)stress and irradiation on commercial p-channel power vertical double-di®used metal-oxidesemiconductor (VDMOS) transistors are investigated. To further illustrate the impacts of thesestresses on the power devices, the relative contributions of gate oxide charge (Not) and interfacetraps (Nit) to threshold voltage shifts are shown and studied. It was shown that when irradi-ation without gate voltage is used, the duration of the pre-irradiation static NBT stress has aslightly larger e®ect on the radiation response of power VDMOS transistors. Regarding the factthat the investigated components are more likely to function in the dynamic mode than thestatic mode in practice, additional analysis was focused on the results obtained during thepulsed NBT stress after irradiation. For the components subjected to the pulsed NBT stressafter the irradiation, the e®ects ofNotneutralization andNitpassivation (usually related toannealing) are more enhanced than the components subjected to the static NBT stress, becauseonly a high temperature is applied during the pulse-o® state. It was observed that in devicespreviously irradiated with gate voltage applied, the decrease of threshold voltage shift is sig-ni ̄cantly greater during the pulsed NBT stress than during the static NBT stress",
journal = "Journal of Circuits, Systems and Computers",
title = "Response of Commercial P-Channel Power VDMOS Transistors to Ionizing Irradiation and Bias Temperature Stress",
volume = "31",
number = "18",
pages = "2240003",
doi = "10.1142/S0218126622400035"
}
Veljković, S., Mitrović, N., Davidović, V., Golubović, S., Djorić-Veljković, S., Paskaleva, A., Spassov, D., Stanković, S., Andjelković, M., Prijić, Z., Manić, I., Prijić, A., Ristić, G.,& Danković, D.. (2022). Response of Commercial P-Channel Power VDMOS Transistors to Ionizing Irradiation and Bias Temperature Stress. in Journal of Circuits, Systems and Computers, 31(18), 2240003.
https://doi.org/10.1142/S0218126622400035
Veljković S, Mitrović N, Davidović V, Golubović S, Djorić-Veljković S, Paskaleva A, Spassov D, Stanković S, Andjelković M, Prijić Z, Manić I, Prijić A, Ristić G, Danković D. Response of Commercial P-Channel Power VDMOS Transistors to Ionizing Irradiation and Bias Temperature Stress. in Journal of Circuits, Systems and Computers. 2022;31(18):2240003.
doi:10.1142/S0218126622400035 .
Veljković, Sandra, Mitrović, Nikola, Davidović, Vojkan, Golubović, Snežana, Djorić-Veljković, Snežana, Paskaleva, Albena, Spassov, Dencho, Stanković, Srboljub, Andjelković, Marko, Prijić, Zoran, Manić, Ivica, Prijić, Aneta, Ristić, Goran, Danković, Danijel, "Response of Commercial P-Channel Power VDMOS Transistors to Ionizing Irradiation and Bias Temperature Stress" in Journal of Circuits, Systems and Computers, 31, no. 18 (2022):2240003,
https://doi.org/10.1142/S0218126622400035 . .
1

Radiation sensitive MOSFETs irradiated with various positive gate biases

Ristić, Goran S.; Ilić, Stefan D.; Duane, Russell; Anđelković, Marko S.; Palma, Alberto J.; Lallena, Antonio M.; Krstić, Miloš D.; Stanković, Srboljub J.; Jakšić, Aleksandar B.

(2021)

TY  - JOUR
AU  - Ristić, Goran S.
AU  - Ilić, Stefan D.
AU  - Duane, Russell
AU  - Anđelković, Marko S.
AU  - Palma, Alberto J.
AU  - Lallena, Antonio M.
AU  - Krstić, Miloš D.
AU  - Stanković, Srboljub J.
AU  - Jakšić, Aleksandar B.
PY  - 2021
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/12128
AB  - The RADiation sensitive metal-oxide-semiconductor field-effect-transistors (RADFETs) were irradiated with gamma rays up to absorbed dose of 110 Gy(H2O). The results of threshold voltage, VT, during irradiation with various positive gate biases showed the increase in VT with gate bias. The threshold voltage shift, ΔVT, during irradiation was fitted very well. The contributions of both the fixed traps (FTs) and switching traps (STs) during radiation on ΔVT were analyzed. The results show the significantly higher contribution of FTs than STs. A function that describes the dependence of threshold voltage shift and its components on gate bias was proposed, which fitted the experimental values very well. The annealing at the room temperature without gate bias of irradiated RADFETs was investigated. The recovery of threshold voltage, known as fading, slightly increase with the gate bias applied during radiation. The ΔVT shows the same changes as the threshold voltage component due to fixed states, ΔVft, while there is no change in the threshold voltage component due to switching traps, ΔVst.
T2  - Journal of Radiation Research and Applied Sciences
T1  - Radiation sensitive MOSFETs irradiated with various positive gate biases
VL  - 14
IS  - 1
SP  - 353
EP  - 357
DO  - 10.1080/16878507.2021.1970921
ER  - 
@article{
author = "Ristić, Goran S. and Ilić, Stefan D. and Duane, Russell and Anđelković, Marko S. and Palma, Alberto J. and Lallena, Antonio M. and Krstić, Miloš D. and Stanković, Srboljub J. and Jakšić, Aleksandar B.",
year = "2021",
abstract = "The RADiation sensitive metal-oxide-semiconductor field-effect-transistors (RADFETs) were irradiated with gamma rays up to absorbed dose of 110 Gy(H2O). The results of threshold voltage, VT, during irradiation with various positive gate biases showed the increase in VT with gate bias. The threshold voltage shift, ΔVT, during irradiation was fitted very well. The contributions of both the fixed traps (FTs) and switching traps (STs) during radiation on ΔVT were analyzed. The results show the significantly higher contribution of FTs than STs. A function that describes the dependence of threshold voltage shift and its components on gate bias was proposed, which fitted the experimental values very well. The annealing at the room temperature without gate bias of irradiated RADFETs was investigated. The recovery of threshold voltage, known as fading, slightly increase with the gate bias applied during radiation. The ΔVT shows the same changes as the threshold voltage component due to fixed states, ΔVft, while there is no change in the threshold voltage component due to switching traps, ΔVst.",
journal = "Journal of Radiation Research and Applied Sciences",
title = "Radiation sensitive MOSFETs irradiated with various positive gate biases",
volume = "14",
number = "1",
pages = "353-357",
doi = "10.1080/16878507.2021.1970921"
}
Ristić, G. S., Ilić, S. D., Duane, R., Anđelković, M. S., Palma, A. J., Lallena, A. M., Krstić, M. D., Stanković, S. J.,& Jakšić, A. B.. (2021). Radiation sensitive MOSFETs irradiated with various positive gate biases. in Journal of Radiation Research and Applied Sciences, 14(1), 353-357.
https://doi.org/10.1080/16878507.2021.1970921
Ristić GS, Ilić SD, Duane R, Anđelković MS, Palma AJ, Lallena AM, Krstić MD, Stanković SJ, Jakšić AB. Radiation sensitive MOSFETs irradiated with various positive gate biases. in Journal of Radiation Research and Applied Sciences. 2021;14(1):353-357.
doi:10.1080/16878507.2021.1970921 .
Ristić, Goran S., Ilić, Stefan D., Duane, Russell, Anđelković, Marko S., Palma, Alberto J., Lallena, Antonio M., Krstić, Miloš D., Stanković, Srboljub J., Jakšić, Aleksandar B., "Radiation sensitive MOSFETs irradiated with various positive gate biases" in Journal of Radiation Research and Applied Sciences, 14, no. 1 (2021):353-357,
https://doi.org/10.1080/16878507.2021.1970921 . .
2

Sensitivity of Unbiased Commercial P-channel Power VDMOSFETs to X-ray Radiation

Ristić, Goran S.; Jevtić, Aleksandar S.; Ilić, Stefan; Dimitrijević, Saša; Veljković, Stanislav; Palma, Alberto J.; Stanković, Srboljub; Anđelković, Marko S.

(2021)

TY  - CONF
AU  - Ristić, Goran S.
AU  - Jevtić, Aleksandar S.
AU  - Ilić, Stefan
AU  - Dimitrijević, Saša
AU  - Veljković, Stanislav
AU  - Palma, Alberto J.
AU  - Stanković, Srboljub
AU  - Anđelković, Marko S.
PY  - 2021
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/10021
AB  - The effect of X-rays on the p-channel power vertical double diffused metal-oxide-semiconductor field-effect transistors (VDMOSFETs) was investigated. The VDMOSFETs were irradiated without gate polarization using three different Xray beams. Due to the polyenergetic nature of X-rays, their effect is much more complex than the effect of gamma radiation on transistors. The influence of X-rays on threshold voltage shift $(\Delta V_T)$ and on the creation of fixed traps (FTs) in gate oxide and on switching traps (STs) near and at oxide/semiconductor interface was analyzed. The effect of STs on T is more significant than in the case of y-radiation. The obtained results showed that the sensitivity to radiation depends on the radiation energy, and they are in accordance with the theoretical predictions.
C3  - 2021 IEEE 32nd International Conference on Microelectronics (MIEL)
T1  - Sensitivity of Unbiased Commercial P-channel Power VDMOSFETs to X-ray Radiation
SP  - 341
EP  - 344
DO  - 10.1109/MIEL52794.2021.9569096
ER  - 
@conference{
author = "Ristić, Goran S. and Jevtić, Aleksandar S. and Ilić, Stefan and Dimitrijević, Saša and Veljković, Stanislav and Palma, Alberto J. and Stanković, Srboljub and Anđelković, Marko S.",
year = "2021",
abstract = "The effect of X-rays on the p-channel power vertical double diffused metal-oxide-semiconductor field-effect transistors (VDMOSFETs) was investigated. The VDMOSFETs were irradiated without gate polarization using three different Xray beams. Due to the polyenergetic nature of X-rays, their effect is much more complex than the effect of gamma radiation on transistors. The influence of X-rays on threshold voltage shift $(\Delta V_T)$ and on the creation of fixed traps (FTs) in gate oxide and on switching traps (STs) near and at oxide/semiconductor interface was analyzed. The effect of STs on T is more significant than in the case of y-radiation. The obtained results showed that the sensitivity to radiation depends on the radiation energy, and they are in accordance with the theoretical predictions.",
journal = "2021 IEEE 32nd International Conference on Microelectronics (MIEL)",
title = "Sensitivity of Unbiased Commercial P-channel Power VDMOSFETs to X-ray Radiation",
pages = "341-344",
doi = "10.1109/MIEL52794.2021.9569096"
}
Ristić, G. S., Jevtić, A. S., Ilić, S., Dimitrijević, S., Veljković, S., Palma, A. J., Stanković, S.,& Anđelković, M. S.. (2021). Sensitivity of Unbiased Commercial P-channel Power VDMOSFETs to X-ray Radiation. in 2021 IEEE 32nd International Conference on Microelectronics (MIEL), 341-344.
https://doi.org/10.1109/MIEL52794.2021.9569096
Ristić GS, Jevtić AS, Ilić S, Dimitrijević S, Veljković S, Palma AJ, Stanković S, Anđelković MS. Sensitivity of Unbiased Commercial P-channel Power VDMOSFETs to X-ray Radiation. in 2021 IEEE 32nd International Conference on Microelectronics (MIEL). 2021;:341-344.
doi:10.1109/MIEL52794.2021.9569096 .
Ristić, Goran S., Jevtić, Aleksandar S., Ilić, Stefan, Dimitrijević, Saša, Veljković, Stanislav, Palma, Alberto J., Stanković, Srboljub, Anđelković, Marko S., "Sensitivity of Unbiased Commercial P-channel Power VDMOSFETs to X-ray Radiation" in 2021 IEEE 32nd International Conference on Microelectronics (MIEL) (2021):341-344,
https://doi.org/10.1109/MIEL52794.2021.9569096 . .
2
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Recharging process of commercial floating-gate MOS transistor in dosimetry application

Ilić, Stefan; Anđelković, Marko S.; Duane, Russell; Palma, Alberto J.; Sarajlić, Milija; Stanković, Srboljub; Ristić, Goran S.

(2021)

TY  - JOUR
AU  - Ilić, Stefan
AU  - Anđelković, Marko S.
AU  - Duane, Russell
AU  - Palma, Alberto J.
AU  - Sarajlić, Milija
AU  - Stanković, Srboljub
AU  - Ristić, Goran S.
PY  - 2021
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/10081
AB  - We investigated the recharging process of commercial floating gate device (EPAD) during the six different dose rates and ten irradiation cycles with the highest dose rate. Dose rate dependence of the floating gate dosimeter was observed from 1 Gy/h to 26 Gy/h (H2O). There is no change of the dosimetric characteristic with a constant dose rate of 26 Gy/h for ten cycles. The absorbed dose does not affect the drift of the threshold voltage readings after the irradiation steps. The reprogramming characteristic is not degrading with the absorbed dose for the ten irradiation cycles, giving the promising potential in the application for dosimetric purposes.
T2  - Microelectronics Reliability
T1  - Recharging process of commercial floating-gate MOS transistor in dosimetry application
VL  - 126
SP  - 114322
DO  - 10.1016/j.microrel.2021.114322
ER  - 
@article{
author = "Ilić, Stefan and Anđelković, Marko S. and Duane, Russell and Palma, Alberto J. and Sarajlić, Milija and Stanković, Srboljub and Ristić, Goran S.",
year = "2021",
abstract = "We investigated the recharging process of commercial floating gate device (EPAD) during the six different dose rates and ten irradiation cycles with the highest dose rate. Dose rate dependence of the floating gate dosimeter was observed from 1 Gy/h to 26 Gy/h (H2O). There is no change of the dosimetric characteristic with a constant dose rate of 26 Gy/h for ten cycles. The absorbed dose does not affect the drift of the threshold voltage readings after the irradiation steps. The reprogramming characteristic is not degrading with the absorbed dose for the ten irradiation cycles, giving the promising potential in the application for dosimetric purposes.",
journal = "Microelectronics Reliability",
title = "Recharging process of commercial floating-gate MOS transistor in dosimetry application",
volume = "126",
pages = "114322",
doi = "10.1016/j.microrel.2021.114322"
}
Ilić, S., Anđelković, M. S., Duane, R., Palma, A. J., Sarajlić, M., Stanković, S.,& Ristić, G. S.. (2021). Recharging process of commercial floating-gate MOS transistor in dosimetry application. in Microelectronics Reliability, 126, 114322.
https://doi.org/10.1016/j.microrel.2021.114322
Ilić S, Anđelković MS, Duane R, Palma AJ, Sarajlić M, Stanković S, Ristić GS. Recharging process of commercial floating-gate MOS transistor in dosimetry application. in Microelectronics Reliability. 2021;126:114322.
doi:10.1016/j.microrel.2021.114322 .
Ilić, Stefan, Anđelković, Marko S., Duane, Russell, Palma, Alberto J., Sarajlić, Milija, Stanković, Srboljub, Ristić, Goran S., "Recharging process of commercial floating-gate MOS transistor in dosimetry application" in Microelectronics Reliability, 126 (2021):114322,
https://doi.org/10.1016/j.microrel.2021.114322 . .
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Floating-Gate MOS Transistor with Dynamic Biasing as a Radiation Sensor

Ilić, Stefan; Jevtić, Aleksandar; Stanković, Srboljub; Ristić, Goran

(2020)

TY  - JOUR
AU  - Ilić, Stefan
AU  - Jevtić, Aleksandar
AU  - Stanković, Srboljub
AU  - Ristić, Goran
PY  - 2020
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/9053
AB  - This paper describes the possibility of using an Electrically Programmable Analog Device (EPAD) as a gamma radiation sensor. Zero-biased EPAD has the lowest fading and the highest sensitivity in the 300 Gy dose range. Dynamic bias of the control gate during irradiation was presented for the first time; this method achieved higher sensitivity compared to static-biased EPADs and better linear dependence. Due to the degradation of the transfer characteristics of EPAD during irradiation, a function of the safe operation area has been found that determines the maximum voltage at the control gate for the desired dose, which will not lead to degradation of the transistor. Using an energy band diagram, it was explained why the zero-biased EPAD has higher sensitivity than the static-biased EPAD.
T2  - Sensors
T1  - Floating-Gate MOS Transistor with Dynamic Biasing as a Radiation Sensor
VL  - 20
IS  - 11
SP  - 3329
DO  - 10.3390/s20113329
ER  - 
@article{
author = "Ilić, Stefan and Jevtić, Aleksandar and Stanković, Srboljub and Ristić, Goran",
year = "2020",
abstract = "This paper describes the possibility of using an Electrically Programmable Analog Device (EPAD) as a gamma radiation sensor. Zero-biased EPAD has the lowest fading and the highest sensitivity in the 300 Gy dose range. Dynamic bias of the control gate during irradiation was presented for the first time; this method achieved higher sensitivity compared to static-biased EPADs and better linear dependence. Due to the degradation of the transfer characteristics of EPAD during irradiation, a function of the safe operation area has been found that determines the maximum voltage at the control gate for the desired dose, which will not lead to degradation of the transistor. Using an energy band diagram, it was explained why the zero-biased EPAD has higher sensitivity than the static-biased EPAD.",
journal = "Sensors",
title = "Floating-Gate MOS Transistor with Dynamic Biasing as a Radiation Sensor",
volume = "20",
number = "11",
pages = "3329",
doi = "10.3390/s20113329"
}
Ilić, S., Jevtić, A., Stanković, S.,& Ristić, G.. (2020). Floating-Gate MOS Transistor with Dynamic Biasing as a Radiation Sensor. in Sensors, 20(11), 3329.
https://doi.org/10.3390/s20113329
Ilić S, Jevtić A, Stanković S, Ristić G. Floating-Gate MOS Transistor with Dynamic Biasing as a Radiation Sensor. in Sensors. 2020;20(11):3329.
doi:10.3390/s20113329 .
Ilić, Stefan, Jevtić, Aleksandar, Stanković, Srboljub, Ristić, Goran, "Floating-Gate MOS Transistor with Dynamic Biasing as a Radiation Sensor" in Sensors, 20, no. 11 (2020):3329,
https://doi.org/10.3390/s20113329 . .
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