TY  - JOUR
AU  - Modrić-Šahbazović, Almedina
AU  - Novaković, Mirjana M.
AU  - Popović, Maja
AU  - Schmidt, Emanuel O.
AU  - Gazdić, Izet
AU  - Bibić, Nataša M.
AU  - Ronning, Carsten
AU  - Rakočević, Zlatko Lj.
PY  - 2019
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/8469
AB  - We investigated the structural and optical changes of Si (100) induced by single or multiple low energy silver ion irradiation with fluences up to 1016 ions/cm2. The irradiated samples were analyzed by the means of Rutherford backscattering spectrometry, X-ray photoelectron spectroscopy, transmission electron microscopy and spectroscopic ellipsometry measurements. The results revealed that after 60, 75 and multiple (75 + 60) keV ion implantation Ag atoms are preferentially situated in the near-surface region of the Si with the maximum distribution at 20, 26 and 42 nm, respectively. Spherical-like particles with diameters below 5 nm are homogenously distributed along the ion track of implanted ions. In the case of single ions implantations the Ag nanoparticles are distributed in the shallower regions of silicon, while subsequent implantation of silver with multiple ion energies results in a distribution in a wider region and again a shift of the Ag nanoparticles to larger depths of silicon substrate. As the ion fluence increases a monotonic decrease in the absorption in the ultraviolet region of the spectrum was observed, due to amorphization of the silicon. On the other hand, for the fluences in the range of 1014–1015 ions/cm2 in the long-wave regions wide absorption band appears at wavelengths between 700 nm and 1000 nm, which is due to plasmon resonance of Ag nanoparticles synthesized during implantation. The position of the resonance peak reflects not only the change in the ion fluence, but also the difference in the incident Ag ion energy. After implantation to the higher ion fluences of 1016 ions/cm2 this absorption band was shifted over 1000 nm, which is much above the known values for plasmon resonances of Ag nanoparticles. © 2019 Elsevier B.V.
T2  - Surface and Coatings Technology
T1  - Formation of Ag nanoparticles in Si (100) wafers by single and multiple low energy Ag ions implantation
VL  - 377
SP  - 124913
DO  - 10.1016/j.surfcoat.2019.124913
ER  - 

@article{
author = "Modrić-Šahbazović, Almedina and Novaković, Mirjana M. and Popović, Maja and Schmidt, Emanuel O. and Gazdić, Izet and Bibić, Nataša M. and Ronning, Carsten and Rakočević, Zlatko Lj.",
year = "2019",
abstract = "We investigated the structural and optical changes of Si (100) induced by single or multiple low energy silver ion irradiation with fluences up to 1016 ions/cm2. The irradiated samples were analyzed by the means of Rutherford backscattering spectrometry, X-ray photoelectron spectroscopy, transmission electron microscopy and spectroscopic ellipsometry measurements. The results revealed that after 60, 75 and multiple (75 + 60) keV ion implantation Ag atoms are preferentially situated in the near-surface region of the Si with the maximum distribution at 20, 26 and 42 nm, respectively. Spherical-like particles with diameters below 5 nm are homogenously distributed along the ion track of implanted ions. In the case of single ions implantations the Ag nanoparticles are distributed in the shallower regions of silicon, while subsequent implantation of silver with multiple ion energies results in a distribution in a wider region and again a shift of the Ag nanoparticles to larger depths of silicon substrate. As the ion fluence increases a monotonic decrease in the absorption in the ultraviolet region of the spectrum was observed, due to amorphization of the silicon. On the other hand, for the fluences in the range of 1014–1015 ions/cm2 in the long-wave regions wide absorption band appears at wavelengths between 700 nm and 1000 nm, which is due to plasmon resonance of Ag nanoparticles synthesized during implantation. The position of the resonance peak reflects not only the change in the ion fluence, but also the difference in the incident Ag ion energy. After implantation to the higher ion fluences of 1016 ions/cm2 this absorption band was shifted over 1000 nm, which is much above the known values for plasmon resonances of Ag nanoparticles. © 2019 Elsevier B.V.",
journal = "Surface and Coatings Technology",
title = "Formation of Ag nanoparticles in Si (100) wafers by single and multiple low energy Ag ions implantation",
volume = "377",
pages = "124913",
doi = "10.1016/j.surfcoat.2019.124913"
}

Modrić-Šahbazović, A., Novaković, M. M., Popović, M., Schmidt, E. O., Gazdić, I., Bibić, N. M., Ronning, C.,& Rakočević, Z. Lj.. (2019). Formation of Ag nanoparticles in Si (100) wafers by single and multiple low energy Ag ions implantation. in Surface and Coatings Technology, 377, 124913.
https://doi.org/10.1016/j.surfcoat.2019.124913

Modrić-Šahbazović A, Novaković MM, Popović M, Schmidt EO, Gazdić I, Bibić NM, Ronning C, Rakočević ZL. Formation of Ag nanoparticles in Si (100) wafers by single and multiple low energy Ag ions implantation. in Surface and Coatings Technology. 2019;377:124913.
doi:10.1016/j.surfcoat.2019.124913 .

Modrić-Šahbazović, Almedina, Novaković, Mirjana M., Popović, Maja, Schmidt, Emanuel O., Gazdić, Izet, Bibić, Nataša M., Ronning, Carsten, Rakočević, Zlatko Lj., "Formation of Ag nanoparticles in Si (100) wafers by single and multiple low energy Ag ions implantation" in Surface and Coatings Technology, 377 (2019):124913,
https://doi.org/10.1016/j.surfcoat.2019.124913 . .

TY  - JOUR
AU  - Modrić-Šahbazović, Almedina
AU  - Novaković, Mirjana M.
AU  - Schmidt, Emanuel O.
AU  - Gazdić, Izet
AU  - Đokić, Veljko R.
AU  - Peruško, Davor
AU  - Bibić, Nataša M.
AU  - Ronning, Carsten
AU  - Rakočević, Zlatko Lj.
PY  - 2019
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/8016
AB  - Nanosphere lithography is an effective technique for high throughput fabrication of well-ordered patterns on large areas. This study reports on nanostructuring of silicon samples by means of Ag ions implantation through self-organized polystyrene (PS) masks. The PS nanospheres with a diameter of ∼150 nm were self-assembled in a hexagonal array on top of Si(100) wafers, and then used as a mask for subsequent 60 keV silver ion implantation. Different fluences were applied up to 2 × 1016 ions/cm2 in order to create a distribution of different sizes and densities of buried metal nanoparticles. The surface morphology and the subsurface structures were studied by scanning electron microscopy and cross-sectional transmission electron microscopy, as a function of the mask deformation upon irradiation and the implantation parameters itself. We demonstrate that Ag is implanted into Si only through the mask openings, thus forming a regular array of amorphized regions over the wide area of silicon substrate. These fragments are of similar dimensions of the spheres with widths of about 190 nm and distributed over 60 nm in depth due to the given ion range. At the subsurface region of the implanted fragments, the synthesis of small sized and optically active Ag nanoparticles is clearly observed. The samples show a strong absorption peak in the long-wavelength region from 689 to 745 nm characteristic for surface plasmon resonance excitations, which could be fitted well using the Maxwell-Garnett`s theory. © 2018 Elsevier B.V.
T2  - Optical Materials
T1  - Silicon nanostructuring by Ag ions implantation through nanosphere lithography mask
VL  - 88
SP  - 508
EP  - 515
DO  - 10.1016/j.optmat.2018.12.022
ER  - 

@article{
author = "Modrić-Šahbazović, Almedina and Novaković, Mirjana M. and Schmidt, Emanuel O. and Gazdić, Izet and Đokić, Veljko R. and Peruško, Davor and Bibić, Nataša M. and Ronning, Carsten and Rakočević, Zlatko Lj.",
year = "2019",
abstract = "Nanosphere lithography is an effective technique for high throughput fabrication of well-ordered patterns on large areas. This study reports on nanostructuring of silicon samples by means of Ag ions implantation through self-organized polystyrene (PS) masks. The PS nanospheres with a diameter of ∼150 nm were self-assembled in a hexagonal array on top of Si(100) wafers, and then used as a mask for subsequent 60 keV silver ion implantation. Different fluences were applied up to 2 × 1016 ions/cm2 in order to create a distribution of different sizes and densities of buried metal nanoparticles. The surface morphology and the subsurface structures were studied by scanning electron microscopy and cross-sectional transmission electron microscopy, as a function of the mask deformation upon irradiation and the implantation parameters itself. We demonstrate that Ag is implanted into Si only through the mask openings, thus forming a regular array of amorphized regions over the wide area of silicon substrate. These fragments are of similar dimensions of the spheres with widths of about 190 nm and distributed over 60 nm in depth due to the given ion range. At the subsurface region of the implanted fragments, the synthesis of small sized and optically active Ag nanoparticles is clearly observed. The samples show a strong absorption peak in the long-wavelength region from 689 to 745 nm characteristic for surface plasmon resonance excitations, which could be fitted well using the Maxwell-Garnett`s theory. © 2018 Elsevier B.V.",
journal = "Optical Materials",
title = "Silicon nanostructuring by Ag ions implantation through nanosphere lithography mask",
volume = "88",
pages = "508-515",
doi = "10.1016/j.optmat.2018.12.022"
}

Modrić-Šahbazović, A., Novaković, M. M., Schmidt, E. O., Gazdić, I., Đokić, V. R., Peruško, D., Bibić, N. M., Ronning, C.,& Rakočević, Z. Lj.. (2019). Silicon nanostructuring by Ag ions implantation through nanosphere lithography mask. in Optical Materials, 88, 508-515.
https://doi.org/10.1016/j.optmat.2018.12.022

Modrić-Šahbazović A, Novaković MM, Schmidt EO, Gazdić I, Đokić VR, Peruško D, Bibić NM, Ronning C, Rakočević ZL. Silicon nanostructuring by Ag ions implantation through nanosphere lithography mask. in Optical Materials. 2019;88:508-515.
doi:10.1016/j.optmat.2018.12.022 .

Modrić-Šahbazović, Almedina, Novaković, Mirjana M., Schmidt, Emanuel O., Gazdić, Izet, Đokić, Veljko R., Peruško, Davor, Bibić, Nataša M., Ronning, Carsten, Rakočević, Zlatko Lj., "Silicon nanostructuring by Ag ions implantation through nanosphere lithography mask" in Optical Materials, 88 (2019):508-515,
https://doi.org/10.1016/j.optmat.2018.12.022 . .

TY  - JOUR
AU  - Modrić-Šahbazović, Almedina
AU  - Novaković, Mirjana M.
AU  - Bibić, Nataša M.
AU  - Gazdić, Izet
AU  - Rakočević, Zlatko
PY  - 2018
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/11566
AB  - U ovom radu je ispitivan uticaj implantacije nisko-energetskih jona srebra na optička svojstva monokristalnog silicijuma. Si (100) podloge su implantirane Ag jonima, energije 60 keV, sa dozama implantacije u opsegu od 1×1013-1×1016 jona/cm2. Sastav implantiranih Si podloga je određen korišćenjem Rutherford-ovog povratnog rasijanja, a optički spektri su dobijeni metodom spektroskopske elipsometrije. Pokazano je da se joni srebra nalaze u pod-površinskoj oblasti silicijuma, na dubini od ~33 nm. Sa porastom doze implantacije raste i koncentracija Ag jona u Si podlogama i, za najveću dozu od 1×1016 jona/cm2, dostiže vrijednost od ~6 at.%. Pri dozi implantacije od 1×1014 jona/cm2 uočena je pojava izražene apsorpcije u optičkim spektrima uzoraka, koja je rezultat rezonance površinskog plazmona (SPR) nanočestica srebra. Sa daljim porastom doze do 1×1016 jona/cm2 SPR pik se pomjera ka većim talasnim dužinama. Dobijeni rezultati ukazuju da pri većim dozama implantacije interakcija između Ag nanočestica postaje značajan faktor koji dominira efektom rezonance površinskog plazmona srebra u Si podlogama.
AB  - The present paper investigates the effects of low-energy silver ions implantation on the optical properties of monocrystalline silicon. Si(100) wafers were implanted with 60 keV Ag ions, to the fluences in the range of 1×1013-1×1016 ions/cm2. Composition of the implanted Si samples was analysed by means of Rurherford backscattering spectrometry and the optical spectra were obtained by spectroscopic ellipsometry measurements. The results revealed that the Ag ions are situated in the near-surface region of silicon, at depths of ~ 36 nm. When ion fluence of Ag ions was increased the concentration of Ag was also increased and for the highest ion fluence of 1×1016 ions/cm2 reach the value of ~ 6 at.%. At the fluence of 1×1014 ions/cm2 a strong apsorption in the optical spectra has been observed, which is associated with the excitation of surface plasmon resonance (SPR) of Ag nanoparticles. The position of the SPR peak shifted in the range of 326-1300 nm when the Ag ion fluence was varied up to 1×1016 ions/cm2. The results suggest that for higher implantation fluences the interaction between the Ag nanoparticles become important parameter which dominate the surface plasmon resonance effect of silver in Si.
T2  - Tehnika
T1  - Optička svojstva monokristalnog silicijuma implantiranog nisko-energetskim jonima srebra
T1  - Optical properties of low-energy Ag ion implanted monocrystalline silicon
VL  - 73
IS  - 3
SP  - 325
EP  - 329
DO  - 10.5937/tehnika1803325M
ER  - 

@article{
author = "Modrić-Šahbazović, Almedina and Novaković, Mirjana M. and Bibić, Nataša M. and Gazdić, Izet and Rakočević, Zlatko",
year = "2018",
abstract = "U ovom radu je ispitivan uticaj implantacije nisko-energetskih jona srebra na optička svojstva monokristalnog silicijuma. Si (100) podloge su implantirane Ag jonima, energije 60 keV, sa dozama implantacije u opsegu od 1×1013-1×1016 jona/cm2. Sastav implantiranih Si podloga je određen korišćenjem Rutherford-ovog povratnog rasijanja, a optički spektri su dobijeni metodom spektroskopske elipsometrije. Pokazano je da se joni srebra nalaze u pod-površinskoj oblasti silicijuma, na dubini od ~33 nm. Sa porastom doze implantacije raste i koncentracija Ag jona u Si podlogama i, za najveću dozu od 1×1016 jona/cm2, dostiže vrijednost od ~6 at.%. Pri dozi implantacije od 1×1014 jona/cm2 uočena je pojava izražene apsorpcije u optičkim spektrima uzoraka, koja je rezultat rezonance površinskog plazmona (SPR) nanočestica srebra. Sa daljim porastom doze do 1×1016 jona/cm2 SPR pik se pomjera ka većim talasnim dužinama. Dobijeni rezultati ukazuju da pri većim dozama implantacije interakcija između Ag nanočestica postaje značajan faktor koji dominira efektom rezonance površinskog plazmona srebra u Si podlogama., The present paper investigates the effects of low-energy silver ions implantation on the optical properties of monocrystalline silicon. Si(100) wafers were implanted with 60 keV Ag ions, to the fluences in the range of 1×1013-1×1016 ions/cm2. Composition of the implanted Si samples was analysed by means of Rurherford backscattering spectrometry and the optical spectra were obtained by spectroscopic ellipsometry measurements. The results revealed that the Ag ions are situated in the near-surface region of silicon, at depths of ~ 36 nm. When ion fluence of Ag ions was increased the concentration of Ag was also increased and for the highest ion fluence of 1×1016 ions/cm2 reach the value of ~ 6 at.%. At the fluence of 1×1014 ions/cm2 a strong apsorption in the optical spectra has been observed, which is associated with the excitation of surface plasmon resonance (SPR) of Ag nanoparticles. The position of the SPR peak shifted in the range of 326-1300 nm when the Ag ion fluence was varied up to 1×1016 ions/cm2. The results suggest that for higher implantation fluences the interaction between the Ag nanoparticles become important parameter which dominate the surface plasmon resonance effect of silver in Si.",
journal = "Tehnika",
title = "Optička svojstva monokristalnog silicijuma implantiranog nisko-energetskim jonima srebra, Optical properties of low-energy Ag ion implanted monocrystalline silicon",
volume = "73",
number = "3",
pages = "325-329",
doi = "10.5937/tehnika1803325M"
}

Modrić-Šahbazović, A., Novaković, M. M., Bibić, N. M., Gazdić, I.,& Rakočević, Z.. (2018). Optička svojstva monokristalnog silicijuma implantiranog nisko-energetskim jonima srebra. in Tehnika, 73(3), 325-329.
https://doi.org/10.5937/tehnika1803325M

Modrić-Šahbazović A, Novaković MM, Bibić NM, Gazdić I, Rakočević Z. Optička svojstva monokristalnog silicijuma implantiranog nisko-energetskim jonima srebra. in Tehnika. 2018;73(3):325-329.
doi:10.5937/tehnika1803325M .

Modrić-Šahbazović, Almedina, Novaković, Mirjana M., Bibić, Nataša M., Gazdić, Izet, Rakočević, Zlatko, "Optička svojstva monokristalnog silicijuma implantiranog nisko-energetskim jonima srebra" in Tehnika, 73, no. 3 (2018):325-329,
https://doi.org/10.5937/tehnika1803325M . .

TY  - CONF
AU  - Modrić-Šahbazović, Almedina
AU  - Novaković, Mirjana M.
AU  - Gazdić, Izet
AU  - Bibić, Nataša M.
AU  - Rakočević, Zlatko Lj.
PY  - 2018
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/8731
PB  - Belgrade : Serbian Academy of Sciences and Arts
C3  - Program and Book of Abstracts / First International Conference on Electron Microscopy of Nanostructures ELMINA 2018, August 27-29, 2018, Belgrade, Serbia
T1  - Silicon Nanostructuring by Ag Ions Implantation Through Polystyrene Nanomask
SP  - 81
EP  - 83
UR  - https://hdl.handle.net/21.15107/rcub_vinar_8731
ER  - 

@conference{
author = "Modrić-Šahbazović, Almedina and Novaković, Mirjana M. and Gazdić, Izet and Bibić, Nataša M. and Rakočević, Zlatko Lj.",
year = "2018",
publisher = "Belgrade : Serbian Academy of Sciences and Arts",
journal = "Program and Book of Abstracts / First International Conference on Electron Microscopy of Nanostructures ELMINA 2018, August 27-29, 2018, Belgrade, Serbia",
title = "Silicon Nanostructuring by Ag Ions Implantation Through Polystyrene Nanomask",
pages = "81-83",
url = "https://hdl.handle.net/21.15107/rcub_vinar_8731"
}

Modrić-Šahbazović, A., Novaković, M. M., Gazdić, I., Bibić, N. M.,& Rakočević, Z. Lj.. (2018). Silicon Nanostructuring by Ag Ions Implantation Through Polystyrene Nanomask. in Program and Book of Abstracts / First International Conference on Electron Microscopy of Nanostructures ELMINA 2018, August 27-29, 2018, Belgrade, Serbia
Belgrade : Serbian Academy of Sciences and Arts., 81-83.
https://hdl.handle.net/21.15107/rcub_vinar_8731

Modrić-Šahbazović A, Novaković MM, Gazdić I, Bibić NM, Rakočević ZL. Silicon Nanostructuring by Ag Ions Implantation Through Polystyrene Nanomask. in Program and Book of Abstracts / First International Conference on Electron Microscopy of Nanostructures ELMINA 2018, August 27-29, 2018, Belgrade, Serbia. 2018;:81-83.
https://hdl.handle.net/21.15107/rcub_vinar_8731 .

Modrić-Šahbazović, Almedina, Novaković, Mirjana M., Gazdić, Izet, Bibić, Nataša M., Rakočević, Zlatko Lj., "Silicon Nanostructuring by Ag Ions Implantation Through Polystyrene Nanomask" in Program and Book of Abstracts / First International Conference on Electron Microscopy of Nanostructures ELMINA 2018, August 27-29, 2018, Belgrade, Serbia (2018):81-83,
https://hdl.handle.net/21.15107/rcub_vinar_8731 .

TY  - CONF
AU  - Novaković, Mirjana M.
AU  - Popović, Maja
AU  - Schmidt, Emanuel O.
AU  - Schoppe, Philipp
AU  - Mitrić, Miodrag
AU  - Bibić, Nataša M.
AU  - Ronning, Carsten
AU  - Rakočević, Zlatko Lj.
PY  - 2018
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/8733
PB  - Belgrade : Serbian Academy of Sciences and Arts
C3  - Program and Book of Abstracts / First International Conference on Electron Microscopy of Nanostructures ELMINA 2018, August 27-29, 2018, Belgrade, Serbia
T1  - Formation of Ag Nanoparticles in CrN by Using Ag Ion Implantation and Thermal Annealing
SP  - 104
EP  - 106
UR  - https://hdl.handle.net/21.15107/rcub_vinar_8733
ER  - 

@conference{
author = "Novaković, Mirjana M. and Popović, Maja and Schmidt, Emanuel O. and Schoppe, Philipp and Mitrić, Miodrag and Bibić, Nataša M. and Ronning, Carsten and Rakočević, Zlatko Lj.",
year = "2018",
publisher = "Belgrade : Serbian Academy of Sciences and Arts",
journal = "Program and Book of Abstracts / First International Conference on Electron Microscopy of Nanostructures ELMINA 2018, August 27-29, 2018, Belgrade, Serbia",
title = "Formation of Ag Nanoparticles in CrN by Using Ag Ion Implantation and Thermal Annealing",
pages = "104-106",
url = "https://hdl.handle.net/21.15107/rcub_vinar_8733"
}

Novaković, M. M., Popović, M., Schmidt, E. O., Schoppe, P., Mitrić, M., Bibić, N. M., Ronning, C.,& Rakočević, Z. Lj.. (2018). Formation of Ag Nanoparticles in CrN by Using Ag Ion Implantation and Thermal Annealing. in Program and Book of Abstracts / First International Conference on Electron Microscopy of Nanostructures ELMINA 2018, August 27-29, 2018, Belgrade, Serbia
Belgrade : Serbian Academy of Sciences and Arts., 104-106.
https://hdl.handle.net/21.15107/rcub_vinar_8733

Novaković MM, Popović M, Schmidt EO, Schoppe P, Mitrić M, Bibić NM, Ronning C, Rakočević ZL. Formation of Ag Nanoparticles in CrN by Using Ag Ion Implantation and Thermal Annealing. in Program and Book of Abstracts / First International Conference on Electron Microscopy of Nanostructures ELMINA 2018, August 27-29, 2018, Belgrade, Serbia. 2018;:104-106.
https://hdl.handle.net/21.15107/rcub_vinar_8733 .

Novaković, Mirjana M., Popović, Maja, Schmidt, Emanuel O., Schoppe, Philipp, Mitrić, Miodrag, Bibić, Nataša M., Ronning, Carsten, Rakočević, Zlatko Lj., "Formation of Ag Nanoparticles in CrN by Using Ag Ion Implantation and Thermal Annealing" in Program and Book of Abstracts / First International Conference on Electron Microscopy of Nanostructures ELMINA 2018, August 27-29, 2018, Belgrade, Serbia (2018):104-106,
https://hdl.handle.net/21.15107/rcub_vinar_8733 .

TY  - JOUR
AU  - Novaković, Mirjana M.
AU  - Popović, Maja
AU  - Zhang, Kun
AU  - Čubrović, Vladimir
AU  - Bibić, Nataša M.
AU  - Rakočević, Zlatko Lj.
PY  - 2018
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/7685
AB  - Evolution of the structure of cobalt-silicon films during Xe ions irradiation has been studied and the same is correlated with magnetic properties. The polycrystalline cobalt films were deposited by electron beam evaporation method to a thickness of 50 nm on crystalline silicon (c-Si) and silicon with pre-amorphized surface (a-Si). After deposition the layers were irradiated with 400 keV Xe ions to the fluences in the range of 2-30 x 10(15) ions/cm(2). Structural analysis was done by means of transmission electron microscopy, atomic force microscopy (AFM) and X-ray diffraction (XRD), while the magnetic properties were analyzed by using magneto-optical Kerr effect (MOKE) technique. For the both types of substrate the AFM and XRD results show that after Xe ions irradiation the layers become more rough and the grain size of the crystallites increases; the effects being more evidenced for all fluences for the layers deposited on pre-amorphized Si. The MOKE measurements provided the in-plane azimuthal angular dependence of the hysteresis loops and the change of magnetization with the structural parameters. Although the coercive field is influenced by the surface roughness, in the case of c-Si substrate we found it is much more determined by the size of the crystallites. Additionally, independently on the substrate used the magnetic anisotropy in the Co films disappeared as the Xe ion fluence increased, indicating that the changes of magnetization in both systems occur for similar reasons. (C) 2018 Elsevier B.V. All rights reserved.
T2  - Applied Surface Science
T1  - Xenon-ion irradiation of Co/Si bilayers: Magnetic and structural properties
VL  - 447
SP  - 117
EP  - 124
DO  - 10.1016/j.apsusc.2018.03.215
ER  - 

@article{
author = "Novaković, Mirjana M. and Popović, Maja and Zhang, Kun and Čubrović, Vladimir and Bibić, Nataša M. and Rakočević, Zlatko Lj.",
year = "2018",
abstract = "Evolution of the structure of cobalt-silicon films during Xe ions irradiation has been studied and the same is correlated with magnetic properties. The polycrystalline cobalt films were deposited by electron beam evaporation method to a thickness of 50 nm on crystalline silicon (c-Si) and silicon with pre-amorphized surface (a-Si). After deposition the layers were irradiated with 400 keV Xe ions to the fluences in the range of 2-30 x 10(15) ions/cm(2). Structural analysis was done by means of transmission electron microscopy, atomic force microscopy (AFM) and X-ray diffraction (XRD), while the magnetic properties were analyzed by using magneto-optical Kerr effect (MOKE) technique. For the both types of substrate the AFM and XRD results show that after Xe ions irradiation the layers become more rough and the grain size of the crystallites increases; the effects being more evidenced for all fluences for the layers deposited on pre-amorphized Si. The MOKE measurements provided the in-plane azimuthal angular dependence of the hysteresis loops and the change of magnetization with the structural parameters. Although the coercive field is influenced by the surface roughness, in the case of c-Si substrate we found it is much more determined by the size of the crystallites. Additionally, independently on the substrate used the magnetic anisotropy in the Co films disappeared as the Xe ion fluence increased, indicating that the changes of magnetization in both systems occur for similar reasons. (C) 2018 Elsevier B.V. All rights reserved.",
journal = "Applied Surface Science",
title = "Xenon-ion irradiation of Co/Si bilayers: Magnetic and structural properties",
volume = "447",
pages = "117-124",
doi = "10.1016/j.apsusc.2018.03.215"
}

Novaković, M. M., Popović, M., Zhang, K., Čubrović, V., Bibić, N. M.,& Rakočević, Z. Lj.. (2018). Xenon-ion irradiation of Co/Si bilayers: Magnetic and structural properties. in Applied Surface Science, 447, 117-124.
https://doi.org/10.1016/j.apsusc.2018.03.215

Novaković MM, Popović M, Zhang K, Čubrović V, Bibić NM, Rakočević ZL. Xenon-ion irradiation of Co/Si bilayers: Magnetic and structural properties. in Applied Surface Science. 2018;447:117-124.
doi:10.1016/j.apsusc.2018.03.215 .

Novaković, Mirjana M., Popović, Maja, Zhang, Kun, Čubrović, Vladimir, Bibić, Nataša M., Rakočević, Zlatko Lj., "Xenon-ion irradiation of Co/Si bilayers: Magnetic and structural properties" in Applied Surface Science, 447 (2018):117-124,
https://doi.org/10.1016/j.apsusc.2018.03.215 . .

TY  - JOUR
AU  - Popović, Maja
AU  - Novaković, Mirjana M.
AU  - Zhang, Kun
AU  - Mitrić, Miodrag
AU  - Bibić, Nataša M.
AU  - Rakočević, Zlatko Lj.
PY  - 2018
UR  - http://www.doiserbia.nb.rs/Article.aspx?ID=1820-61311803199P
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/7905
AB  - Polycrystalline CrN thin films were irradiated with Xe ions. The irradiation-induced modifications on structural and optical properties of the films were investigated. The CrN films were deposited on Si(100) wafers with the thickness of 280 nm, by using DC reactive sputtering. After deposition, the films were implanted at room temperature with 400 keV Xe ions with the fluences of 5-20×1015 ions/cm2. The films were then annealed at 700 °C in vacuum for 2 h. The combination of Rutherford backscattering spectrometry (RBS), X-ray diffraction (XRD) and transmission electron microscopy (TEM) was used for structural analyses, while changes in optical properties were monitored by spectroscopic ellipsometry. We also measured the electrical resistivity of the samples using a four point probe method. RBS analysis reveals that the concentration of Xe in the layers increases with ion fluence reaching the value of around 1.5 at.% for the highest ion dose, at a depth of 73 nm. XRD patterns show that the irradiation results in the decrease of the lattice constant in the range of 0.4160-0.4124 nm. Irradiation also results in the splitting of 200 line indicating the tetragonal distortion of CrN lattice. TEM studies demonstrate that after irradiation the columnar microstructure is partially destroyed within ∼90 nm, introducing a large amount of damage in the CrN layers. Spectroscopic ellipsometry analysis shows that the optical band gap of CrN progressively reduces from 3.47 eV to 2.51 eV with the rise in ion fluence up to 20 1015 ions/cm2. Four point probe measurements of the films indicated that as the Xe ion fluence increases, the electrical resistivity rises from 770 to 1607μ cm. After post-implantation annealing crystalline grains become larger and lattice distortion disappears, which influences optical band gap values and electrical resistivity of CrN. © 2018 University of Novi Sad Faculty of Technology. All rights reserved.
T2  - Processing and Application of Ceramics
T1  - Correlation between damage evolution, structural and optical properties of Xe implanted CrN thin films
VL  - 12
IS  - 3
SP  - 199
EP  - 208
DO  - 10.2298/PAC1803199P
ER  - 

@article{
author = "Popović, Maja and Novaković, Mirjana M. and Zhang, Kun and Mitrić, Miodrag and Bibić, Nataša M. and Rakočević, Zlatko Lj.",
year = "2018",
abstract = "Polycrystalline CrN thin films were irradiated with Xe ions. The irradiation-induced modifications on structural and optical properties of the films were investigated. The CrN films were deposited on Si(100) wafers with the thickness of 280 nm, by using DC reactive sputtering. After deposition, the films were implanted at room temperature with 400 keV Xe ions with the fluences of 5-20×1015 ions/cm2. The films were then annealed at 700 °C in vacuum for 2 h. The combination of Rutherford backscattering spectrometry (RBS), X-ray diffraction (XRD) and transmission electron microscopy (TEM) was used for structural analyses, while changes in optical properties were monitored by spectroscopic ellipsometry. We also measured the electrical resistivity of the samples using a four point probe method. RBS analysis reveals that the concentration of Xe in the layers increases with ion fluence reaching the value of around 1.5 at.% for the highest ion dose, at a depth of 73 nm. XRD patterns show that the irradiation results in the decrease of the lattice constant in the range of 0.4160-0.4124 nm. Irradiation also results in the splitting of 200 line indicating the tetragonal distortion of CrN lattice. TEM studies demonstrate that after irradiation the columnar microstructure is partially destroyed within ∼90 nm, introducing a large amount of damage in the CrN layers. Spectroscopic ellipsometry analysis shows that the optical band gap of CrN progressively reduces from 3.47 eV to 2.51 eV with the rise in ion fluence up to 20 1015 ions/cm2. Four point probe measurements of the films indicated that as the Xe ion fluence increases, the electrical resistivity rises from 770 to 1607μ cm. After post-implantation annealing crystalline grains become larger and lattice distortion disappears, which influences optical band gap values and electrical resistivity of CrN. © 2018 University of Novi Sad Faculty of Technology. All rights reserved.",
journal = "Processing and Application of Ceramics",
title = "Correlation between damage evolution, structural and optical properties of Xe implanted CrN thin films",
volume = "12",
number = "3",
pages = "199-208",
doi = "10.2298/PAC1803199P"
}

Popović, M., Novaković, M. M., Zhang, K., Mitrić, M., Bibić, N. M.,& Rakočević, Z. Lj.. (2018). Correlation between damage evolution, structural and optical properties of Xe implanted CrN thin films. in Processing and Application of Ceramics, 12(3), 199-208.
https://doi.org/10.2298/PAC1803199P

Popović M, Novaković MM, Zhang K, Mitrić M, Bibić NM, Rakočević ZL. Correlation between damage evolution, structural and optical properties of Xe implanted CrN thin films. in Processing and Application of Ceramics. 2018;12(3):199-208.
doi:10.2298/PAC1803199P .

Popović, Maja, Novaković, Mirjana M., Zhang, Kun, Mitrić, Miodrag, Bibić, Nataša M., Rakočević, Zlatko Lj., "Correlation between damage evolution, structural and optical properties of Xe implanted CrN thin films" in Processing and Application of Ceramics, 12, no. 3 (2018):199-208,
https://doi.org/10.2298/PAC1803199P . .

TY  - JOUR
AU  - Novaković, Mirjana M.
AU  - Popović, Maja
AU  - Schmidt, Emanuel O.
AU  - Mitrić, Miodrag
AU  - Bibić, Nataša M.
AU  - Rakočević, Zlatko Lj.
AU  - Ronning, Carsten
PY  - 2017
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/1794
AB  - We report on the formation of gold particles in 280 nm thin polycrystalline CrN layers caused by Au+ ion implantation. The CrN layers were deposited at 150 degrees C by d.c. reactive sputtering on Si(100) wafers and then implanted at room temperature with 1501keV Au+ ions to fluences of 2 x 10(16) cm(-2) to 4.1 x 10(16) cm(-2). The implanted layers were analysed by the means of Rutherford backscattering spectrometry, X-ray diffraction, atomic force microscopy and spectroscopic ellipsometry measurements. The results revealed that the Au atoms are situated in the near-surface region of the implanted CrN layers. At the fluence of 2 x 10(16) cm(-2) the formation of Au particles of similar to 200 nm in diameter has been observed. With increasing Au ion fluence the particles coalesce into clusters with dimensions of similar to 7 mu m . The synthesized particles show a strong absorption peak associated with the excitation of surface plasmon resonances (SPR). The position of the SPR peak shifted in the range of 426.8-690.5 nm when the Au+ ion fluence was varied from 2 x 10(16) cm(-2) to 4.1 x 10(16) cm(-2). A correlation of the shift in the peak wavelength caused by the change in the particles size and clustering has been revealed, suggesting that the interaction between Au particles dominate the surface plasmon resonance effect. (C) 2017 Elsevier B.V. All rights reserved.
T2  - Applied Surface Science
T1  - Clustering of gold particles in Au implanted CrN thin films: The effect on the SPR peak position
VL  - 426
SP  - 667
EP  - 673
DO  - 10.1016/j.apsusc.2017.07.233
ER  - 

@article{
author = "Novaković, Mirjana M. and Popović, Maja and Schmidt, Emanuel O. and Mitrić, Miodrag and Bibić, Nataša M. and Rakočević, Zlatko Lj. and Ronning, Carsten",
year = "2017",
abstract = "We report on the formation of gold particles in 280 nm thin polycrystalline CrN layers caused by Au+ ion implantation. The CrN layers were deposited at 150 degrees C by d.c. reactive sputtering on Si(100) wafers and then implanted at room temperature with 1501keV Au+ ions to fluences of 2 x 10(16) cm(-2) to 4.1 x 10(16) cm(-2). The implanted layers were analysed by the means of Rutherford backscattering spectrometry, X-ray diffraction, atomic force microscopy and spectroscopic ellipsometry measurements. The results revealed that the Au atoms are situated in the near-surface region of the implanted CrN layers. At the fluence of 2 x 10(16) cm(-2) the formation of Au particles of similar to 200 nm in diameter has been observed. With increasing Au ion fluence the particles coalesce into clusters with dimensions of similar to 7 mu m . The synthesized particles show a strong absorption peak associated with the excitation of surface plasmon resonances (SPR). The position of the SPR peak shifted in the range of 426.8-690.5 nm when the Au+ ion fluence was varied from 2 x 10(16) cm(-2) to 4.1 x 10(16) cm(-2). A correlation of the shift in the peak wavelength caused by the change in the particles size and clustering has been revealed, suggesting that the interaction between Au particles dominate the surface plasmon resonance effect. (C) 2017 Elsevier B.V. All rights reserved.",
journal = "Applied Surface Science",
title = "Clustering of gold particles in Au implanted CrN thin films: The effect on the SPR peak position",
volume = "426",
pages = "667-673",
doi = "10.1016/j.apsusc.2017.07.233"
}

Novaković, M. M., Popović, M., Schmidt, E. O., Mitrić, M., Bibić, N. M., Rakočević, Z. Lj.,& Ronning, C.. (2017). Clustering of gold particles in Au implanted CrN thin films: The effect on the SPR peak position. in Applied Surface Science, 426, 667-673.
https://doi.org/10.1016/j.apsusc.2017.07.233

Novaković MM, Popović M, Schmidt EO, Mitrić M, Bibić NM, Rakočević ZL, Ronning C. Clustering of gold particles in Au implanted CrN thin films: The effect on the SPR peak position. in Applied Surface Science. 2017;426:667-673.
doi:10.1016/j.apsusc.2017.07.233 .

Novaković, Mirjana M., Popović, Maja, Schmidt, Emanuel O., Mitrić, Miodrag, Bibić, Nataša M., Rakočević, Zlatko Lj., Ronning, Carsten, "Clustering of gold particles in Au implanted CrN thin films: The effect on the SPR peak position" in Applied Surface Science, 426 (2017):667-673,
https://doi.org/10.1016/j.apsusc.2017.07.233 . .

TY  - JOUR
AU  - Novaković, Mirjana M.
AU  - Popović, Maja
AU  - Schmidt, Emanuel O.
AU  - Schoeppe, P.
AU  - Mitrić, Miodrag
AU  - Bibić, Nataša M.
AU  - Ronning, Carsten
AU  - Rakočević, Zlatko Lj.
PY  - 2017
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/1793
AB  - This study reports on the changes of the structural and optical properties occurring in CrN thin films upon Ag ion implantation. The films were grown by reactive sputtering on top of Si (100) wafers at a temperature of around 150 degrees C. Subsequently, the films were implanted with Ag ion fluences in the range of 0.5 x 10(16) ions/cm(2) -2 x 10(16) ions/cm(2) with energy of 200 keV. The structural and morphological changes, promoted by in-vacuum annealing of the as-implanted thin films at 200 degrees C, 400 degrees C and 700 degrees C, resulted in different optical responses of the CrN: Ag films due to the formation of Ag nanoparticles. The nanoparticles were inhomogenously distributed through the layer, which is related to the implantation distribution of silver in CrN. Apart from this, Ag nanoparticles with a size of 20-25 nm were formed at the surface of the layer. These structural properties are responsible for the formation of a broad optical absorption peak. This peak is located at similar to 420 nm and can be associated with the plasmon resonance of Ag particles embedded in the CrN matrix. (C) 2017 Elsevier B.V. All rights reserved.
T2  - Journal of Alloys and Compounds
T1  - Evolution of structural and optical properties of Ag implanted CrN thin films with annealing temperature
VL  - 729
SP  - 671
EP  - 678
DO  - 10.1016/j.jallcom.2017.09.180
ER  - 

@article{
author = "Novaković, Mirjana M. and Popović, Maja and Schmidt, Emanuel O. and Schoeppe, P. and Mitrić, Miodrag and Bibić, Nataša M. and Ronning, Carsten and Rakočević, Zlatko Lj.",
year = "2017",
abstract = "This study reports on the changes of the structural and optical properties occurring in CrN thin films upon Ag ion implantation. The films were grown by reactive sputtering on top of Si (100) wafers at a temperature of around 150 degrees C. Subsequently, the films were implanted with Ag ion fluences in the range of 0.5 x 10(16) ions/cm(2) -2 x 10(16) ions/cm(2) with energy of 200 keV. The structural and morphological changes, promoted by in-vacuum annealing of the as-implanted thin films at 200 degrees C, 400 degrees C and 700 degrees C, resulted in different optical responses of the CrN: Ag films due to the formation of Ag nanoparticles. The nanoparticles were inhomogenously distributed through the layer, which is related to the implantation distribution of silver in CrN. Apart from this, Ag nanoparticles with a size of 20-25 nm were formed at the surface of the layer. These structural properties are responsible for the formation of a broad optical absorption peak. This peak is located at similar to 420 nm and can be associated with the plasmon resonance of Ag particles embedded in the CrN matrix. (C) 2017 Elsevier B.V. All rights reserved.",
journal = "Journal of Alloys and Compounds",
title = "Evolution of structural and optical properties of Ag implanted CrN thin films with annealing temperature",
volume = "729",
pages = "671-678",
doi = "10.1016/j.jallcom.2017.09.180"
}

Novaković, M. M., Popović, M., Schmidt, E. O., Schoeppe, P., Mitrić, M., Bibić, N. M., Ronning, C.,& Rakočević, Z. Lj.. (2017). Evolution of structural and optical properties of Ag implanted CrN thin films with annealing temperature. in Journal of Alloys and Compounds, 729, 671-678.
https://doi.org/10.1016/j.jallcom.2017.09.180

Novaković MM, Popović M, Schmidt EO, Schoeppe P, Mitrić M, Bibić NM, Ronning C, Rakočević ZL. Evolution of structural and optical properties of Ag implanted CrN thin films with annealing temperature. in Journal of Alloys and Compounds. 2017;729:671-678.
doi:10.1016/j.jallcom.2017.09.180 .

Novaković, Mirjana M., Popović, Maja, Schmidt, Emanuel O., Schoeppe, P., Mitrić, Miodrag, Bibić, Nataša M., Ronning, Carsten, Rakočević, Zlatko Lj., "Evolution of structural and optical properties of Ag implanted CrN thin films with annealing temperature" in Journal of Alloys and Compounds, 729 (2017):671-678,
https://doi.org/10.1016/j.jallcom.2017.09.180 . .

TY  - JOUR
AU  - Popović, Maja
AU  - Novaković, Mirjana M.
AU  - Schmidt, Emanuel O.
AU  - Schoeppe, P.
AU  - Bibić, Nataša M.
AU  - Ronning, Carsten
AU  - Rakočević, Zlatko Lj.
PY  - 2017
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/1800
AB  - Titanium nitride (TiN) has emerged as alternative plasmonic material in the visible and near-infrared spectral range due to its metallic properties. We studied the influence of silver ion implantation (fluence range from 0.5 x 10(16)-6 x 10(16) ions/cm(2)) on the structural and optical properties of reactively sputtered 260 nm thick TiN films. The columnar structure was partially destroyed by the irradiation and up to 5 at% of Ag was incorporated into the films within the projected ion range. The formation of cubic Ag nanoparticles with size of 1-2 nm was observed by high resolution transmission electron microscopy and subsequent fast Fourier transform analysis. This presence of Ag within the TiN matrix drastically changes both the real and imaginary component of the dielectric function and provides low optical losses. A Drude Lorentz dielectric analysis based on free electron and oscillator model are carried out to describe the silver influence on the optical behavior of TiN. With increasing ion fluence, the unscreened plasma frequency decreased and broadening increased. The energy, strength and broadening of the interband transitions were studied with respect to the silver ion fluence and correlated with the microstructural changes induced in TiN films. (C) 2017 Elsevier B.V. All rights reserved.
T2  - Optical Materials
T1  - Low-loss and tunable near-zero-epsilon titanium nitride
VL  - 72
SP  - 775
EP  - 780
DO  - 10.1016/j.optmat.2017.07.035
ER  - 

@article{
author = "Popović, Maja and Novaković, Mirjana M. and Schmidt, Emanuel O. and Schoeppe, P. and Bibić, Nataša M. and Ronning, Carsten and Rakočević, Zlatko Lj.",
year = "2017",
abstract = "Titanium nitride (TiN) has emerged as alternative plasmonic material in the visible and near-infrared spectral range due to its metallic properties. We studied the influence of silver ion implantation (fluence range from 0.5 x 10(16)-6 x 10(16) ions/cm(2)) on the structural and optical properties of reactively sputtered 260 nm thick TiN films. The columnar structure was partially destroyed by the irradiation and up to 5 at% of Ag was incorporated into the films within the projected ion range. The formation of cubic Ag nanoparticles with size of 1-2 nm was observed by high resolution transmission electron microscopy and subsequent fast Fourier transform analysis. This presence of Ag within the TiN matrix drastically changes both the real and imaginary component of the dielectric function and provides low optical losses. A Drude Lorentz dielectric analysis based on free electron and oscillator model are carried out to describe the silver influence on the optical behavior of TiN. With increasing ion fluence, the unscreened plasma frequency decreased and broadening increased. The energy, strength and broadening of the interband transitions were studied with respect to the silver ion fluence and correlated with the microstructural changes induced in TiN films. (C) 2017 Elsevier B.V. All rights reserved.",
journal = "Optical Materials",
title = "Low-loss and tunable near-zero-epsilon titanium nitride",
volume = "72",
pages = "775-780",
doi = "10.1016/j.optmat.2017.07.035"
}

Popović, M., Novaković, M. M., Schmidt, E. O., Schoeppe, P., Bibić, N. M., Ronning, C.,& Rakočević, Z. Lj.. (2017). Low-loss and tunable near-zero-epsilon titanium nitride. in Optical Materials, 72, 775-780.
https://doi.org/10.1016/j.optmat.2017.07.035

Popović M, Novaković MM, Schmidt EO, Schoeppe P, Bibić NM, Ronning C, Rakočević ZL. Low-loss and tunable near-zero-epsilon titanium nitride. in Optical Materials. 2017;72:775-780.
doi:10.1016/j.optmat.2017.07.035 .

Popović, Maja, Novaković, Mirjana M., Schmidt, Emanuel O., Schoeppe, P., Bibić, Nataša M., Ronning, Carsten, Rakočević, Zlatko Lj., "Low-loss and tunable near-zero-epsilon titanium nitride" in Optical Materials, 72 (2017):775-780,
https://doi.org/10.1016/j.optmat.2017.07.035 . .

TY  - JOUR
AU  - Popović, Maja
AU  - Novaković, Mirjana M.
AU  - Mitrić, Miodrag
AU  - Zhang, Kun
AU  - Rakočević, Zlatko Lj.
AU  - Bibić, Nataša M.
PY  - 2017
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/1577
AB  - The present study deals with irradiation effects induced by xenon ions (Xe+ on titanium nitride (TiN) thin films. TiN films thickness of 260 urn obtained by using dc reactive sputtering were irradiated with 400 keV Xe ions. The irradiation doses were 5 x 10(15), 10 x 10(15), 15 x 10(15) and 20 x 10(15) ions/cm(2). The properties of irradiated films varying with ion fluence are investigated by means of Rutherford backscattering spectrometry, X-ray diffraction, transmission electron microscopy and spectroscopic ellipsometry. It was found that the Xe ions induce contraction and rhombohedral distortion of TiN lattice. The columnar structure was partially destroyed after irradiation, which introduce up to 1.5 at.% of Xe within the structure mostly concentrated around the projected ion range. The generation of defects due to the presence of heavy ions changes the optical constants of implanted films. It was found that the optical band gap of TiN films was reduced after xenon ion implantation. (C) 2017 Elsevier Ltd. All rights reserved.
T2  - Materials Research Bulletin
T1  - Xenon implantation effects on the structural and optical properties of reactively sputtered titanium nitride thin films
VL  - 91
SP  - 36
EP  - 41
DO  - 10.1016/j.materresbull.2017.03.031
ER  - 

@article{
author = "Popović, Maja and Novaković, Mirjana M. and Mitrić, Miodrag and Zhang, Kun and Rakočević, Zlatko Lj. and Bibić, Nataša M.",
year = "2017",
abstract = "The present study deals with irradiation effects induced by xenon ions (Xe+ on titanium nitride (TiN) thin films. TiN films thickness of 260 urn obtained by using dc reactive sputtering were irradiated with 400 keV Xe ions. The irradiation doses were 5 x 10(15), 10 x 10(15), 15 x 10(15) and 20 x 10(15) ions/cm(2). The properties of irradiated films varying with ion fluence are investigated by means of Rutherford backscattering spectrometry, X-ray diffraction, transmission electron microscopy and spectroscopic ellipsometry. It was found that the Xe ions induce contraction and rhombohedral distortion of TiN lattice. The columnar structure was partially destroyed after irradiation, which introduce up to 1.5 at.% of Xe within the structure mostly concentrated around the projected ion range. The generation of defects due to the presence of heavy ions changes the optical constants of implanted films. It was found that the optical band gap of TiN films was reduced after xenon ion implantation. (C) 2017 Elsevier Ltd. All rights reserved.",
journal = "Materials Research Bulletin",
title = "Xenon implantation effects on the structural and optical properties of reactively sputtered titanium nitride thin films",
volume = "91",
pages = "36-41",
doi = "10.1016/j.materresbull.2017.03.031"
}

Popović, M., Novaković, M. M., Mitrić, M., Zhang, K., Rakočević, Z. Lj.,& Bibić, N. M.. (2017). Xenon implantation effects on the structural and optical properties of reactively sputtered titanium nitride thin films. in Materials Research Bulletin, 91, 36-41.
https://doi.org/10.1016/j.materresbull.2017.03.031

Popović M, Novaković MM, Mitrić M, Zhang K, Rakočević ZL, Bibić NM. Xenon implantation effects on the structural and optical properties of reactively sputtered titanium nitride thin films. in Materials Research Bulletin. 2017;91:36-41.
doi:10.1016/j.materresbull.2017.03.031 .

Popović, Maja, Novaković, Mirjana M., Mitrić, Miodrag, Zhang, Kun, Rakočević, Zlatko Lj., Bibić, Nataša M., "Xenon implantation effects on the structural and optical properties of reactively sputtered titanium nitride thin films" in Materials Research Bulletin, 91 (2017):36-41,
https://doi.org/10.1016/j.materresbull.2017.03.031 . .

TY  - JOUR
AU  - Novaković, Mirjana M.
AU  - Popović, Maja
AU  - Rakočević, Zlatko Lj.
AU  - Bibić, Nataša M.
PY  - 2017
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/1524
AB  - The properties of various CrxNy films grown by direct current (DC) reactive sputtering process with different values of nitrogen partial pressures (0, 2x10(-4), 3.5x10(-4) and 5x10(-4) mbar) were studied. The structural analysis of the samples was performed by using X-ray diffraction and transmission electron microscopy (TEM), while an elemental analysis was realized by means of Rutherford backscattering spectrometry. By varying nitrogen partial pressure the pure Cr layer, mixture of Cr, Cr-2 N and CrN phases, or single-phase CrN was produced. TEM analysis showed that at pN(2) = 2x10(-4) mbar the layer has dense microstructure. On the other hand, the layer deposited at the highest nitrogen partial pressure exhibits pronounced columnar structure. The optical properties of CrxNy films were evaluated from spectroscopic ellipsometry data by the Drude or combined Drude and Tauc-Lorentz model. It was found that both refractive index and extinction coefficient are strongly dependent on the dominant phase formation (Cr, Cr-2 N, CrN) during the deposition process. Finally, the electrical studies indicated the metallic character of Cr-2 N phase and semiconducting behaviour of CrN.
T2  - Processing and Application of Ceramics
T1  - Structural, optical and electrical properties of reactively sputtered CrxNy films: Nitrogen influence on the phase formation
VL  - 11
IS  - 1
SP  - 45
EP  - 51
DO  - 10.2298/PAC1701045N
ER  - 

@article{
author = "Novaković, Mirjana M. and Popović, Maja and Rakočević, Zlatko Lj. and Bibić, Nataša M.",
year = "2017",
abstract = "The properties of various CrxNy films grown by direct current (DC) reactive sputtering process with different values of nitrogen partial pressures (0, 2x10(-4), 3.5x10(-4) and 5x10(-4) mbar) were studied. The structural analysis of the samples was performed by using X-ray diffraction and transmission electron microscopy (TEM), while an elemental analysis was realized by means of Rutherford backscattering spectrometry. By varying nitrogen partial pressure the pure Cr layer, mixture of Cr, Cr-2 N and CrN phases, or single-phase CrN was produced. TEM analysis showed that at pN(2) = 2x10(-4) mbar the layer has dense microstructure. On the other hand, the layer deposited at the highest nitrogen partial pressure exhibits pronounced columnar structure. The optical properties of CrxNy films were evaluated from spectroscopic ellipsometry data by the Drude or combined Drude and Tauc-Lorentz model. It was found that both refractive index and extinction coefficient are strongly dependent on the dominant phase formation (Cr, Cr-2 N, CrN) during the deposition process. Finally, the electrical studies indicated the metallic character of Cr-2 N phase and semiconducting behaviour of CrN.",
journal = "Processing and Application of Ceramics",
title = "Structural, optical and electrical properties of reactively sputtered CrxNy films: Nitrogen influence on the phase formation",
volume = "11",
number = "1",
pages = "45-51",
doi = "10.2298/PAC1701045N"
}

Novaković, M. M., Popović, M., Rakočević, Z. Lj.,& Bibić, N. M.. (2017). Structural, optical and electrical properties of reactively sputtered CrxNy films: Nitrogen influence on the phase formation. in Processing and Application of Ceramics, 11(1), 45-51.
https://doi.org/10.2298/PAC1701045N

Novaković MM, Popović M, Rakočević ZL, Bibić NM. Structural, optical and electrical properties of reactively sputtered CrxNy films: Nitrogen influence on the phase formation. in Processing and Application of Ceramics. 2017;11(1):45-51.
doi:10.2298/PAC1701045N .

Novaković, Mirjana M., Popović, Maja, Rakočević, Zlatko Lj., Bibić, Nataša M., "Structural, optical and electrical properties of reactively sputtered CrxNy films: Nitrogen influence on the phase formation" in Processing and Application of Ceramics, 11, no. 1 (2017):45-51,
https://doi.org/10.2298/PAC1701045N . .

TY  - JOUR
AU  - Božanić, Dušan K.
AU  - Draganić, Ilija
AU  - Bibić, Nataša M.
AU  - Luyt, Adriaan S.
AU  - Konstantinović, Zorica
AU  - Đoković, Vladimir
PY  - 2016
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/1097
AB  - Ethylene-co-vinyl acetate/iron nanocomposite films were fabricated by implantation with multiple charged ions at different fluencies. The films obtained with ion fluency of 1 x 10(17) cm(-2) were used for specific studies. It was found that spherical similar to 1.5 nm diameter nanoparticles were formed upon implantation. They were clustered into a single 80 nm wide strip about 40 nm beneath the film surface. The magnetic measurements of the film showed that the particles exhibit superparamagnetic behavior with a blocking temperature below 5K. A second type of the samples was also prepared with ion fluency of 1 x 10(17) cm(-2), but prior to implantation, the iron was evaporated onto the co-polymer surface. A nanocomposite film of different morphology was obtained upon the implantation and the particles were much smaller (-0.8 nm). The magnetic behavior of both the films was that of isolated nanoparticles, despite the high ion fluency of 1 x 10(17) cm(-2). (C) 2016 Elsevier B.V. All rights reserved.
PB  - Elsevier
T2  - Applied Surface Science
T1  - Morphology and magnetic properties of the ethylene-co-vinyl acetate/iron nanocomposite films prepared by implantation with Fe6+ ions
VL  - 378
SP  - 362
EP  - 367
DO  - 10.1016/j.apsusc.2016.04.020
ER  - 

@article{
author = "Božanić, Dušan K. and Draganić, Ilija and Bibić, Nataša M. and Luyt, Adriaan S. and Konstantinović, Zorica and Đoković, Vladimir",
year = "2016",
abstract = "Ethylene-co-vinyl acetate/iron nanocomposite films were fabricated by implantation with multiple charged ions at different fluencies. The films obtained with ion fluency of 1 x 10(17) cm(-2) were used for specific studies. It was found that spherical similar to 1.5 nm diameter nanoparticles were formed upon implantation. They were clustered into a single 80 nm wide strip about 40 nm beneath the film surface. The magnetic measurements of the film showed that the particles exhibit superparamagnetic behavior with a blocking temperature below 5K. A second type of the samples was also prepared with ion fluency of 1 x 10(17) cm(-2), but prior to implantation, the iron was evaporated onto the co-polymer surface. A nanocomposite film of different morphology was obtained upon the implantation and the particles were much smaller (-0.8 nm). The magnetic behavior of both the films was that of isolated nanoparticles, despite the high ion fluency of 1 x 10(17) cm(-2). (C) 2016 Elsevier B.V. All rights reserved.",
publisher = "Elsevier",
journal = "Applied Surface Science",
title = "Morphology and magnetic properties of the ethylene-co-vinyl acetate/iron nanocomposite films prepared by implantation with Fe6+ ions",
volume = "378",
pages = "362-367",
doi = "10.1016/j.apsusc.2016.04.020"
}

Božanić, D. K., Draganić, I., Bibić, N. M., Luyt, A. S., Konstantinović, Z.,& Đoković, V.. (2016). Morphology and magnetic properties of the ethylene-co-vinyl acetate/iron nanocomposite films prepared by implantation with Fe6+ ions. in Applied Surface Science
Elsevier., 378, 362-367.
https://doi.org/10.1016/j.apsusc.2016.04.020

Božanić DK, Draganić I, Bibić NM, Luyt AS, Konstantinović Z, Đoković V. Morphology and magnetic properties of the ethylene-co-vinyl acetate/iron nanocomposite films prepared by implantation with Fe6+ ions. in Applied Surface Science. 2016;378:362-367.
doi:10.1016/j.apsusc.2016.04.020 .

Božanić, Dušan K., Draganić, Ilija, Bibić, Nataša M., Luyt, Adriaan S., Konstantinović, Zorica, Đoković, Vladimir, "Morphology and magnetic properties of the ethylene-co-vinyl acetate/iron nanocomposite films prepared by implantation with Fe6+ ions" in Applied Surface Science, 378 (2016):362-367,
https://doi.org/10.1016/j.apsusc.2016.04.020 . .

TY  - JOUR
AU  - Popović, Maja
AU  - Novaković, Mirjana M.
AU  - Rakočević, Zlatko Lj.
AU  - Bibić, Nataša M.
PY  - 2016
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/1367
AB  - Titanium nitride (TiN) thin films thickness of similar to 260 nm prepared by dc reactive sputtering were irradiated with 200 keV silver (Ag) ions to the fluences ranging from 5 x 10(15) ions/cm(2) to 20 x 10(15) ions/cm(2). After implantation TiN layers were annealed 2 h at 700 degrees C in a vacuum. Ion irradiation-induced microstructural changes were examined by using Rutherford backscattering spectrometry, X-ray diffraction and transmission electron microscopy, while the surface topography was observed using atomic force microscopy. Spectroscopic ellipsometry was employed to get insights on the optical and electronic properties of TiN films with respect to their microstructure. The results showed that the irradiations lead to deformation of the lattice, increasing disorder and formation of new Ag phase. The optical results demonstrate the contribution of surface plasmon resonace (SPR) of Ag particles. SPR position shifted in the range of 354.3-476.9 nm when Ag ion fluence varied from 5 x 10(15) ions/cm(2) to 20 x 10(15) ions/cm(2). Shift in peak wavelength shows dependence on Ag particles concentration, suggesting that interaction between Ag particles dominate the surface plasmon resonance effect. Presence of Ag as second metal in the layer leads to overall decrease of optical resistivity of TiN. (C) 2016 Elsevier B.V. All rights reserved.
T2  - Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms
T1  - Tailoring the structural and optical properties of TiN thin films by Ag ion implantation
VL  - 389
SP  - 33
EP  - 39
DO  - 10.1016/j.nimb.2016.11.013
ER  - 

@article{
author = "Popović, Maja and Novaković, Mirjana M. and Rakočević, Zlatko Lj. and Bibić, Nataša M.",
year = "2016",
abstract = "Titanium nitride (TiN) thin films thickness of similar to 260 nm prepared by dc reactive sputtering were irradiated with 200 keV silver (Ag) ions to the fluences ranging from 5 x 10(15) ions/cm(2) to 20 x 10(15) ions/cm(2). After implantation TiN layers were annealed 2 h at 700 degrees C in a vacuum. Ion irradiation-induced microstructural changes were examined by using Rutherford backscattering spectrometry, X-ray diffraction and transmission electron microscopy, while the surface topography was observed using atomic force microscopy. Spectroscopic ellipsometry was employed to get insights on the optical and electronic properties of TiN films with respect to their microstructure. The results showed that the irradiations lead to deformation of the lattice, increasing disorder and formation of new Ag phase. The optical results demonstrate the contribution of surface plasmon resonace (SPR) of Ag particles. SPR position shifted in the range of 354.3-476.9 nm when Ag ion fluence varied from 5 x 10(15) ions/cm(2) to 20 x 10(15) ions/cm(2). Shift in peak wavelength shows dependence on Ag particles concentration, suggesting that interaction between Ag particles dominate the surface plasmon resonance effect. Presence of Ag as second metal in the layer leads to overall decrease of optical resistivity of TiN. (C) 2016 Elsevier B.V. All rights reserved.",
journal = "Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms",
title = "Tailoring the structural and optical properties of TiN thin films by Ag ion implantation",
volume = "389",
pages = "33-39",
doi = "10.1016/j.nimb.2016.11.013"
}

Popović, M., Novaković, M. M., Rakočević, Z. Lj.,& Bibić, N. M.. (2016). Tailoring the structural and optical properties of TiN thin films by Ag ion implantation. in Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms, 389, 33-39.
https://doi.org/10.1016/j.nimb.2016.11.013

Popović M, Novaković MM, Rakočević ZL, Bibić NM. Tailoring the structural and optical properties of TiN thin films by Ag ion implantation. in Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms. 2016;389:33-39.
doi:10.1016/j.nimb.2016.11.013 .

Popović, Maja, Novaković, Mirjana M., Rakočević, Zlatko Lj., Bibić, Nataša M., "Tailoring the structural and optical properties of TiN thin films by Ag ion implantation" in Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms, 389 (2016):33-39,
https://doi.org/10.1016/j.nimb.2016.11.013 . .

TY  - JOUR
AU  - Novaković, Mirjana M.
AU  - Popović, Maja
AU  - Zhang, Kun
AU  - Rakočević, Zlatko Lj.
AU  - Bibić, Nataša M.
PY  - 2016
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/1350
AB  - Modification in structural and optical properties of chromium-nitride (CrN) films induced by argon ion irradiation and thermal annealings were investigated using various experimental techniques. CrN films deposited by d.c. reactive sputtering on Si substrate were implanted with 200 keV argon ions, at fluences of 5-20 x 10(15) ions/cm(2). As-implanted samples were then annealed in vacuum, for 2 h at 700 degrees C. Rutherford backscattering spectrometry, X-ray diffraction, cross-sectional (high-resolution) transmission electron microscopy and spectroscopic ellipsometry (SE) measurements were carried out in order to study structural and optical properties of the layers. After irradiation with 200 keV Ar ions a damaged surface layer of nanocrystalline structure was generated, which extended beyond the implantation profile, but left an undamaged bottom zone. Partial loss of columnar structure observed in implanted samples was recovered after annealing at 700 degrees C and CrN started to decompose to Cr2N. This layer geometry determined from transmission electron microscopy was inferred in the analysis of SE data using the combined Drude and Tauc-Lorentz model, and the variation of the optical bandgap was deduced. The results are discussed on the basis of the changes induced in the microstructure. It was found that the optical properties of the layers are strongly dependent on the defects concentration of CrN. (C) 2016 Elsevier B.V. All rights reserved.
T2  - Optical Materials
T1  - Effects of 200 keV Ar-ions irradiation on the structural and optical properties of reactively sputtered CrN films
VL  - 62
SP  - 57
EP  - 63
DO  - 10.1016/j.optmat.2016.09.047
ER  - 

@article{
author = "Novaković, Mirjana M. and Popović, Maja and Zhang, Kun and Rakočević, Zlatko Lj. and Bibić, Nataša M.",
year = "2016",
abstract = "Modification in structural and optical properties of chromium-nitride (CrN) films induced by argon ion irradiation and thermal annealings were investigated using various experimental techniques. CrN films deposited by d.c. reactive sputtering on Si substrate were implanted with 200 keV argon ions, at fluences of 5-20 x 10(15) ions/cm(2). As-implanted samples were then annealed in vacuum, for 2 h at 700 degrees C. Rutherford backscattering spectrometry, X-ray diffraction, cross-sectional (high-resolution) transmission electron microscopy and spectroscopic ellipsometry (SE) measurements were carried out in order to study structural and optical properties of the layers. After irradiation with 200 keV Ar ions a damaged surface layer of nanocrystalline structure was generated, which extended beyond the implantation profile, but left an undamaged bottom zone. Partial loss of columnar structure observed in implanted samples was recovered after annealing at 700 degrees C and CrN started to decompose to Cr2N. This layer geometry determined from transmission electron microscopy was inferred in the analysis of SE data using the combined Drude and Tauc-Lorentz model, and the variation of the optical bandgap was deduced. The results are discussed on the basis of the changes induced in the microstructure. It was found that the optical properties of the layers are strongly dependent on the defects concentration of CrN. (C) 2016 Elsevier B.V. All rights reserved.",
journal = "Optical Materials",
title = "Effects of 200 keV Ar-ions irradiation on the structural and optical properties of reactively sputtered CrN films",
volume = "62",
pages = "57-63",
doi = "10.1016/j.optmat.2016.09.047"
}

Novaković, M. M., Popović, M., Zhang, K., Rakočević, Z. Lj.,& Bibić, N. M.. (2016). Effects of 200 keV Ar-ions irradiation on the structural and optical properties of reactively sputtered CrN films. in Optical Materials, 62, 57-63.
https://doi.org/10.1016/j.optmat.2016.09.047

Novaković MM, Popović M, Zhang K, Rakočević ZL, Bibić NM. Effects of 200 keV Ar-ions irradiation on the structural and optical properties of reactively sputtered CrN films. in Optical Materials. 2016;62:57-63.
doi:10.1016/j.optmat.2016.09.047 .

Novaković, Mirjana M., Popović, Maja, Zhang, Kun, Rakočević, Zlatko Lj., Bibić, Nataša M., "Effects of 200 keV Ar-ions irradiation on the structural and optical properties of reactively sputtered CrN films" in Optical Materials, 62 (2016):57-63,
https://doi.org/10.1016/j.optmat.2016.09.047 . .

TY  - JOUR
AU  - Surudžić, Rade D.
AU  - Janković, Ana
AU  - Bibić, Nataša M.
AU  - Vukašinović-Sekulić, Maja
AU  - Perić-Grujić, Aleksandra A.
AU  - Mišković-Stanković, Vesna B.
AU  - Park, Soo Jin
AU  - Rhee, Kyong Yop
PY  - 2016
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/865
AB  - Silver/poly(vinyl alcohol) and silver/poly(vinyl alcohol)/graphene nanocomposites in different forms (colloid dispersion, thin films and hydrogel discs) were synthesized by electrochemical reduction of Ag+ ions at constant current density. CV, Raman, XRD, FT-IR, and XPS analyses were used to characterize the interactions between silver nanoparticles, PVA molecules, and graphene. Ag/PVA/Gr nanocomposites had better mechanical and thermal properties and higher antibacterial activity against Staphylococcus aureus and Escherichia coli than Ag/PVA nanocomposites. Slow silver release, as well as a high remaining silver content (76%) after 28 days in simulated body fluid confirmed that both Ag/PVA and Ag/PVA/Gr nanocomposites are capable of maintaining sterility over time. (C) 2015 Elsevier Ltd. All rights reserved.
PB  - Elsevier
T2  - Composites: Part B: Engineering
T1  - Physico-chemical and mechanical properties and antibacterial activity of silver/poly(vinyl alcohol)/graphene nanocomposites obtained by electrochemical method
VL  - 85
SP  - 102
EP  - 112
DO  - 10.1016/j.compositesb.2015.09.029
ER  - 

@article{
author = "Surudžić, Rade D. and Janković, Ana and Bibić, Nataša M. and Vukašinović-Sekulić, Maja and Perić-Grujić, Aleksandra A. and Mišković-Stanković, Vesna B. and Park, Soo Jin and Rhee, Kyong Yop",
year = "2016",
abstract = "Silver/poly(vinyl alcohol) and silver/poly(vinyl alcohol)/graphene nanocomposites in different forms (colloid dispersion, thin films and hydrogel discs) were synthesized by electrochemical reduction of Ag+ ions at constant current density. CV, Raman, XRD, FT-IR, and XPS analyses were used to characterize the interactions between silver nanoparticles, PVA molecules, and graphene. Ag/PVA/Gr nanocomposites had better mechanical and thermal properties and higher antibacterial activity against Staphylococcus aureus and Escherichia coli than Ag/PVA nanocomposites. Slow silver release, as well as a high remaining silver content (76%) after 28 days in simulated body fluid confirmed that both Ag/PVA and Ag/PVA/Gr nanocomposites are capable of maintaining sterility over time. (C) 2015 Elsevier Ltd. All rights reserved.",
publisher = "Elsevier",
journal = "Composites: Part B: Engineering",
title = "Physico-chemical and mechanical properties and antibacterial activity of silver/poly(vinyl alcohol)/graphene nanocomposites obtained by electrochemical method",
volume = "85",
pages = "102-112",
doi = "10.1016/j.compositesb.2015.09.029"
}

Surudžić, R. D., Janković, A., Bibić, N. M., Vukašinović-Sekulić, M., Perić-Grujić, A. A., Mišković-Stanković, V. B., Park, S. J.,& Rhee, K. Y.. (2016). Physico-chemical and mechanical properties and antibacterial activity of silver/poly(vinyl alcohol)/graphene nanocomposites obtained by electrochemical method. in Composites: Part B: Engineering
Elsevier., 85, 102-112.
https://doi.org/10.1016/j.compositesb.2015.09.029

Surudžić RD, Janković A, Bibić NM, Vukašinović-Sekulić M, Perić-Grujić AA, Mišković-Stanković VB, Park SJ, Rhee KY. Physico-chemical and mechanical properties and antibacterial activity of silver/poly(vinyl alcohol)/graphene nanocomposites obtained by electrochemical method. in Composites: Part B: Engineering. 2016;85:102-112.
doi:10.1016/j.compositesb.2015.09.029 .

Surudžić, Rade D., Janković, Ana, Bibić, Nataša M., Vukašinović-Sekulić, Maja, Perić-Grujić, Aleksandra A., Mišković-Stanković, Vesna B., Park, Soo Jin, Rhee, Kyong Yop, "Physico-chemical and mechanical properties and antibacterial activity of silver/poly(vinyl alcohol)/graphene nanocomposites obtained by electrochemical method" in Composites: Part B: Engineering, 85 (2016):102-112,
https://doi.org/10.1016/j.compositesb.2015.09.029 . .

TY  - JOUR
AU  - Popović, Maja
AU  - Novaković, Mirjana M.
AU  - Bibić, Nataša M.
PY  - 2015
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/919
AB  - The structure, absorption coefficient and electrical resistivity studies on TiN thin films are presented. The film of thickness 240 nm was grown on Si (100) substrate by DC reactive sputtering at an average deposition rate of similar to 8 nm/min. After deposition the samples were annealed for 1 h at 600 degrees C and 2 h at 700 degrees C in nitrogen ambient and vacuum furnace, respectively. Structural characterizations were performed by Rutherford backscattering spectrometry (RBS), X-ray diffraction (XRD) and transmission electron microscopy (TEM). The optical properties were investigated by spectroscopic ellipsometry while a four point probe was used for electrical characterization. It was found that the post-deposition annealing of the films did not cause any variation in stoichiometry, but strongly affects the structural parameters such as lattice constant, micro-strain and grain size. The observed increase in the grain size after annealing leads to significantly lower value of the coefficient of absorption. These changes could be directly correlated with variation of electrical properties of TiN thin films.
T2  - Processing and Application of Ceramics
T1  - Annealing effects on the properties of TiN thin films
VL  - 9
IS  - 2
SP  - 67
EP  - 71
DO  - 10.2298/PAC1502067P
ER  - 

@article{
author = "Popović, Maja and Novaković, Mirjana M. and Bibić, Nataša M.",
year = "2015",
abstract = "The structure, absorption coefficient and electrical resistivity studies on TiN thin films are presented. The film of thickness 240 nm was grown on Si (100) substrate by DC reactive sputtering at an average deposition rate of similar to 8 nm/min. After deposition the samples were annealed for 1 h at 600 degrees C and 2 h at 700 degrees C in nitrogen ambient and vacuum furnace, respectively. Structural characterizations were performed by Rutherford backscattering spectrometry (RBS), X-ray diffraction (XRD) and transmission electron microscopy (TEM). The optical properties were investigated by spectroscopic ellipsometry while a four point probe was used for electrical characterization. It was found that the post-deposition annealing of the films did not cause any variation in stoichiometry, but strongly affects the structural parameters such as lattice constant, micro-strain and grain size. The observed increase in the grain size after annealing leads to significantly lower value of the coefficient of absorption. These changes could be directly correlated with variation of electrical properties of TiN thin films.",
journal = "Processing and Application of Ceramics",
title = "Annealing effects on the properties of TiN thin films",
volume = "9",
number = "2",
pages = "67-71",
doi = "10.2298/PAC1502067P"
}

Popović, M., Novaković, M. M.,& Bibić, N. M.. (2015). Annealing effects on the properties of TiN thin films. in Processing and Application of Ceramics, 9(2), 67-71.
https://doi.org/10.2298/PAC1502067P

Popović M, Novaković MM, Bibić NM. Annealing effects on the properties of TiN thin films. in Processing and Application of Ceramics. 2015;9(2):67-71.
doi:10.2298/PAC1502067P .

Popović, Maja, Novaković, Mirjana M., Bibić, Nataša M., "Annealing effects on the properties of TiN thin films" in Processing and Application of Ceramics, 9, no. 2 (2015):67-71,
https://doi.org/10.2298/PAC1502067P . .

TY  - JOUR
AU  - Novaković, Mirjana M.
AU  - Popović, Maja
AU  - Bibić, Nataša M.
PY  - 2015
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/728
AB  - The present study deals with CrN films irradiated at room temperature (RT) with 200 keV Ar+ ions. The CrN layers were deposited by d.c. reactive sputtering on Si (100) wafers, at nitrogen partial pressure of 5x10(-4) mbar, to a total thickness of 280 nm. The substrates were held at 150 degrees C during deposition. After deposition the CrN layers were irradiated with 200 keV Ar+ ions to the fluences of 5x10(15) - 2x10(16) ions/cm(2). Structural characterization was performed with Rutherford backscattering spectroscopy (RBS), cross-sectional transmission electron microscopy (XTEM) and X-ray diffraction (XRD). Spectroscopic ellipsometry measurements were carried out in order to study optical properties of the samples. The irradiations caused the microstructrual changes in CrN layers, but no amorphization even at the highest argon fluence of 2x10(16) ions/cm(2). Observed changes in microstructure were correlated with the variation in optical parameters. It was found that both refractive index and extinction coefficient are strongly dependent on the defect concentration in CrN layers.
T2  - Science of Sintering
T1  - Argon Irradiation Effects on the Structural and Optical Properties of Reactively Sputtered CrN Films
VL  - 47
IS  - 2
SP  - 187
EP  - 194
DO  - 10.2298/SOS1502187N
ER  - 

@article{
author = "Novaković, Mirjana M. and Popović, Maja and Bibić, Nataša M.",
year = "2015",
abstract = "The present study deals with CrN films irradiated at room temperature (RT) with 200 keV Ar+ ions. The CrN layers were deposited by d.c. reactive sputtering on Si (100) wafers, at nitrogen partial pressure of 5x10(-4) mbar, to a total thickness of 280 nm. The substrates were held at 150 degrees C during deposition. After deposition the CrN layers were irradiated with 200 keV Ar+ ions to the fluences of 5x10(15) - 2x10(16) ions/cm(2). Structural characterization was performed with Rutherford backscattering spectroscopy (RBS), cross-sectional transmission electron microscopy (XTEM) and X-ray diffraction (XRD). Spectroscopic ellipsometry measurements were carried out in order to study optical properties of the samples. The irradiations caused the microstructrual changes in CrN layers, but no amorphization even at the highest argon fluence of 2x10(16) ions/cm(2). Observed changes in microstructure were correlated with the variation in optical parameters. It was found that both refractive index and extinction coefficient are strongly dependent on the defect concentration in CrN layers.",
journal = "Science of Sintering",
title = "Argon Irradiation Effects on the Structural and Optical Properties of Reactively Sputtered CrN Films",
volume = "47",
number = "2",
pages = "187-194",
doi = "10.2298/SOS1502187N"
}

Novaković, M. M., Popović, M.,& Bibić, N. M.. (2015). Argon Irradiation Effects on the Structural and Optical Properties of Reactively Sputtered CrN Films. in Science of Sintering, 47(2), 187-194.
https://doi.org/10.2298/SOS1502187N

Novaković MM, Popović M, Bibić NM. Argon Irradiation Effects on the Structural and Optical Properties of Reactively Sputtered CrN Films. in Science of Sintering. 2015;47(2):187-194.
doi:10.2298/SOS1502187N .

Novaković, Mirjana M., Popović, Maja, Bibić, Nataša M., "Argon Irradiation Effects on the Structural and Optical Properties of Reactively Sputtered CrN Films" in Science of Sintering, 47, no. 2 (2015):187-194,
https://doi.org/10.2298/SOS1502187N . .

TY  - JOUR
AU  - Novaković, Mirjana M.
AU  - Popović, Maja
AU  - Zhang, Kun
AU  - Mitrić, Miodrag
AU  - Bibić, Nataša M.
PY  - 2015
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/691
AB  - Reactively sputtered CrN layer, deposited on Si(100) wafer, was implanted at room temperature with 80-keV V+. ions to the fluence of 2 x 10(17) ions/cm(2). After implantation the sample was annealed in a vacuum, for 2 h at 700 degrees C. The microstructure and chemical composition of CrN films was investigated using Rutherford backscattering spectroscopy, X-ray photoelectron spectroscopy, X-ray diffraction and cross-sectional transmission electron microscopy (conventional and high-resolution), together with fast Fourier transformation analyses. It was found that vanadium atoms are distributed in the sub-surface region of CrN layer, with the maximum concentration at similar to 20 nm. After annealing the formation of VN nanoparticles was observed. The nanoparticles are spherical shaped with a size of 8-20 nm in diameter. (C) 2015 Elsevier B.V. All rights reserved.
T2  - Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms
T1  - Irradiation induced formation of VN in CrN thin films
VL  - 358
SP  - 206
EP  - 209
DO  - 10.1016/j.nimb.2015.06.036
ER  - 

@article{
author = "Novaković, Mirjana M. and Popović, Maja and Zhang, Kun and Mitrić, Miodrag and Bibić, Nataša M.",
year = "2015",
abstract = "Reactively sputtered CrN layer, deposited on Si(100) wafer, was implanted at room temperature with 80-keV V+. ions to the fluence of 2 x 10(17) ions/cm(2). After implantation the sample was annealed in a vacuum, for 2 h at 700 degrees C. The microstructure and chemical composition of CrN films was investigated using Rutherford backscattering spectroscopy, X-ray photoelectron spectroscopy, X-ray diffraction and cross-sectional transmission electron microscopy (conventional and high-resolution), together with fast Fourier transformation analyses. It was found that vanadium atoms are distributed in the sub-surface region of CrN layer, with the maximum concentration at similar to 20 nm. After annealing the formation of VN nanoparticles was observed. The nanoparticles are spherical shaped with a size of 8-20 nm in diameter. (C) 2015 Elsevier B.V. All rights reserved.",
journal = "Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms",
title = "Irradiation induced formation of VN in CrN thin films",
volume = "358",
pages = "206-209",
doi = "10.1016/j.nimb.2015.06.036"
}

Novaković, M. M., Popović, M., Zhang, K., Mitrić, M.,& Bibić, N. M.. (2015). Irradiation induced formation of VN in CrN thin films. in Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms, 358, 206-209.
https://doi.org/10.1016/j.nimb.2015.06.036

Novaković MM, Popović M, Zhang K, Mitrić M, Bibić NM. Irradiation induced formation of VN in CrN thin films. in Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms. 2015;358:206-209.
doi:10.1016/j.nimb.2015.06.036 .

Novaković, Mirjana M., Popović, Maja, Zhang, Kun, Mitrić, Miodrag, Bibić, Nataša M., "Irradiation induced formation of VN in CrN thin films" in Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms, 358 (2015):206-209,
https://doi.org/10.1016/j.nimb.2015.06.036 . .

TY  - JOUR
AU  - Popović, Maja
AU  - Novaković, Mirjana M.
AU  - Mitrić, Miodrag
AU  - Zhang, Kun
AU  - Bibić, Nataša M.
PY  - 2015
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/344
AB  - Modification in structural, optical and electrical properties of titanium nitride (TiN) thin films induced by argon ion irradiation and thermal annealings was studied using various experimental techniques. TiN thin films deposited by dc reactive sputtering on Si substrate were implanted with argon ions at 200 key. As-implanted samples were annealed before or after ion irradiation at 600 degrees C and 700 degrees C, respectively. Rutherford bacicscattering spectrometry, X-ray diffraction, cross-sectional (high-resolution) transmission electron microscopy, spectroscopic ellipsometry and electrical measurements were carried out in order to study structural, optical and electrical properties of TiN/Si samples. After irradiation with 200 keV Ar ions the columnar microstructure of TiN was changed and the presence of smaller crystalline grains was observed. Partial Loss of columnar structure observed in implanted samples was completely recovered after annealing at 700 degrees C. Observed changes in microstructure induced by ion irradiation and annealings were correlated with the variation in optical parameters obtained by spectroscopic ellipsometry. It was found that both refractive index and extinction coefficient are strongly dependent on the defects concentration and size of the crystalline grains in TiN layers. (C) 2014 Elsevier Ltd. All rights reserved.
T2  - International Journal of Refractory Metals and Hard Materials
T1  - Structural, optical and electrical properties of argon implanted TiN thin films
VL  - 48
SP  - 318
EP  - 323
DO  - 10.1016/j.ijrmhm.2014.09.026
ER  - 

@article{
author = "Popović, Maja and Novaković, Mirjana M. and Mitrić, Miodrag and Zhang, Kun and Bibić, Nataša M.",
year = "2015",
abstract = "Modification in structural, optical and electrical properties of titanium nitride (TiN) thin films induced by argon ion irradiation and thermal annealings was studied using various experimental techniques. TiN thin films deposited by dc reactive sputtering on Si substrate were implanted with argon ions at 200 key. As-implanted samples were annealed before or after ion irradiation at 600 degrees C and 700 degrees C, respectively. Rutherford bacicscattering spectrometry, X-ray diffraction, cross-sectional (high-resolution) transmission electron microscopy, spectroscopic ellipsometry and electrical measurements were carried out in order to study structural, optical and electrical properties of TiN/Si samples. After irradiation with 200 keV Ar ions the columnar microstructure of TiN was changed and the presence of smaller crystalline grains was observed. Partial Loss of columnar structure observed in implanted samples was completely recovered after annealing at 700 degrees C. Observed changes in microstructure induced by ion irradiation and annealings were correlated with the variation in optical parameters obtained by spectroscopic ellipsometry. It was found that both refractive index and extinction coefficient are strongly dependent on the defects concentration and size of the crystalline grains in TiN layers. (C) 2014 Elsevier Ltd. All rights reserved.",
journal = "International Journal of Refractory Metals and Hard Materials",
title = "Structural, optical and electrical properties of argon implanted TiN thin films",
volume = "48",
pages = "318-323",
doi = "10.1016/j.ijrmhm.2014.09.026"
}

Popović, M., Novaković, M. M., Mitrić, M., Zhang, K.,& Bibić, N. M.. (2015). Structural, optical and electrical properties of argon implanted TiN thin films. in International Journal of Refractory Metals and Hard Materials, 48, 318-323.
https://doi.org/10.1016/j.ijrmhm.2014.09.026

Popović M, Novaković MM, Mitrić M, Zhang K, Bibić NM. Structural, optical and electrical properties of argon implanted TiN thin films. in International Journal of Refractory Metals and Hard Materials. 2015;48:318-323.
doi:10.1016/j.ijrmhm.2014.09.026 .

Popović, Maja, Novaković, Mirjana M., Mitrić, Miodrag, Zhang, Kun, Bibić, Nataša M., "Structural, optical and electrical properties of argon implanted TiN thin films" in International Journal of Refractory Metals and Hard Materials, 48 (2015):318-323,
https://doi.org/10.1016/j.ijrmhm.2014.09.026 . .

TY  - JOUR
AU  - Laban, Bojana B.
AU  - Vodnik, Vesna
AU  - Dramićanin, Miroslav
AU  - Novaković, Mirjana M.
AU  - Bibić, Nataša M.
AU  - Sovilj, Sofija P.
AU  - Vasić, Vesna M.
PY  - 2014
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/155
AB  - The aim of the present work was to elucidate the binding mechanism and kinetics of anionic cyanine dye 3,3-disulfopropyl-5,5-dichlorothiacyanine sodium salt (TC) J-aggregation on the surface of silver nanoparticles (AgNPs, particle size similar to 6 nm). The hybrid J-aggregateAgNPs assembly was characterized by TEM analysis, UVvis spectrophotometry, and fluorescence measurements. In the elucidation of TC binding on the surface of AgNPs, they were considered as macromolecules with several binding sites and TC dye was considered as a ligand. Scatchard and Hill analysis revealed that TC binding was a random process rather than cooperative, with similar to 200 bonded TC molecules per AgNP and a binding constant K-a = 4.8 x 10(7) M. The TC-AgNP assembly exerted concentration-dependent fluorescence quenching properties. The linearity of the SternVolmer relation, accounting for both static and dynamic quenching, indicated that only one type of quenching occurred, suggesting that AgNPs quenched the fluorescence of TC with an extraordinarily high SternVolmer constant (KSV) in the range of 10(8) M-1. Additionally, the kinetics of J-aggregation of TC in the presence of AgNPs was studied using a stopped flow technique. Kinetic measurements were performed as a function of the TC and AgNP concentration, yielding sigmoidal kinetic curves. The concentration dependence of the parameters of the kinetic curves indicated that J-aggregate formation on the AgNP surface occurred via a two-step process; the first was adsorption of the initial dye layer, followed by the growth of consecutive layers.
T2  - Journal of Physical Chemistry. C
T1  - Mechanism and Kinetics of J-Aggregation of Thiacyanine Dye in the Presence of Silver Nanoparticles
VL  - 118
IS  - 40
SP  - 23393
EP  - 23401
DO  - 10.1021/jp507086g
ER  - 

@article{
author = "Laban, Bojana B. and Vodnik, Vesna and Dramićanin, Miroslav and Novaković, Mirjana M. and Bibić, Nataša M. and Sovilj, Sofija P. and Vasić, Vesna M.",
year = "2014",
abstract = "The aim of the present work was to elucidate the binding mechanism and kinetics of anionic cyanine dye 3,3-disulfopropyl-5,5-dichlorothiacyanine sodium salt (TC) J-aggregation on the surface of silver nanoparticles (AgNPs, particle size similar to 6 nm). The hybrid J-aggregateAgNPs assembly was characterized by TEM analysis, UVvis spectrophotometry, and fluorescence measurements. In the elucidation of TC binding on the surface of AgNPs, they were considered as macromolecules with several binding sites and TC dye was considered as a ligand. Scatchard and Hill analysis revealed that TC binding was a random process rather than cooperative, with similar to 200 bonded TC molecules per AgNP and a binding constant K-a = 4.8 x 10(7) M. The TC-AgNP assembly exerted concentration-dependent fluorescence quenching properties. The linearity of the SternVolmer relation, accounting for both static and dynamic quenching, indicated that only one type of quenching occurred, suggesting that AgNPs quenched the fluorescence of TC with an extraordinarily high SternVolmer constant (KSV) in the range of 10(8) M-1. Additionally, the kinetics of J-aggregation of TC in the presence of AgNPs was studied using a stopped flow technique. Kinetic measurements were performed as a function of the TC and AgNP concentration, yielding sigmoidal kinetic curves. The concentration dependence of the parameters of the kinetic curves indicated that J-aggregate formation on the AgNP surface occurred via a two-step process; the first was adsorption of the initial dye layer, followed by the growth of consecutive layers.",
journal = "Journal of Physical Chemistry. C",
title = "Mechanism and Kinetics of J-Aggregation of Thiacyanine Dye in the Presence of Silver Nanoparticles",
volume = "118",
number = "40",
pages = "23393-23401",
doi = "10.1021/jp507086g"
}

Laban, B. B., Vodnik, V., Dramićanin, M., Novaković, M. M., Bibić, N. M., Sovilj, S. P.,& Vasić, V. M.. (2014). Mechanism and Kinetics of J-Aggregation of Thiacyanine Dye in the Presence of Silver Nanoparticles. in Journal of Physical Chemistry. C, 118(40), 23393-23401.
https://doi.org/10.1021/jp507086g

Laban BB, Vodnik V, Dramićanin M, Novaković MM, Bibić NM, Sovilj SP, Vasić VM. Mechanism and Kinetics of J-Aggregation of Thiacyanine Dye in the Presence of Silver Nanoparticles. in Journal of Physical Chemistry. C. 2014;118(40):23393-23401.
doi:10.1021/jp507086g .

Laban, Bojana B., Vodnik, Vesna, Dramićanin, Miroslav, Novaković, Mirjana M., Bibić, Nataša M., Sovilj, Sofija P., Vasić, Vesna M., "Mechanism and Kinetics of J-Aggregation of Thiacyanine Dye in the Presence of Silver Nanoparticles" in Journal of Physical Chemistry. C, 118, no. 40 (2014):23393-23401,
https://doi.org/10.1021/jp507086g . .

TY  - JOUR
AU  - Marinović-Cincović, Milena
AU  - Radosavljević, Aleksandra
AU  - Krstić, Jelena
AU  - Spasojević, Jelena P.
AU  - Bibić, Nataša M.
AU  - Mitrić, Miodrag
AU  - Kačarević-Popović, Zorica M.
PY  - 2014
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/370
AB  - Magnetic field sensitive gels, ferrogels, are new promising class of hydrogels. The coupling of hydrogels and magnetic particles has potential application in soft actuators, such as artificial muscles, or for hyperthermia application. In this study, the composite of magnetite particles (Fe3O4) and poly(vinyl alcohol) (PVA) hydrogel is developed using gamma irradiation as a crosslinking agent. PVA and Fe3O4 were chosen due to their well-established biocompatibility, radiation crosslinking potential (PVA), mild magnetic properties and the Curie point near desired heating temperature range (Fe3O4). Physicochemical characteristics of these systems show the effect of the presence of particles in the process of radiation-induced crosslinking. Obtained PVA/Fe3O4 ferrogel composite has greater swelling capacity, activation energy of dehydration and dehydration rate compared to PVA hydrogel, crosslinked under the same conditions.
T2  - Hemijska industrija
T1  - Physicochemical characteristics of gamma irradiation crosslinked poly(vinyl alcohol)/magnetite ferrogel composite
VL  - 68
IS  - 6
SP  - 743
EP  - 753
DO  - 10.2298/HEMIND141104081M
ER  - 

@article{
author = "Marinović-Cincović, Milena and Radosavljević, Aleksandra and Krstić, Jelena and Spasojević, Jelena P. and Bibić, Nataša M. and Mitrić, Miodrag and Kačarević-Popović, Zorica M.",
year = "2014",
abstract = "Magnetic field sensitive gels, ferrogels, are new promising class of hydrogels. The coupling of hydrogels and magnetic particles has potential application in soft actuators, such as artificial muscles, or for hyperthermia application. In this study, the composite of magnetite particles (Fe3O4) and poly(vinyl alcohol) (PVA) hydrogel is developed using gamma irradiation as a crosslinking agent. PVA and Fe3O4 were chosen due to their well-established biocompatibility, radiation crosslinking potential (PVA), mild magnetic properties and the Curie point near desired heating temperature range (Fe3O4). Physicochemical characteristics of these systems show the effect of the presence of particles in the process of radiation-induced crosslinking. Obtained PVA/Fe3O4 ferrogel composite has greater swelling capacity, activation energy of dehydration and dehydration rate compared to PVA hydrogel, crosslinked under the same conditions.",
journal = "Hemijska industrija",
title = "Physicochemical characteristics of gamma irradiation crosslinked poly(vinyl alcohol)/magnetite ferrogel composite",
volume = "68",
number = "6",
pages = "743-753",
doi = "10.2298/HEMIND141104081M"
}

Marinović-Cincović, M., Radosavljević, A., Krstić, J., Spasojević, J. P., Bibić, N. M., Mitrić, M.,& Kačarević-Popović, Z. M.. (2014). Physicochemical characteristics of gamma irradiation crosslinked poly(vinyl alcohol)/magnetite ferrogel composite. in Hemijska industrija, 68(6), 743-753.
https://doi.org/10.2298/HEMIND141104081M

Marinović-Cincović M, Radosavljević A, Krstić J, Spasojević JP, Bibić NM, Mitrić M, Kačarević-Popović ZM. Physicochemical characteristics of gamma irradiation crosslinked poly(vinyl alcohol)/magnetite ferrogel composite. in Hemijska industrija. 2014;68(6):743-753.
doi:10.2298/HEMIND141104081M .

Marinović-Cincović, Milena, Radosavljević, Aleksandra, Krstić, Jelena, Spasojević, Jelena P., Bibić, Nataša M., Mitrić, Miodrag, Kačarević-Popović, Zorica M., "Physicochemical characteristics of gamma irradiation crosslinked poly(vinyl alcohol)/magnetite ferrogel composite" in Hemijska industrija, 68, no. 6 (2014):743-753,
https://doi.org/10.2298/HEMIND141104081M . .

TY  - JOUR
AU  - Novaković, Mirjana M.
AU  - Popović, Maja
AU  - Zhang, Kun
AU  - Lieb, K. P.
AU  - Bibić, Nataša M.
PY  - 2014
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/5890
AB  - The effect of the interface in cobalt-silicon bilayers on the silicide phase formation and microstructure has been investigated. Thin cobalt films were deposited by electron beam evaporation to a thickness of 50 nm on crystalline silicon (c-Si) or silicon with pre-amorphized surface (a-Si). After deposition one set of samples was annealed for 2 h at 200, 300, 400, 500, 600 and 700 degrees C. Another set of samples was irradiated with 400 keV Xe+ ions and then annealed at the same temperatures. Phase transitions were investigated with Rutherford backscattering spectroscopy, X-ray diffraction and cross-sectional transmission electron microscopy. No silicide formation was observed up to 400 degrees C, for both non-irradiated and ion-irradiated samples. When increasing the annealing temperature, the non-irradiated and irradiated Co/c-Si samples showed a similar behaviour: at 500 degrees C, CoSi appeared as the dominant silicide, followed by the formation of CoSi2 at 600 and 700 degrees C. In the case of non-irradiated Co/a-Si samples, no silicide formation occurred up to 700 degrees C, while irradiated samples with pre-amorphized substrate (Co/a-Si) showed a phase sequence similar to that in the Co/c-Si system. The observed phase transitions are found to be consistent with predictions of the effective heat of formation model. (C) 2014 Elsevier B. V. All rights reserved.
T2  - Applied Surface Science
T1  - Silicide phases formation in Co/c-Si and Co/a-Si systems during thermal annealing
VL  - 295
SP  - 158
EP  - 163
DO  - 10.1016/j.apsusc.2014.01.020
ER  - 

@article{
author = "Novaković, Mirjana M. and Popović, Maja and Zhang, Kun and Lieb, K. P. and Bibić, Nataša M.",
year = "2014",
abstract = "The effect of the interface in cobalt-silicon bilayers on the silicide phase formation and microstructure has been investigated. Thin cobalt films were deposited by electron beam evaporation to a thickness of 50 nm on crystalline silicon (c-Si) or silicon with pre-amorphized surface (a-Si). After deposition one set of samples was annealed for 2 h at 200, 300, 400, 500, 600 and 700 degrees C. Another set of samples was irradiated with 400 keV Xe+ ions and then annealed at the same temperatures. Phase transitions were investigated with Rutherford backscattering spectroscopy, X-ray diffraction and cross-sectional transmission electron microscopy. No silicide formation was observed up to 400 degrees C, for both non-irradiated and ion-irradiated samples. When increasing the annealing temperature, the non-irradiated and irradiated Co/c-Si samples showed a similar behaviour: at 500 degrees C, CoSi appeared as the dominant silicide, followed by the formation of CoSi2 at 600 and 700 degrees C. In the case of non-irradiated Co/a-Si samples, no silicide formation occurred up to 700 degrees C, while irradiated samples with pre-amorphized substrate (Co/a-Si) showed a phase sequence similar to that in the Co/c-Si system. The observed phase transitions are found to be consistent with predictions of the effective heat of formation model. (C) 2014 Elsevier B. V. All rights reserved.",
journal = "Applied Surface Science",
title = "Silicide phases formation in Co/c-Si and Co/a-Si systems during thermal annealing",
volume = "295",
pages = "158-163",
doi = "10.1016/j.apsusc.2014.01.020"
}

Novaković, M. M., Popović, M., Zhang, K., Lieb, K. P.,& Bibić, N. M.. (2014). Silicide phases formation in Co/c-Si and Co/a-Si systems during thermal annealing. in Applied Surface Science, 295, 158-163.
https://doi.org/10.1016/j.apsusc.2014.01.020

Novaković MM, Popović M, Zhang K, Lieb KP, Bibić NM. Silicide phases formation in Co/c-Si and Co/a-Si systems during thermal annealing. in Applied Surface Science. 2014;295:158-163.
doi:10.1016/j.apsusc.2014.01.020 .

Novaković, Mirjana M., Popović, Maja, Zhang, Kun, Lieb, K. P., Bibić, Nataša M., "Silicide phases formation in Co/c-Si and Co/a-Si systems during thermal annealing" in Applied Surface Science, 295 (2014):158-163,
https://doi.org/10.1016/j.apsusc.2014.01.020 . .

TY  - JOUR
AU  - Trandafilović, Lidija V.
AU  - Bibić, Nataša M.
AU  - Georges, M. K.
AU  - Blanuša, Jovan
AU  - Radhakrishnan, T.
AU  - Đoković, Vladimir
PY  - 2013
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/7027
AB  - Nanostructured cadmium selenide (CdSe) and lead sulfide (PbS) semiconductors were prepared in a poly(2-(dimethylamino)ethyl methacrylate-co-acrylic acid) matrix. The obtained nanoparticles were characterized by using optical and structural methods. Co-polymers were synthesized in two different molar ratios of pDMAEMA: acrylic acid monomer units (1 : 2, 1 : 1). Transmission electron microscopy analysis confirmed the presence of nano-sized CdSe and PbS particles. In the case of CdSe, a shift of the onset of the optical absorption toward lower wavelengths was observed. X-ray diffraction analysis revealed that both CdSe and PbS nanoparticles have cubic crystal structure.
T2  - Physica Scripta
T1  - Semiconductor nanoparticles in poly((2-dimethylamino)ethyl methacrylate-co-acrylic acid) co-polymers
VL  - T157
DO  - 10.1088/0031-8949/2013/T157/014063
ER  - 

@article{
author = "Trandafilović, Lidija V. and Bibić, Nataša M. and Georges, M. K. and Blanuša, Jovan and Radhakrishnan, T. and Đoković, Vladimir",
year = "2013",
abstract = "Nanostructured cadmium selenide (CdSe) and lead sulfide (PbS) semiconductors were prepared in a poly(2-(dimethylamino)ethyl methacrylate-co-acrylic acid) matrix. The obtained nanoparticles were characterized by using optical and structural methods. Co-polymers were synthesized in two different molar ratios of pDMAEMA: acrylic acid monomer units (1 : 2, 1 : 1). Transmission electron microscopy analysis confirmed the presence of nano-sized CdSe and PbS particles. In the case of CdSe, a shift of the onset of the optical absorption toward lower wavelengths was observed. X-ray diffraction analysis revealed that both CdSe and PbS nanoparticles have cubic crystal structure.",
journal = "Physica Scripta",
title = "Semiconductor nanoparticles in poly((2-dimethylamino)ethyl methacrylate-co-acrylic acid) co-polymers",
volume = "T157",
doi = "10.1088/0031-8949/2013/T157/014063"
}

Trandafilović, L. V., Bibić, N. M., Georges, M. K., Blanuša, J., Radhakrishnan, T.,& Đoković, V.. (2013). Semiconductor nanoparticles in poly((2-dimethylamino)ethyl methacrylate-co-acrylic acid) co-polymers. in Physica Scripta, T157.
https://doi.org/10.1088/0031-8949/2013/T157/014063

Trandafilović LV, Bibić NM, Georges MK, Blanuša J, Radhakrishnan T, Đoković V. Semiconductor nanoparticles in poly((2-dimethylamino)ethyl methacrylate-co-acrylic acid) co-polymers. in Physica Scripta. 2013;T157.
doi:10.1088/0031-8949/2013/T157/014063 .

Trandafilović, Lidija V., Bibić, Nataša M., Georges, M. K., Blanuša, Jovan, Radhakrishnan, T., Đoković, Vladimir, "Semiconductor nanoparticles in poly((2-dimethylamino)ethyl methacrylate-co-acrylic acid) co-polymers" in Physica Scripta, T157 (2013),
https://doi.org/10.1088/0031-8949/2013/T157/014063 . .

TY  - JOUR
AU  - Surudžić, Rade D.
AU  - Jovanović, Željka
AU  - Bibić, Nataša M.
AU  - Nikolić, Branislav Ž.
AU  - Mišković-Stanković, Vesna B.
PY  - 2013
UR  - https://vinar.vin.bg.ac.rs/handle/123456789/5828
AB  - In this work, silver/poly(vinyl alcohol), Ag/PVA, colloidal dispersions were obtained by electrochemical reduction of Ag+. The electrochemical synthesis of silver nanoparticles in aqueous solutions of 5 and 10 wt. % PVA, containing 0.1 M KNO3 and 3.9 mM AgNO3, was performed at a constant current density of 25 mA cm(-2) for a synthesis time of 10 min. The presence of silver nanoparticles was confirmed by UV-Vis spectroscopy. Cyclic voltammetry analysis and FT-IR spectroscopy indicated interactions between the silver nanoparticles and the PVA molecules. TEM analysis confirmed the spherical shape of the obtained silver nanoparticles, with a mean diameter of 15 +/- 9 nm.
T2  - Journal of the Serbian Chemical Society
T1  - Electrochemical synthesis of silver nanoparticles in poly(vinyl alcohol) solution
VL  - 78
IS  - 12
SP  - 2087
EP  - 2098
DO  - 10.2298/JSC131017124S
ER  - 

@article{
author = "Surudžić, Rade D. and Jovanović, Željka and Bibić, Nataša M. and Nikolić, Branislav Ž. and Mišković-Stanković, Vesna B.",
year = "2013",
abstract = "In this work, silver/poly(vinyl alcohol), Ag/PVA, colloidal dispersions were obtained by electrochemical reduction of Ag+. The electrochemical synthesis of silver nanoparticles in aqueous solutions of 5 and 10 wt. % PVA, containing 0.1 M KNO3 and 3.9 mM AgNO3, was performed at a constant current density of 25 mA cm(-2) for a synthesis time of 10 min. The presence of silver nanoparticles was confirmed by UV-Vis spectroscopy. Cyclic voltammetry analysis and FT-IR spectroscopy indicated interactions between the silver nanoparticles and the PVA molecules. TEM analysis confirmed the spherical shape of the obtained silver nanoparticles, with a mean diameter of 15 +/- 9 nm.",
journal = "Journal of the Serbian Chemical Society",
title = "Electrochemical synthesis of silver nanoparticles in poly(vinyl alcohol) solution",
volume = "78",
number = "12",
pages = "2087-2098",
doi = "10.2298/JSC131017124S"
}

Surudžić, R. D., Jovanović, Ž., Bibić, N. M., Nikolić, B. Ž.,& Mišković-Stanković, V. B.. (2013). Electrochemical synthesis of silver nanoparticles in poly(vinyl alcohol) solution. in Journal of the Serbian Chemical Society, 78(12), 2087-2098.
https://doi.org/10.2298/JSC131017124S

Surudžić RD, Jovanović Ž, Bibić NM, Nikolić BŽ, Mišković-Stanković VB. Electrochemical synthesis of silver nanoparticles in poly(vinyl alcohol) solution. in Journal of the Serbian Chemical Society. 2013;78(12):2087-2098.
doi:10.2298/JSC131017124S .

Surudžić, Rade D., Jovanović, Željka, Bibić, Nataša M., Nikolić, Branislav Ž., Mišković-Stanković, Vesna B., "Electrochemical synthesis of silver nanoparticles in poly(vinyl alcohol) solution" in Journal of the Serbian Chemical Society, 78, no. 12 (2013):2087-2098,
https://doi.org/10.2298/JSC131017124S . .