TY  - JOUR
AU  - Popović, Maja
AU  - Novaković, Mirjana
AU  - Pjević, Dejan
AU  - Vana, Dušan
AU  - Jugović, Dragana
AU  - Tošić, Dragana
AU  - Noga, Pavol
PY  - 2024
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/12279
AB  - In the present paper, the effects of metal ion implantation on the structural and optical properties of TiN thin films have been investigated. TiN films of 170 nm thickness were grown by d.c. reactive sputtering on Si (100) wafers and then irradiated at 5 × 1016 ions/cm2 with either Au, Ag, or Cu ions by using two different energies per each implanted metal. The results showed that as deposited TiN crystallizes in the form of a fcc cubic structure, with the crystallites preferentially oriented along the (111) plane. For all implanted layers, the cubic structure was preserved, but compared to as deposited TiN the crystallites were smaller and the lattice was contracted. These changes were correlated with the depth distribution of Au, Ag and Cu ions and assigned to implantation-induced damage that was larger when higher ion energies were used. High-resolution XPS spectra of the surface of as deposited sample showed the coexistence of TiN, TiO2 and TiOxNy phases and this was related to the surface oxidation of the films due to the exposure to air. After implantation, the results were almost similar for all metals, showing an increase in TiO2 contribution and the formation of pure metallic Au and Ag phases, while copper is in the Cu2+ state, which is attributed to Cu(II)-oxide and Cu(OH)2. The microstructural characteristics including defect formation, changes in crystallite size and lattice contraction, and also growth of different metallic phases during implantations were correlated with the findings of the optical characterization of the implanted films. For the as deposited film we found an energy gap of 2.91 eV, which was lower than the value typical for TiN. After implantation the gap was shifted to higher energies, while at the visible part of the region, the existence of additional energy levels, at photon energies below 2.9 eV was observed. Besides, all implanted films showed degraded photocatalytic activity compared to as deposited TiN, among which Cu-implanted samples exhibited the best photocatalytic performances. The lower photocatalytic activity of Au and Ag implanted films compared to Cu implantations was ascribed to larger structural defects and the formation of less favorable electronic states.
T2  - Journal of Alloys and Compounds
T1  - Investigating on the microstructure and optical properties of Au, Ag and Cu implanted TiN thin films: The effects of surface oxidation and ion-induced defects
VL  - 976
SP  - 173046
DO  - 10.1016/j.jallcom.2023.173046
ER  - 

@article{
author = "Popović, Maja and Novaković, Mirjana and Pjević, Dejan and Vana, Dušan and Jugović, Dragana and Tošić, Dragana and Noga, Pavol",
year = "2024",
abstract = "In the present paper, the effects of metal ion implantation on the structural and optical properties of TiN thin films have been investigated. TiN films of 170 nm thickness were grown by d.c. reactive sputtering on Si (100) wafers and then irradiated at 5 × 1016 ions/cm2 with either Au, Ag, or Cu ions by using two different energies per each implanted metal. The results showed that as deposited TiN crystallizes in the form of a fcc cubic structure, with the crystallites preferentially oriented along the (111) plane. For all implanted layers, the cubic structure was preserved, but compared to as deposited TiN the crystallites were smaller and the lattice was contracted. These changes were correlated with the depth distribution of Au, Ag and Cu ions and assigned to implantation-induced damage that was larger when higher ion energies were used. High-resolution XPS spectra of the surface of as deposited sample showed the coexistence of TiN, TiO2 and TiOxNy phases and this was related to the surface oxidation of the films due to the exposure to air. After implantation, the results were almost similar for all metals, showing an increase in TiO2 contribution and the formation of pure metallic Au and Ag phases, while copper is in the Cu2+ state, which is attributed to Cu(II)-oxide and Cu(OH)2. The microstructural characteristics including defect formation, changes in crystallite size and lattice contraction, and also growth of different metallic phases during implantations were correlated with the findings of the optical characterization of the implanted films. For the as deposited film we found an energy gap of 2.91 eV, which was lower than the value typical for TiN. After implantation the gap was shifted to higher energies, while at the visible part of the region, the existence of additional energy levels, at photon energies below 2.9 eV was observed. Besides, all implanted films showed degraded photocatalytic activity compared to as deposited TiN, among which Cu-implanted samples exhibited the best photocatalytic performances. The lower photocatalytic activity of Au and Ag implanted films compared to Cu implantations was ascribed to larger structural defects and the formation of less favorable electronic states.",
journal = "Journal of Alloys and Compounds",
title = "Investigating on the microstructure and optical properties of Au, Ag and Cu implanted TiN thin films: The effects of surface oxidation and ion-induced defects",
volume = "976",
pages = "173046",
doi = "10.1016/j.jallcom.2023.173046"
}

Popović, M., Novaković, M., Pjević, D., Vana, D., Jugović, D., Tošić, D.,& Noga, P.. (2024). Investigating on the microstructure and optical properties of Au, Ag and Cu implanted TiN thin films: The effects of surface oxidation and ion-induced defects. in Journal of Alloys and Compounds, 976, 173046.
https://doi.org/10.1016/j.jallcom.2023.173046

Popović M, Novaković M, Pjević D, Vana D, Jugović D, Tošić D, Noga P. Investigating on the microstructure and optical properties of Au, Ag and Cu implanted TiN thin films: The effects of surface oxidation and ion-induced defects. in Journal of Alloys and Compounds. 2024;976:173046.
doi:10.1016/j.jallcom.2023.173046 .

Popović, Maja, Novaković, Mirjana, Pjević, Dejan, Vana, Dušan, Jugović, Dragana, Tošić, Dragana, Noga, Pavol, "Investigating on the microstructure and optical properties of Au, Ag and Cu implanted TiN thin films: The effects of surface oxidation and ion-induced defects" in Journal of Alloys and Compounds, 976 (2024):173046,
https://doi.org/10.1016/j.jallcom.2023.173046 . .

TY  - JOUR
AU  - Novaković, Mirjana M.
AU  - Popović, Maja
AU  - Noga, Pavol
AU  - Vana, Dušan
AU  - Ronning, Carsten
PY  - 2022
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/10106
AB  - Titanium-nitride (TiN) is known as a very promising plasmonic material, which offers many advantages compared to conventional metals commonly used in practical devices. Despite many improvements, TiN still suffers from high losses in the near-infrared (NIR) spectral region, making it less suitable for real-life applications. In this study, we have investigated the effects of pure silver implanted as well as silver/gold co-implanted TiN thin films on their optical properties, which we analyzed by spectroscopic ellipsometry. We demonstrate that the presence of silver and gold drastically changes both the real and imaginary part of the dielectric function. The implanted films exhibit optical losses several times lower compared to as-deposited TiN. The changes are in particular more pronounced for the samples with Au/Ag co-implantations, reaching nearly the same optical values as those of pure gold and being only slightly larger than that of silver. Thus, such an optical tuning of TiN opens new horizons and provide high potential for its implementation into plasmonic applications.
T2  - Optical Materials
T1  - Low optical losses in plasmonic TiN thin films implanted with silver and gold
VL  - 123
SP  - 111936
DO  - 10.1016/j.optmat.2021.111936
ER  - 

@article{
author = "Novaković, Mirjana M. and Popović, Maja and Noga, Pavol and Vana, Dušan and Ronning, Carsten",
year = "2022",
abstract = "Titanium-nitride (TiN) is known as a very promising plasmonic material, which offers many advantages compared to conventional metals commonly used in practical devices. Despite many improvements, TiN still suffers from high losses in the near-infrared (NIR) spectral region, making it less suitable for real-life applications. In this study, we have investigated the effects of pure silver implanted as well as silver/gold co-implanted TiN thin films on their optical properties, which we analyzed by spectroscopic ellipsometry. We demonstrate that the presence of silver and gold drastically changes both the real and imaginary part of the dielectric function. The implanted films exhibit optical losses several times lower compared to as-deposited TiN. The changes are in particular more pronounced for the samples with Au/Ag co-implantations, reaching nearly the same optical values as those of pure gold and being only slightly larger than that of silver. Thus, such an optical tuning of TiN opens new horizons and provide high potential for its implementation into plasmonic applications.",
journal = "Optical Materials",
title = "Low optical losses in plasmonic TiN thin films implanted with silver and gold",
volume = "123",
pages = "111936",
doi = "10.1016/j.optmat.2021.111936"
}

Novaković, M. M., Popović, M., Noga, P., Vana, D.,& Ronning, C.. (2022). Low optical losses in plasmonic TiN thin films implanted with silver and gold. in Optical Materials, 123, 111936.
https://doi.org/10.1016/j.optmat.2021.111936

Novaković MM, Popović M, Noga P, Vana D, Ronning C. Low optical losses in plasmonic TiN thin films implanted with silver and gold. in Optical Materials. 2022;123:111936.
doi:10.1016/j.optmat.2021.111936 .

Novaković, Mirjana M., Popović, Maja, Noga, Pavol, Vana, Dušan, Ronning, Carsten, "Low optical losses in plasmonic TiN thin films implanted with silver and gold" in Optical Materials, 123 (2022):111936,
https://doi.org/10.1016/j.optmat.2021.111936 . .