Grieseler, Rolf

Link to this page

Authority KeyName Variants
orcid::0000-0001-5307-7755
  • Grieseler, Rolf (2)
Projects

Author's Bibliography

Nanostructured titanium-dioxide thin films for environmental applications

Grce, Ana; Pjević, Dejan; Milosavljević, Momir; Grieseler, Rolf; Schaaf, Peter

(Belgrade : Serbian Chemical Society, 2018)

TY  - CONF
AU  - Grce, Ana
AU  - Pjević, Dejan
AU  - Milosavljević, Momir
AU  - Grieseler, Rolf
AU  - Schaaf, Peter
PY  - 2018
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/12689
AB  - Titanium-dioxide nanostructures and thin films are interesting for application in environmental protection, for water and air purification from toxic compounds, and photocatalytic degradation of water, where separation of H2  is important for the development of new energy sources. Furthermore, they are interesting for fabrication of solar cells, various sensor applications, transparent conducting oxides (TCO), etc [1-3]. Stoichiometric TiO2 phase has a wide optoelectronic band gap of ~3.2 eV, which makes it a dielectric at lower temperatures and a semiconductor at higher temperatures. It has a high absorption coefficient in the range of UV radiation, but low in the visible light region, and this makes significant constrains for its usage as a photocatalyst. For reducing energy gap, better absorption in visible light region and more efficient application it is necessary to add doping material species, which can be metal or non-metal ions.When used as a photocatalyst in form of a powder, TiO2 nanoparticles are embedded in photosensitizing dyes which absorb visible light, or they are partly covered with nanoparticles of some transition metal to enhance injection of charge carriers. Recent developments involve the use of physical vapor deposition (vacuum evaporation or ion sputtering) to synthesize TiO2  thin film structures, and ion implantation for their doping. The advantage of using physical vapor deposition is that the Ti:O ratio can be varied, and the films can be deposited on any supporting or large area substrates. On the other hand, ion implantation is a proven technique for introducing dopant atomic species into the crystal lattice of semiconductor materials. In these experiments TiO2  thin films were synthesized by physical vapor deposition (PVD) method, using three different procedures: (i) reactive d.c. ion sputtering of pure Ti target, using Ar ions and introducing O2  in the deposition chamber; (ii) r.f. sputtering of TiO2  target, using Ar + O2  gas mixture; and (iii) reactive e-beam evaporation of pure Ti in the presence of introduced O2 . In case of reactive d.c. ion sputtering additional experiments involved a controlled introduction of nitrogen in the interaction chamber, which yielded doping of the deposited TiO2  thin films, in reducing their band gap and enhancing absorption of visible light. The films were deposited to a thickness of a few hundred nm on silicon wafers and glass slide substrates. Structural and compositional characterization of samples included X-ray diffraction analysis (XRD), transmission electron microscopy (TEM, HRTEM), Rutherford backscattering spectrometry (RBS), and X-ray photoelectron spectroscopy (XPS). Optical characterizations were done by measuringthe transmission and diffuse reflection UV/VIS spectra. Photocatalytic activity was measured by determining the photodegradation rate of organic solutions Structural characterization revealed that as-deposited samples grow in form of a mixture of very fine nanocrystalline grains of rutile and anatase TiO2  phases and TiO. Hence, in order to homogenize the TiO2  stoichiometry andinduce the growth of larger grains it was necessary to anneal the samples in air, at temperatures of 400 and 600 o C [4]. This procedure was performed on all samples after deposition. Bright-field cross-sectional images taken from two different TiO2  films deposited on Si wafers are shown in Fig. 1. Sharp contrast regions within the films indicate their polycrystalline structure. The results of investigations showed that it is possible to tailor the structure and properties of the obtained TiO2  thin films by adjusting the processing parameters.
PB  - Belgrade : Serbian Chemical Society
C3  - ENVIROCHEM 2018 : 8th Symposium Chemistry and Environmental Protection : program and the book of abstracts
T1  - Nanostructured titanium-dioxide thin films for environmental applications
SP  - 205
EP  - 206
UR  - https://hdl.handle.net/21.15107/rcub_vinar_12689
ER  - 
@conference{
author = "Grce, Ana and Pjević, Dejan and Milosavljević, Momir and Grieseler, Rolf and Schaaf, Peter",
year = "2018",
abstract = "Titanium-dioxide nanostructures and thin films are interesting for application in environmental protection, for water and air purification from toxic compounds, and photocatalytic degradation of water, where separation of H2  is important for the development of new energy sources. Furthermore, they are interesting for fabrication of solar cells, various sensor applications, transparent conducting oxides (TCO), etc [1-3]. Stoichiometric TiO2 phase has a wide optoelectronic band gap of ~3.2 eV, which makes it a dielectric at lower temperatures and a semiconductor at higher temperatures. It has a high absorption coefficient in the range of UV radiation, but low in the visible light region, and this makes significant constrains for its usage as a photocatalyst. For reducing energy gap, better absorption in visible light region and more efficient application it is necessary to add doping material species, which can be metal or non-metal ions.When used as a photocatalyst in form of a powder, TiO2 nanoparticles are embedded in photosensitizing dyes which absorb visible light, or they are partly covered with nanoparticles of some transition metal to enhance injection of charge carriers. Recent developments involve the use of physical vapor deposition (vacuum evaporation or ion sputtering) to synthesize TiO2  thin film structures, and ion implantation for their doping. The advantage of using physical vapor deposition is that the Ti:O ratio can be varied, and the films can be deposited on any supporting or large area substrates. On the other hand, ion implantation is a proven technique for introducing dopant atomic species into the crystal lattice of semiconductor materials. In these experiments TiO2  thin films were synthesized by physical vapor deposition (PVD) method, using three different procedures: (i) reactive d.c. ion sputtering of pure Ti target, using Ar ions and introducing O2  in the deposition chamber; (ii) r.f. sputtering of TiO2  target, using Ar + O2  gas mixture; and (iii) reactive e-beam evaporation of pure Ti in the presence of introduced O2 . In case of reactive d.c. ion sputtering additional experiments involved a controlled introduction of nitrogen in the interaction chamber, which yielded doping of the deposited TiO2  thin films, in reducing their band gap and enhancing absorption of visible light. The films were deposited to a thickness of a few hundred nm on silicon wafers and glass slide substrates. Structural and compositional characterization of samples included X-ray diffraction analysis (XRD), transmission electron microscopy (TEM, HRTEM), Rutherford backscattering spectrometry (RBS), and X-ray photoelectron spectroscopy (XPS). Optical characterizations were done by measuringthe transmission and diffuse reflection UV/VIS spectra. Photocatalytic activity was measured by determining the photodegradation rate of organic solutions Structural characterization revealed that as-deposited samples grow in form of a mixture of very fine nanocrystalline grains of rutile and anatase TiO2  phases and TiO. Hence, in order to homogenize the TiO2  stoichiometry andinduce the growth of larger grains it was necessary to anneal the samples in air, at temperatures of 400 and 600 o C [4]. This procedure was performed on all samples after deposition. Bright-field cross-sectional images taken from two different TiO2  films deposited on Si wafers are shown in Fig. 1. Sharp contrast regions within the films indicate their polycrystalline structure. The results of investigations showed that it is possible to tailor the structure and properties of the obtained TiO2  thin films by adjusting the processing parameters.",
publisher = "Belgrade : Serbian Chemical Society",
journal = "ENVIROCHEM 2018 : 8th Symposium Chemistry and Environmental Protection : program and the book of abstracts",
title = "Nanostructured titanium-dioxide thin films for environmental applications",
pages = "205-206",
url = "https://hdl.handle.net/21.15107/rcub_vinar_12689"
}
Grce, A., Pjević, D., Milosavljević, M., Grieseler, R.,& Schaaf, P.. (2018). Nanostructured titanium-dioxide thin films for environmental applications. in ENVIROCHEM 2018 : 8th Symposium Chemistry and Environmental Protection : program and the book of abstracts
Belgrade : Serbian Chemical Society., 205-206.
https://hdl.handle.net/21.15107/rcub_vinar_12689
Grce A, Pjević D, Milosavljević M, Grieseler R, Schaaf P. Nanostructured titanium-dioxide thin films for environmental applications. in ENVIROCHEM 2018 : 8th Symposium Chemistry and Environmental Protection : program and the book of abstracts. 2018;:205-206.
https://hdl.handle.net/21.15107/rcub_vinar_12689 .
Grce, Ana, Pjević, Dejan, Milosavljević, Momir, Grieseler, Rolf, Schaaf, Peter, "Nanostructured titanium-dioxide thin films for environmental applications" in ENVIROCHEM 2018 : 8th Symposium Chemistry and Environmental Protection : program and the book of abstracts (2018):205-206,
https://hdl.handle.net/21.15107/rcub_vinar_12689 .

Properties of sputtered TiO2 thin films as a function of deposition and annealing parameters

Pjević, Dejan J.; Obradović, Marko O.; Marinković, Tijana; Grce, Ana; Milosavljević, Momir; Grieseler, Rolf; Kups, Thomas; Wilke, Marcus; Schaaf, Peter

(2015)

TY  - JOUR
AU  - Pjević, Dejan J.
AU  - Obradović, Marko O.
AU  - Marinković, Tijana
AU  - Grce, Ana
AU  - Milosavljević, Momir
AU  - Grieseler, Rolf
AU  - Kups, Thomas
AU  - Wilke, Marcus
AU  - Schaaf, Peter
PY  - 2015
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/436
AB  - The influence of sputtering parameters and annealing on the structure and optical properties of TiO2 thin films deposited by RF magnetron sputtering is reported. A pure TiO2 target was used to deposit the films on Si(100) and glass substrates, and Ar/O-2 gas mixture was used for sputtering. It was found that both the structure and the optical properties of the films depend on deposition parameters and annealing. In all cases the as deposited films were oxygen deficient, which could be compensated by post deposition annealing. Changes in the Ar/O-2 mass flow rate affected the films from an amorphous like structure for samples deposited without oxygen to a structure where nano crystalline Futile phase is detected in those deposited with O-2. Annealing of the samples yielded growth of both, ruffle and anatase phases, the ratio depending on the added oxygen content. Increasing mass flow rate of O-2 and annealing are responsible for lowering of the energy band gap values and the increase in refractive index of the films. The results can be interesting towards the development of TiO2 thin films with defined structure and properties. (C) 2015 Elsevier EN. All rights reserved.
T2  - Physica B: Condensed Matter
T1  - Properties of sputtered TiO2 thin films as a function of deposition and annealing parameters
VL  - 463
SP  - 20
EP  - 25
DO  - 10.1016/j.physb.2015.01.037
ER  - 
@article{
author = "Pjević, Dejan J. and Obradović, Marko O. and Marinković, Tijana and Grce, Ana and Milosavljević, Momir and Grieseler, Rolf and Kups, Thomas and Wilke, Marcus and Schaaf, Peter",
year = "2015",
abstract = "The influence of sputtering parameters and annealing on the structure and optical properties of TiO2 thin films deposited by RF magnetron sputtering is reported. A pure TiO2 target was used to deposit the films on Si(100) and glass substrates, and Ar/O-2 gas mixture was used for sputtering. It was found that both the structure and the optical properties of the films depend on deposition parameters and annealing. In all cases the as deposited films were oxygen deficient, which could be compensated by post deposition annealing. Changes in the Ar/O-2 mass flow rate affected the films from an amorphous like structure for samples deposited without oxygen to a structure where nano crystalline Futile phase is detected in those deposited with O-2. Annealing of the samples yielded growth of both, ruffle and anatase phases, the ratio depending on the added oxygen content. Increasing mass flow rate of O-2 and annealing are responsible for lowering of the energy band gap values and the increase in refractive index of the films. The results can be interesting towards the development of TiO2 thin films with defined structure and properties. (C) 2015 Elsevier EN. All rights reserved.",
journal = "Physica B: Condensed Matter",
title = "Properties of sputtered TiO2 thin films as a function of deposition and annealing parameters",
volume = "463",
pages = "20-25",
doi = "10.1016/j.physb.2015.01.037"
}
Pjević, D. J., Obradović, M. O., Marinković, T., Grce, A., Milosavljević, M., Grieseler, R., Kups, T., Wilke, M.,& Schaaf, P.. (2015). Properties of sputtered TiO2 thin films as a function of deposition and annealing parameters. in Physica B: Condensed Matter, 463, 20-25.
https://doi.org/10.1016/j.physb.2015.01.037
Pjević DJ, Obradović MO, Marinković T, Grce A, Milosavljević M, Grieseler R, Kups T, Wilke M, Schaaf P. Properties of sputtered TiO2 thin films as a function of deposition and annealing parameters. in Physica B: Condensed Matter. 2015;463:20-25.
doi:10.1016/j.physb.2015.01.037 .
Pjević, Dejan J., Obradović, Marko O., Marinković, Tijana, Grce, Ana, Milosavljević, Momir, Grieseler, Rolf, Kups, Thomas, Wilke, Marcus, Schaaf, Peter, "Properties of sputtered TiO2 thin films as a function of deposition and annealing parameters" in Physica B: Condensed Matter, 463 (2015):20-25,
https://doi.org/10.1016/j.physb.2015.01.037 . .
33
29
33