TY  - JOUR
AU  - Modrić-Šahbazović, Almedina
AU  - Novaković, Mirjana M.
AU  - Popović, Maja
AU  - Schmidt, Emanuel O.
AU  - Gazdić, Izet
AU  - Bibić, Nataša M.
AU  - Ronning, Carsten
AU  - Rakočević, Zlatko Lj.
PY  - 2019
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/8469
AB  - We investigated the structural and optical changes of Si (100) induced by single or multiple low energy silver ion irradiation with fluences up to 1016 ions/cm2. The irradiated samples were analyzed by the means of Rutherford backscattering spectrometry, X-ray photoelectron spectroscopy, transmission electron microscopy and spectroscopic ellipsometry measurements. The results revealed that after 60, 75 and multiple (75 + 60) keV ion implantation Ag atoms are preferentially situated in the near-surface region of the Si with the maximum distribution at 20, 26 and 42 nm, respectively. Spherical-like particles with diameters below 5 nm are homogenously distributed along the ion track of implanted ions. In the case of single ions implantations the Ag nanoparticles are distributed in the shallower regions of silicon, while subsequent implantation of silver with multiple ion energies results in a distribution in a wider region and again a shift of the Ag nanoparticles to larger depths of silicon substrate. As the ion fluence increases a monotonic decrease in the absorption in the ultraviolet region of the spectrum was observed, due to amorphization of the silicon. On the other hand, for the fluences in the range of 1014–1015 ions/cm2 in the long-wave regions wide absorption band appears at wavelengths between 700 nm and 1000 nm, which is due to plasmon resonance of Ag nanoparticles synthesized during implantation. The position of the resonance peak reflects not only the change in the ion fluence, but also the difference in the incident Ag ion energy. After implantation to the higher ion fluences of 1016 ions/cm2 this absorption band was shifted over 1000 nm, which is much above the known values for plasmon resonances of Ag nanoparticles. © 2019 Elsevier B.V.
T2  - Surface and Coatings Technology
T1  - Formation of Ag nanoparticles in Si (100) wafers by single and multiple low energy Ag ions implantation
VL  - 377
SP  - 124913
DO  - 10.1016/j.surfcoat.2019.124913
ER  - 

@article{
author = "Modrić-Šahbazović, Almedina and Novaković, Mirjana M. and Popović, Maja and Schmidt, Emanuel O. and Gazdić, Izet and Bibić, Nataša M. and Ronning, Carsten and Rakočević, Zlatko Lj.",
year = "2019",
abstract = "We investigated the structural and optical changes of Si (100) induced by single or multiple low energy silver ion irradiation with fluences up to 1016 ions/cm2. The irradiated samples were analyzed by the means of Rutherford backscattering spectrometry, X-ray photoelectron spectroscopy, transmission electron microscopy and spectroscopic ellipsometry measurements. The results revealed that after 60, 75 and multiple (75 + 60) keV ion implantation Ag atoms are preferentially situated in the near-surface region of the Si with the maximum distribution at 20, 26 and 42 nm, respectively. Spherical-like particles with diameters below 5 nm are homogenously distributed along the ion track of implanted ions. In the case of single ions implantations the Ag nanoparticles are distributed in the shallower regions of silicon, while subsequent implantation of silver with multiple ion energies results in a distribution in a wider region and again a shift of the Ag nanoparticles to larger depths of silicon substrate. As the ion fluence increases a monotonic decrease in the absorption in the ultraviolet region of the spectrum was observed, due to amorphization of the silicon. On the other hand, for the fluences in the range of 1014–1015 ions/cm2 in the long-wave regions wide absorption band appears at wavelengths between 700 nm and 1000 nm, which is due to plasmon resonance of Ag nanoparticles synthesized during implantation. The position of the resonance peak reflects not only the change in the ion fluence, but also the difference in the incident Ag ion energy. After implantation to the higher ion fluences of 1016 ions/cm2 this absorption band was shifted over 1000 nm, which is much above the known values for plasmon resonances of Ag nanoparticles. © 2019 Elsevier B.V.",
journal = "Surface and Coatings Technology",
title = "Formation of Ag nanoparticles in Si (100) wafers by single and multiple low energy Ag ions implantation",
volume = "377",
pages = "124913",
doi = "10.1016/j.surfcoat.2019.124913"
}

Modrić-Šahbazović, A., Novaković, M. M., Popović, M., Schmidt, E. O., Gazdić, I., Bibić, N. M., Ronning, C.,& Rakočević, Z. Lj.. (2019). Formation of Ag nanoparticles in Si (100) wafers by single and multiple low energy Ag ions implantation. in Surface and Coatings Technology, 377, 124913.
https://doi.org/10.1016/j.surfcoat.2019.124913

Modrić-Šahbazović A, Novaković MM, Popović M, Schmidt EO, Gazdić I, Bibić NM, Ronning C, Rakočević ZL. Formation of Ag nanoparticles in Si (100) wafers by single and multiple low energy Ag ions implantation. in Surface and Coatings Technology. 2019;377:124913.
doi:10.1016/j.surfcoat.2019.124913 .

Modrić-Šahbazović, Almedina, Novaković, Mirjana M., Popović, Maja, Schmidt, Emanuel O., Gazdić, Izet, Bibić, Nataša M., Ronning, Carsten, Rakočević, Zlatko Lj., "Formation of Ag nanoparticles in Si (100) wafers by single and multiple low energy Ag ions implantation" in Surface and Coatings Technology, 377 (2019):124913,
https://doi.org/10.1016/j.surfcoat.2019.124913 . .

TY  - JOUR
AU  - Modrić-Šahbazović, Almedina
AU  - Novaković, Mirjana M.
AU  - Schmidt, Emanuel O.
AU  - Gazdić, Izet
AU  - Đokić, Veljko R.
AU  - Peruško, Davor
AU  - Bibić, Nataša M.
AU  - Ronning, Carsten
AU  - Rakočević, Zlatko Lj.
PY  - 2019
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/8016
AB  - Nanosphere lithography is an effective technique for high throughput fabrication of well-ordered patterns on large areas. This study reports on nanostructuring of silicon samples by means of Ag ions implantation through self-organized polystyrene (PS) masks. The PS nanospheres with a diameter of ∼150 nm were self-assembled in a hexagonal array on top of Si(100) wafers, and then used as a mask for subsequent 60 keV silver ion implantation. Different fluences were applied up to 2 × 1016 ions/cm2 in order to create a distribution of different sizes and densities of buried metal nanoparticles. The surface morphology and the subsurface structures were studied by scanning electron microscopy and cross-sectional transmission electron microscopy, as a function of the mask deformation upon irradiation and the implantation parameters itself. We demonstrate that Ag is implanted into Si only through the mask openings, thus forming a regular array of amorphized regions over the wide area of silicon substrate. These fragments are of similar dimensions of the spheres with widths of about 190 nm and distributed over 60 nm in depth due to the given ion range. At the subsurface region of the implanted fragments, the synthesis of small sized and optically active Ag nanoparticles is clearly observed. The samples show a strong absorption peak in the long-wavelength region from 689 to 745 nm characteristic for surface plasmon resonance excitations, which could be fitted well using the Maxwell-Garnett`s theory. © 2018 Elsevier B.V.
T2  - Optical Materials
T1  - Silicon nanostructuring by Ag ions implantation through nanosphere lithography mask
VL  - 88
SP  - 508
EP  - 515
DO  - 10.1016/j.optmat.2018.12.022
ER  - 

@article{
author = "Modrić-Šahbazović, Almedina and Novaković, Mirjana M. and Schmidt, Emanuel O. and Gazdić, Izet and Đokić, Veljko R. and Peruško, Davor and Bibić, Nataša M. and Ronning, Carsten and Rakočević, Zlatko Lj.",
year = "2019",
abstract = "Nanosphere lithography is an effective technique for high throughput fabrication of well-ordered patterns on large areas. This study reports on nanostructuring of silicon samples by means of Ag ions implantation through self-organized polystyrene (PS) masks. The PS nanospheres with a diameter of ∼150 nm were self-assembled in a hexagonal array on top of Si(100) wafers, and then used as a mask for subsequent 60 keV silver ion implantation. Different fluences were applied up to 2 × 1016 ions/cm2 in order to create a distribution of different sizes and densities of buried metal nanoparticles. The surface morphology and the subsurface structures were studied by scanning electron microscopy and cross-sectional transmission electron microscopy, as a function of the mask deformation upon irradiation and the implantation parameters itself. We demonstrate that Ag is implanted into Si only through the mask openings, thus forming a regular array of amorphized regions over the wide area of silicon substrate. These fragments are of similar dimensions of the spheres with widths of about 190 nm and distributed over 60 nm in depth due to the given ion range. At the subsurface region of the implanted fragments, the synthesis of small sized and optically active Ag nanoparticles is clearly observed. The samples show a strong absorption peak in the long-wavelength region from 689 to 745 nm characteristic for surface plasmon resonance excitations, which could be fitted well using the Maxwell-Garnett`s theory. © 2018 Elsevier B.V.",
journal = "Optical Materials",
title = "Silicon nanostructuring by Ag ions implantation through nanosphere lithography mask",
volume = "88",
pages = "508-515",
doi = "10.1016/j.optmat.2018.12.022"
}

Modrić-Šahbazović, A., Novaković, M. M., Schmidt, E. O., Gazdić, I., Đokić, V. R., Peruško, D., Bibić, N. M., Ronning, C.,& Rakočević, Z. Lj.. (2019). Silicon nanostructuring by Ag ions implantation through nanosphere lithography mask. in Optical Materials, 88, 508-515.
https://doi.org/10.1016/j.optmat.2018.12.022

Modrić-Šahbazović A, Novaković MM, Schmidt EO, Gazdić I, Đokić VR, Peruško D, Bibić NM, Ronning C, Rakočević ZL. Silicon nanostructuring by Ag ions implantation through nanosphere lithography mask. in Optical Materials. 2019;88:508-515.
doi:10.1016/j.optmat.2018.12.022 .

Modrić-Šahbazović, Almedina, Novaković, Mirjana M., Schmidt, Emanuel O., Gazdić, Izet, Đokić, Veljko R., Peruško, Davor, Bibić, Nataša M., Ronning, Carsten, Rakočević, Zlatko Lj., "Silicon nanostructuring by Ag ions implantation through nanosphere lithography mask" in Optical Materials, 88 (2019):508-515,
https://doi.org/10.1016/j.optmat.2018.12.022 . .

TY  - CONF
AU  - Novaković, Mirjana M.
AU  - Popović, Maja
AU  - Schmidt, Emanuel O.
AU  - Schoppe, Philipp
AU  - Mitrić, Miodrag
AU  - Bibić, Nataša M.
AU  - Ronning, Carsten
AU  - Rakočević, Zlatko Lj.
PY  - 2018
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/8733
PB  - Belgrade : Serbian Academy of Sciences and Arts
C3  - Program and Book of Abstracts / First International Conference on Electron Microscopy of Nanostructures ELMINA 2018, August 27-29, 2018, Belgrade, Serbia
T1  - Formation of Ag Nanoparticles in CrN by Using Ag Ion Implantation and Thermal Annealing
SP  - 104
EP  - 106
UR  - https://hdl.handle.net/21.15107/rcub_vinar_8733
ER  - 

@conference{
author = "Novaković, Mirjana M. and Popović, Maja and Schmidt, Emanuel O. and Schoppe, Philipp and Mitrić, Miodrag and Bibić, Nataša M. and Ronning, Carsten and Rakočević, Zlatko Lj.",
year = "2018",
publisher = "Belgrade : Serbian Academy of Sciences and Arts",
journal = "Program and Book of Abstracts / First International Conference on Electron Microscopy of Nanostructures ELMINA 2018, August 27-29, 2018, Belgrade, Serbia",
title = "Formation of Ag Nanoparticles in CrN by Using Ag Ion Implantation and Thermal Annealing",
pages = "104-106",
url = "https://hdl.handle.net/21.15107/rcub_vinar_8733"
}

Novaković, M. M., Popović, M., Schmidt, E. O., Schoppe, P., Mitrić, M., Bibić, N. M., Ronning, C.,& Rakočević, Z. Lj.. (2018). Formation of Ag Nanoparticles in CrN by Using Ag Ion Implantation and Thermal Annealing. in Program and Book of Abstracts / First International Conference on Electron Microscopy of Nanostructures ELMINA 2018, August 27-29, 2018, Belgrade, Serbia
Belgrade : Serbian Academy of Sciences and Arts., 104-106.
https://hdl.handle.net/21.15107/rcub_vinar_8733

Novaković MM, Popović M, Schmidt EO, Schoppe P, Mitrić M, Bibić NM, Ronning C, Rakočević ZL. Formation of Ag Nanoparticles in CrN by Using Ag Ion Implantation and Thermal Annealing. in Program and Book of Abstracts / First International Conference on Electron Microscopy of Nanostructures ELMINA 2018, August 27-29, 2018, Belgrade, Serbia. 2018;:104-106.
https://hdl.handle.net/21.15107/rcub_vinar_8733 .

Novaković, Mirjana M., Popović, Maja, Schmidt, Emanuel O., Schoppe, Philipp, Mitrić, Miodrag, Bibić, Nataša M., Ronning, Carsten, Rakočević, Zlatko Lj., "Formation of Ag Nanoparticles in CrN by Using Ag Ion Implantation and Thermal Annealing" in Program and Book of Abstracts / First International Conference on Electron Microscopy of Nanostructures ELMINA 2018, August 27-29, 2018, Belgrade, Serbia (2018):104-106,
https://hdl.handle.net/21.15107/rcub_vinar_8733 .

TY  - JOUR
AU  - Novaković, Mirjana M.
AU  - Popović, Maja
AU  - Schmidt, Emanuel O.
AU  - Mitrić, Miodrag
AU  - Bibić, Nataša M.
AU  - Rakočević, Zlatko Lj.
AU  - Ronning, Carsten
PY  - 2017
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/1794
AB  - We report on the formation of gold particles in 280 nm thin polycrystalline CrN layers caused by Au+ ion implantation. The CrN layers were deposited at 150 degrees C by d.c. reactive sputtering on Si(100) wafers and then implanted at room temperature with 1501keV Au+ ions to fluences of 2 x 10(16) cm(-2) to 4.1 x 10(16) cm(-2). The implanted layers were analysed by the means of Rutherford backscattering spectrometry, X-ray diffraction, atomic force microscopy and spectroscopic ellipsometry measurements. The results revealed that the Au atoms are situated in the near-surface region of the implanted CrN layers. At the fluence of 2 x 10(16) cm(-2) the formation of Au particles of similar to 200 nm in diameter has been observed. With increasing Au ion fluence the particles coalesce into clusters with dimensions of similar to 7 mu m . The synthesized particles show a strong absorption peak associated with the excitation of surface plasmon resonances (SPR). The position of the SPR peak shifted in the range of 426.8-690.5 nm when the Au+ ion fluence was varied from 2 x 10(16) cm(-2) to 4.1 x 10(16) cm(-2). A correlation of the shift in the peak wavelength caused by the change in the particles size and clustering has been revealed, suggesting that the interaction between Au particles dominate the surface plasmon resonance effect. (C) 2017 Elsevier B.V. All rights reserved.
T2  - Applied Surface Science
T1  - Clustering of gold particles in Au implanted CrN thin films: The effect on the SPR peak position
VL  - 426
SP  - 667
EP  - 673
DO  - 10.1016/j.apsusc.2017.07.233
ER  - 

@article{
author = "Novaković, Mirjana M. and Popović, Maja and Schmidt, Emanuel O. and Mitrić, Miodrag and Bibić, Nataša M. and Rakočević, Zlatko Lj. and Ronning, Carsten",
year = "2017",
abstract = "We report on the formation of gold particles in 280 nm thin polycrystalline CrN layers caused by Au+ ion implantation. The CrN layers were deposited at 150 degrees C by d.c. reactive sputtering on Si(100) wafers and then implanted at room temperature with 1501keV Au+ ions to fluences of 2 x 10(16) cm(-2) to 4.1 x 10(16) cm(-2). The implanted layers were analysed by the means of Rutherford backscattering spectrometry, X-ray diffraction, atomic force microscopy and spectroscopic ellipsometry measurements. The results revealed that the Au atoms are situated in the near-surface region of the implanted CrN layers. At the fluence of 2 x 10(16) cm(-2) the formation of Au particles of similar to 200 nm in diameter has been observed. With increasing Au ion fluence the particles coalesce into clusters with dimensions of similar to 7 mu m . The synthesized particles show a strong absorption peak associated with the excitation of surface plasmon resonances (SPR). The position of the SPR peak shifted in the range of 426.8-690.5 nm when the Au+ ion fluence was varied from 2 x 10(16) cm(-2) to 4.1 x 10(16) cm(-2). A correlation of the shift in the peak wavelength caused by the change in the particles size and clustering has been revealed, suggesting that the interaction between Au particles dominate the surface plasmon resonance effect. (C) 2017 Elsevier B.V. All rights reserved.",
journal = "Applied Surface Science",
title = "Clustering of gold particles in Au implanted CrN thin films: The effect on the SPR peak position",
volume = "426",
pages = "667-673",
doi = "10.1016/j.apsusc.2017.07.233"
}

Novaković, M. M., Popović, M., Schmidt, E. O., Mitrić, M., Bibić, N. M., Rakočević, Z. Lj.,& Ronning, C.. (2017). Clustering of gold particles in Au implanted CrN thin films: The effect on the SPR peak position. in Applied Surface Science, 426, 667-673.
https://doi.org/10.1016/j.apsusc.2017.07.233

Novaković MM, Popović M, Schmidt EO, Mitrić M, Bibić NM, Rakočević ZL, Ronning C. Clustering of gold particles in Au implanted CrN thin films: The effect on the SPR peak position. in Applied Surface Science. 2017;426:667-673.
doi:10.1016/j.apsusc.2017.07.233 .

Novaković, Mirjana M., Popović, Maja, Schmidt, Emanuel O., Mitrić, Miodrag, Bibić, Nataša M., Rakočević, Zlatko Lj., Ronning, Carsten, "Clustering of gold particles in Au implanted CrN thin films: The effect on the SPR peak position" in Applied Surface Science, 426 (2017):667-673,
https://doi.org/10.1016/j.apsusc.2017.07.233 . .

TY  - JOUR
AU  - Novaković, Mirjana M.
AU  - Popović, Maja
AU  - Schmidt, Emanuel O.
AU  - Schoeppe, P.
AU  - Mitrić, Miodrag
AU  - Bibić, Nataša M.
AU  - Ronning, Carsten
AU  - Rakočević, Zlatko Lj.
PY  - 2017
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/1793
AB  - This study reports on the changes of the structural and optical properties occurring in CrN thin films upon Ag ion implantation. The films were grown by reactive sputtering on top of Si (100) wafers at a temperature of around 150 degrees C. Subsequently, the films were implanted with Ag ion fluences in the range of 0.5 x 10(16) ions/cm(2) -2 x 10(16) ions/cm(2) with energy of 200 keV. The structural and morphological changes, promoted by in-vacuum annealing of the as-implanted thin films at 200 degrees C, 400 degrees C and 700 degrees C, resulted in different optical responses of the CrN: Ag films due to the formation of Ag nanoparticles. The nanoparticles were inhomogenously distributed through the layer, which is related to the implantation distribution of silver in CrN. Apart from this, Ag nanoparticles with a size of 20-25 nm were formed at the surface of the layer. These structural properties are responsible for the formation of a broad optical absorption peak. This peak is located at similar to 420 nm and can be associated with the plasmon resonance of Ag particles embedded in the CrN matrix. (C) 2017 Elsevier B.V. All rights reserved.
T2  - Journal of Alloys and Compounds
T1  - Evolution of structural and optical properties of Ag implanted CrN thin films with annealing temperature
VL  - 729
SP  - 671
EP  - 678
DO  - 10.1016/j.jallcom.2017.09.180
ER  - 

@article{
author = "Novaković, Mirjana M. and Popović, Maja and Schmidt, Emanuel O. and Schoeppe, P. and Mitrić, Miodrag and Bibić, Nataša M. and Ronning, Carsten and Rakočević, Zlatko Lj.",
year = "2017",
abstract = "This study reports on the changes of the structural and optical properties occurring in CrN thin films upon Ag ion implantation. The films were grown by reactive sputtering on top of Si (100) wafers at a temperature of around 150 degrees C. Subsequently, the films were implanted with Ag ion fluences in the range of 0.5 x 10(16) ions/cm(2) -2 x 10(16) ions/cm(2) with energy of 200 keV. The structural and morphological changes, promoted by in-vacuum annealing of the as-implanted thin films at 200 degrees C, 400 degrees C and 700 degrees C, resulted in different optical responses of the CrN: Ag films due to the formation of Ag nanoparticles. The nanoparticles were inhomogenously distributed through the layer, which is related to the implantation distribution of silver in CrN. Apart from this, Ag nanoparticles with a size of 20-25 nm were formed at the surface of the layer. These structural properties are responsible for the formation of a broad optical absorption peak. This peak is located at similar to 420 nm and can be associated with the plasmon resonance of Ag particles embedded in the CrN matrix. (C) 2017 Elsevier B.V. All rights reserved.",
journal = "Journal of Alloys and Compounds",
title = "Evolution of structural and optical properties of Ag implanted CrN thin films with annealing temperature",
volume = "729",
pages = "671-678",
doi = "10.1016/j.jallcom.2017.09.180"
}

Novaković, M. M., Popović, M., Schmidt, E. O., Schoeppe, P., Mitrić, M., Bibić, N. M., Ronning, C.,& Rakočević, Z. Lj.. (2017). Evolution of structural and optical properties of Ag implanted CrN thin films with annealing temperature. in Journal of Alloys and Compounds, 729, 671-678.
https://doi.org/10.1016/j.jallcom.2017.09.180

Novaković MM, Popović M, Schmidt EO, Schoeppe P, Mitrić M, Bibić NM, Ronning C, Rakočević ZL. Evolution of structural and optical properties of Ag implanted CrN thin films with annealing temperature. in Journal of Alloys and Compounds. 2017;729:671-678.
doi:10.1016/j.jallcom.2017.09.180 .

Novaković, Mirjana M., Popović, Maja, Schmidt, Emanuel O., Schoeppe, P., Mitrić, Miodrag, Bibić, Nataša M., Ronning, Carsten, Rakočević, Zlatko Lj., "Evolution of structural and optical properties of Ag implanted CrN thin films with annealing temperature" in Journal of Alloys and Compounds, 729 (2017):671-678,
https://doi.org/10.1016/j.jallcom.2017.09.180 . .

TY  - JOUR
AU  - Popović, Maja
AU  - Novaković, Mirjana M.
AU  - Schmidt, Emanuel O.
AU  - Schoeppe, P.
AU  - Bibić, Nataša M.
AU  - Ronning, Carsten
AU  - Rakočević, Zlatko Lj.
PY  - 2017
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/1800
AB  - Titanium nitride (TiN) has emerged as alternative plasmonic material in the visible and near-infrared spectral range due to its metallic properties. We studied the influence of silver ion implantation (fluence range from 0.5 x 10(16)-6 x 10(16) ions/cm(2)) on the structural and optical properties of reactively sputtered 260 nm thick TiN films. The columnar structure was partially destroyed by the irradiation and up to 5 at% of Ag was incorporated into the films within the projected ion range. The formation of cubic Ag nanoparticles with size of 1-2 nm was observed by high resolution transmission electron microscopy and subsequent fast Fourier transform analysis. This presence of Ag within the TiN matrix drastically changes both the real and imaginary component of the dielectric function and provides low optical losses. A Drude Lorentz dielectric analysis based on free electron and oscillator model are carried out to describe the silver influence on the optical behavior of TiN. With increasing ion fluence, the unscreened plasma frequency decreased and broadening increased. The energy, strength and broadening of the interband transitions were studied with respect to the silver ion fluence and correlated with the microstructural changes induced in TiN films. (C) 2017 Elsevier B.V. All rights reserved.
T2  - Optical Materials
T1  - Low-loss and tunable near-zero-epsilon titanium nitride
VL  - 72
SP  - 775
EP  - 780
DO  - 10.1016/j.optmat.2017.07.035
ER  - 

@article{
author = "Popović, Maja and Novaković, Mirjana M. and Schmidt, Emanuel O. and Schoeppe, P. and Bibić, Nataša M. and Ronning, Carsten and Rakočević, Zlatko Lj.",
year = "2017",
abstract = "Titanium nitride (TiN) has emerged as alternative plasmonic material in the visible and near-infrared spectral range due to its metallic properties. We studied the influence of silver ion implantation (fluence range from 0.5 x 10(16)-6 x 10(16) ions/cm(2)) on the structural and optical properties of reactively sputtered 260 nm thick TiN films. The columnar structure was partially destroyed by the irradiation and up to 5 at% of Ag was incorporated into the films within the projected ion range. The formation of cubic Ag nanoparticles with size of 1-2 nm was observed by high resolution transmission electron microscopy and subsequent fast Fourier transform analysis. This presence of Ag within the TiN matrix drastically changes both the real and imaginary component of the dielectric function and provides low optical losses. A Drude Lorentz dielectric analysis based on free electron and oscillator model are carried out to describe the silver influence on the optical behavior of TiN. With increasing ion fluence, the unscreened plasma frequency decreased and broadening increased. The energy, strength and broadening of the interband transitions were studied with respect to the silver ion fluence and correlated with the microstructural changes induced in TiN films. (C) 2017 Elsevier B.V. All rights reserved.",
journal = "Optical Materials",
title = "Low-loss and tunable near-zero-epsilon titanium nitride",
volume = "72",
pages = "775-780",
doi = "10.1016/j.optmat.2017.07.035"
}

Popović, M., Novaković, M. M., Schmidt, E. O., Schoeppe, P., Bibić, N. M., Ronning, C.,& Rakočević, Z. Lj.. (2017). Low-loss and tunable near-zero-epsilon titanium nitride. in Optical Materials, 72, 775-780.
https://doi.org/10.1016/j.optmat.2017.07.035

Popović M, Novaković MM, Schmidt EO, Schoeppe P, Bibić NM, Ronning C, Rakočević ZL. Low-loss and tunable near-zero-epsilon titanium nitride. in Optical Materials. 2017;72:775-780.
doi:10.1016/j.optmat.2017.07.035 .

Popović, Maja, Novaković, Mirjana M., Schmidt, Emanuel O., Schoeppe, P., Bibić, Nataša M., Ronning, Carsten, Rakočević, Zlatko Lj., "Low-loss and tunable near-zero-epsilon titanium nitride" in Optical Materials, 72 (2017):775-780,
https://doi.org/10.1016/j.optmat.2017.07.035 . .