TY  - JOUR
AU  - Aguincha, R.
AU  - Bundaleski, Nenad
AU  - Bundaleska, N
AU  - Novaković, Mirjana M.
AU  - Henriques, Julio A. P.
AU  - Rakočević, Zlatko Lj.
AU  - Tatarova, Elena
AU  - Teodoro, Orlando M. N. D.
PY  - 2020
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/8616
AB  - Stainless steel and copper technical substrates have been coated by free standing graphene using electrophoretic deposition technique, with the final goal to obtain chemically inert low secondary electron emission surfaces. This class of materials is of utmost interest in future accelerators in order to increase further the flux of accelerated charged particles in the beam. The measured maximum total electron yield of pristine graphene, which has been previously characterized by electron microscopies and X-ray photoelectron spectroscopy, appears to be about 1.0. The deposition parameters have been optimized in order to obtain surfaces with lowest total electron yield, but also composition and morphology close to that of pristine graphene. When applying these optimized deposition parameters graphene coatings on two substrates, i.e. stainless steel and copper, the maximum total electron yield of about 1.04 was obtained. The composition of coatings and the relative amounts of sp2 bonds are slightly worse than those of the pristine graphene, while the surface morphology appears to be the same. Annealing at 150 °C for 64 h in high vacuum, showed that vacuum baking did not affect considerably the electron emission properties of the coatings. © 2019 Elsevier B.V.
T2  - Applied Surface Science
T1  - Low total electron yield graphene coatings produced by electrophoretic deposition
VL  - 504
SP  - 143870
DO  - 10.1016/j.apsusc.2019.143870
ER  - 

@article{
author = "Aguincha, R. and Bundaleski, Nenad and Bundaleska, N and Novaković, Mirjana M. and Henriques, Julio A. P. and Rakočević, Zlatko Lj. and Tatarova, Elena and Teodoro, Orlando M. N. D.",
year = "2020",
abstract = "Stainless steel and copper technical substrates have been coated by free standing graphene using electrophoretic deposition technique, with the final goal to obtain chemically inert low secondary electron emission surfaces. This class of materials is of utmost interest in future accelerators in order to increase further the flux of accelerated charged particles in the beam. The measured maximum total electron yield of pristine graphene, which has been previously characterized by electron microscopies and X-ray photoelectron spectroscopy, appears to be about 1.0. The deposition parameters have been optimized in order to obtain surfaces with lowest total electron yield, but also composition and morphology close to that of pristine graphene. When applying these optimized deposition parameters graphene coatings on two substrates, i.e. stainless steel and copper, the maximum total electron yield of about 1.04 was obtained. The composition of coatings and the relative amounts of sp2 bonds are slightly worse than those of the pristine graphene, while the surface morphology appears to be the same. Annealing at 150 °C for 64 h in high vacuum, showed that vacuum baking did not affect considerably the electron emission properties of the coatings. © 2019 Elsevier B.V.",
journal = "Applied Surface Science",
title = "Low total electron yield graphene coatings produced by electrophoretic deposition",
volume = "504",
pages = "143870",
doi = "10.1016/j.apsusc.2019.143870"
}

Aguincha, R., Bundaleski, N., Bundaleska, N., Novaković, M. M., Henriques, J. A. P., Rakočević, Z. Lj., Tatarova, E.,& Teodoro, O. M. N. D.. (2020). Low total electron yield graphene coatings produced by electrophoretic deposition. in Applied Surface Science, 504, 143870.
https://doi.org/10.1016/j.apsusc.2019.143870

Aguincha R, Bundaleski N, Bundaleska N, Novaković MM, Henriques JAP, Rakočević ZL, Tatarova E, Teodoro OMND. Low total electron yield graphene coatings produced by electrophoretic deposition. in Applied Surface Science. 2020;504:143870.
doi:10.1016/j.apsusc.2019.143870 .

Aguincha, R., Bundaleski, Nenad, Bundaleska, N, Novaković, Mirjana M., Henriques, Julio A. P., Rakočević, Zlatko Lj., Tatarova, Elena, Teodoro, Orlando M. N. D., "Low total electron yield graphene coatings produced by electrophoretic deposition" in Applied Surface Science, 504 (2020):143870,
https://doi.org/10.1016/j.apsusc.2019.143870 . .

TY  - JOUR
AU  - Bundaleska, Neli
AU  - Bundaleski, Nenad
AU  - Dias, Ana Paula Soares
AU  - Dias, Francisco M.
AU  - Abrashev, Miroslav
AU  - Filipič, Gregor
AU  - Cvelbar, Uroš
AU  - Rakočević, Zlatko Lj.
AU  - Kissovski, Zhivko
AU  - Henriques, Julio A. P.
AU  - Tatarova, Elena
PY  - 2018
UR  - http://stacks.iop.org/2053-1591/5/i=9/a=095605?key=crossref.65533764fea7bf832c2dd9637c21d5f1
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/7855
AB  - High level of nitrogen doping (∼25%) of free-standing graphene sheets was achieved using the remote region of a Ar-N2 microwave plasmas. The relation between the percentage of nitrogen in the plasma and the characteristics of the treated samples has been investigated. Structural changes, being mainly created at the surface of graphene, increase significantly with the percentage of nitrogen in the gas mixture. For a mixture containing 5% of N2 about 2.7 at. % of nitrogen was incorporated in the form of imide group and graphitic bonds (70%), and as N bound to sp3 carbon (30%). Increasing the nitrogen amount to 40% results in the production of samples with up to 25% of incorporated nitrogen. Formation of new types of carbon-nitride structures has also been observed. Detailed x-ray Photoelectron Spectroscopy and Transmission Electron Microscopy analysis support the hypothesis that a structure similar to β-C3N4 has been synthesized. © 2018 IOP Publishing Ltd.
T2  - Materials Research Express
T1  - Microwave N2-Ar plasmas applied for N-graphene post synthesis
VL  - 5
IS  - 9
SP  - 095605
DO  - 10.1088/2053-1591/aad7e9
ER  - 

@article{
author = "Bundaleska, Neli and Bundaleski, Nenad and Dias, Ana Paula Soares and Dias, Francisco M. and Abrashev, Miroslav and Filipič, Gregor and Cvelbar, Uroš and Rakočević, Zlatko Lj. and Kissovski, Zhivko and Henriques, Julio A. P. and Tatarova, Elena",
year = "2018",
abstract = "High level of nitrogen doping (∼25%) of free-standing graphene sheets was achieved using the remote region of a Ar-N2 microwave plasmas. The relation between the percentage of nitrogen in the plasma and the characteristics of the treated samples has been investigated. Structural changes, being mainly created at the surface of graphene, increase significantly with the percentage of nitrogen in the gas mixture. For a mixture containing 5% of N2 about 2.7 at. % of nitrogen was incorporated in the form of imide group and graphitic bonds (70%), and as N bound to sp3 carbon (30%). Increasing the nitrogen amount to 40% results in the production of samples with up to 25% of incorporated nitrogen. Formation of new types of carbon-nitride structures has also been observed. Detailed x-ray Photoelectron Spectroscopy and Transmission Electron Microscopy analysis support the hypothesis that a structure similar to β-C3N4 has been synthesized. © 2018 IOP Publishing Ltd.",
journal = "Materials Research Express",
title = "Microwave N2-Ar plasmas applied for N-graphene post synthesis",
volume = "5",
number = "9",
pages = "095605",
doi = "10.1088/2053-1591/aad7e9"
}

Bundaleska, N., Bundaleski, N., Dias, A. P. S., Dias, F. M., Abrashev, M., Filipič, G., Cvelbar, U., Rakočević, Z. Lj., Kissovski, Z., Henriques, J. A. P.,& Tatarova, E.. (2018). Microwave N2-Ar plasmas applied for N-graphene post synthesis. in Materials Research Express, 5(9), 095605.
https://doi.org/10.1088/2053-1591/aad7e9

Bundaleska N, Bundaleski N, Dias APS, Dias FM, Abrashev M, Filipič G, Cvelbar U, Rakočević ZL, Kissovski Z, Henriques JAP, Tatarova E. Microwave N2-Ar plasmas applied for N-graphene post synthesis. in Materials Research Express. 2018;5(9):095605.
doi:10.1088/2053-1591/aad7e9 .

Bundaleska, Neli, Bundaleski, Nenad, Dias, Ana Paula Soares, Dias, Francisco M., Abrashev, Miroslav, Filipič, Gregor, Cvelbar, Uroš, Rakočević, Zlatko Lj., Kissovski, Zhivko, Henriques, Julio A. P., Tatarova, Elena, "Microwave N2-Ar plasmas applied for N-graphene post synthesis" in Materials Research Express, 5, no. 9 (2018):095605,
https://doi.org/10.1088/2053-1591/aad7e9 . .

TY  - JOUR
AU  - Dias, Ana Paula Soares
AU  - Bundaleski, Nenad
AU  - Tatarova, Elena
AU  - Dias, Francisco M.
AU  - Abrashev, Miroslav
AU  - Cvelbar, Uroš
AU  - Teodoro, Orlando M. N. D.
AU  - Henriques, Julio A. P.
PY  - 2016
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/912
AB  - Self-standing N-graphene sheets were produced in low-pressure microwave N-2-Ar plasma. The graphene sheets were exposed to the plasma for various durations and doped with nitrogen atoms, which were incorporated into the hexagonal carbon lattice in pyridinic, pyrrolic and quaternary functional groups, mainly. Atomic nitrogen emissions at the substrate position in the plasma were detected using optical emission spectroscopy. Raman spectroscopy, x-ray photoelectron spectroscopy and transmission electron microscopy techniques were also applied for material characterization. Doping levels as high as 5.6% were achieved and an increase in the sp(2)/sp(3) ratio was observed for a relatively short exposure time.
T2  - Journal of Physics. D: Applied Physics
T1  - Production of N-graphene by microwave N-2-Ar plasma
VL  - 49
IS  - 5
DO  - 10.1088/0022-3727/49/5/055307
ER  - 

@article{
author = "Dias, Ana Paula Soares and Bundaleski, Nenad and Tatarova, Elena and Dias, Francisco M. and Abrashev, Miroslav and Cvelbar, Uroš and Teodoro, Orlando M. N. D. and Henriques, Julio A. P.",
year = "2016",
abstract = "Self-standing N-graphene sheets were produced in low-pressure microwave N-2-Ar plasma. The graphene sheets were exposed to the plasma for various durations and doped with nitrogen atoms, which were incorporated into the hexagonal carbon lattice in pyridinic, pyrrolic and quaternary functional groups, mainly. Atomic nitrogen emissions at the substrate position in the plasma were detected using optical emission spectroscopy. Raman spectroscopy, x-ray photoelectron spectroscopy and transmission electron microscopy techniques were also applied for material characterization. Doping levels as high as 5.6% were achieved and an increase in the sp(2)/sp(3) ratio was observed for a relatively short exposure time.",
journal = "Journal of Physics. D: Applied Physics",
title = "Production of N-graphene by microwave N-2-Ar plasma",
volume = "49",
number = "5",
doi = "10.1088/0022-3727/49/5/055307"
}

Dias, A. P. S., Bundaleski, N., Tatarova, E., Dias, F. M., Abrashev, M., Cvelbar, U., Teodoro, O. M. N. D.,& Henriques, J. A. P.. (2016). Production of N-graphene by microwave N-2-Ar plasma. in Journal of Physics. D: Applied Physics, 49(5).
https://doi.org/10.1088/0022-3727/49/5/055307

Dias APS, Bundaleski N, Tatarova E, Dias FM, Abrashev M, Cvelbar U, Teodoro OMND, Henriques JAP. Production of N-graphene by microwave N-2-Ar plasma. in Journal of Physics. D: Applied Physics. 2016;49(5).
doi:10.1088/0022-3727/49/5/055307 .

Dias, Ana Paula Soares, Bundaleski, Nenad, Tatarova, Elena, Dias, Francisco M., Abrashev, Miroslav, Cvelbar, Uroš, Teodoro, Orlando M. N. D., Henriques, Julio A. P., "Production of N-graphene by microwave N-2-Ar plasma" in Journal of Physics. D: Applied Physics, 49, no. 5 (2016),
https://doi.org/10.1088/0022-3727/49/5/055307 . .