TY  - JOUR
AU  - Jovanović, Zoran M.
AU  - Trstenjak, Urška
AU  - Ho, Hsin-Chia
AU  - Butsyk, Olena
AU  - Chen, Binbin
AU  - Tchernychova, Elena
AU  - Borodavka, Fedir
AU  - Koster, Gertjan
AU  - Hlinka, Jiří
AU  - Spreitzer, Matjaž
PY  - 2023
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/10623
AB  - The application of two-dimensional (2D) materials
has alleviated a number of challenges of traditional epitaxy and
pushed forward the integration of dissimilar materials. Besides
acting as a seed layer for van der Waals epitaxy, the 2D materials�
being atom(s) thick�have also enabled wetting transparency in
which the potential field of the substrate, although partially
screened, is still capable of imposing epitaxial overgrowth. One of
the crucial steps in this technology is the preservation of the quality
of 2D materials during and after their transfer to a substrate of
interest. In the present study, we show that by honing the
achievements of traditional epitaxy and wet chemistry a hybrid
approach can be devised that offers a unique perspective for the
integration of functional oxides with a silicon platform. It is based
on SrO-assisted deoxidation and controllable coverage of silicon surface with a layer(s) of spin-coated graphene oxide, thus
simultaneously allowing both direct and van der Waals epitaxy of SrTiO3 (STO). We were able to grow a high-quality STO pseudosubstrate suitable for further overgrowth of functional oxides, such as PbZr1−xTixO3 (PZT). Given that the quality of the films grown
on a reduced graphene oxide-buffer layer was almost identical to that obtained on SiC-derived graphene, we believe that this
approach may provide new routes for direct and “remote” epitaxy or layer-transfer techniques of dissimilar material systems.
T2  - ACS Applied Materials and Interfaces
T1  - Tiling the Silicon for Added Functionality: PLD Growth of Highly
Crystalline STO and PZT on Graphene Oxide-Buffered Silicon Surface
VL  - 15
SP  - 6058
EP  - 6068
DO  - 10.1021/acsami.2c17351
ER  - 

@article{
author = "Jovanović, Zoran M. and Trstenjak, Urška and Ho, Hsin-Chia and Butsyk, Olena and Chen, Binbin and Tchernychova, Elena and Borodavka, Fedir and Koster, Gertjan and Hlinka, Jiří and Spreitzer, Matjaž",
year = "2023",
abstract = "The application of two-dimensional (2D) materials
has alleviated a number of challenges of traditional epitaxy and
pushed forward the integration of dissimilar materials. Besides
acting as a seed layer for van der Waals epitaxy, the 2D materials�
being atom(s) thick�have also enabled wetting transparency in
which the potential field of the substrate, although partially
screened, is still capable of imposing epitaxial overgrowth. One of
the crucial steps in this technology is the preservation of the quality
of 2D materials during and after their transfer to a substrate of
interest. In the present study, we show that by honing the
achievements of traditional epitaxy and wet chemistry a hybrid
approach can be devised that offers a unique perspective for the
integration of functional oxides with a silicon platform. It is based
on SrO-assisted deoxidation and controllable coverage of silicon surface with a layer(s) of spin-coated graphene oxide, thus
simultaneously allowing both direct and van der Waals epitaxy of SrTiO3 (STO). We were able to grow a high-quality STO pseudosubstrate suitable for further overgrowth of functional oxides, such as PbZr1−xTixO3 (PZT). Given that the quality of the films grown
on a reduced graphene oxide-buffer layer was almost identical to that obtained on SiC-derived graphene, we believe that this
approach may provide new routes for direct and “remote” epitaxy or layer-transfer techniques of dissimilar material systems.",
journal = "ACS Applied Materials and Interfaces",
title = "Tiling the Silicon for Added Functionality: PLD Growth of Highly
Crystalline STO and PZT on Graphene Oxide-Buffered Silicon Surface",
volume = "15",
pages = "6058-6068",
doi = "10.1021/acsami.2c17351"
}

Jovanović, Z. M., Trstenjak, U., Ho, H., Butsyk, O., Chen, B., Tchernychova, E., Borodavka, F., Koster, G., Hlinka, J.,& Spreitzer, M.. (2023). Tiling the Silicon for Added Functionality: PLD Growth of Highly
Crystalline STO and PZT on Graphene Oxide-Buffered Silicon Surface. in ACS Applied Materials and Interfaces, 15, 6058-6068.
https://doi.org/10.1021/acsami.2c17351

Jovanović ZM, Trstenjak U, Ho H, Butsyk O, Chen B, Tchernychova E, Borodavka F, Koster G, Hlinka J, Spreitzer M. Tiling the Silicon for Added Functionality: PLD Growth of Highly
Crystalline STO and PZT on Graphene Oxide-Buffered Silicon Surface. in ACS Applied Materials and Interfaces. 2023;15:6058-6068.
doi:10.1021/acsami.2c17351 .

Jovanović, Zoran M., Trstenjak, Urška, Ho, Hsin-Chia, Butsyk, Olena, Chen, Binbin, Tchernychova, Elena, Borodavka, Fedir, Koster, Gertjan, Hlinka, Jiří, Spreitzer, Matjaž, "Tiling the Silicon for Added Functionality: PLD Growth of Highly
Crystalline STO and PZT on Graphene Oxide-Buffered Silicon Surface" in ACS Applied Materials and Interfaces, 15 (2023):6058-6068,
https://doi.org/10.1021/acsami.2c17351 . .