Photoinduced deposition of copper on nanocrystalline TiO2 films
Apstrakt
Nanocrystalline TiO2 films were prepared on glass supports by the dip coating technique using colloidal solutions consisting of 45 Angstrom particles as a precursor in order to probe the feasibility of exploiting solid state photocatalytic reactions for efficient metal deposition. Photoirradiation of nanocrystalline TiO2 films modified with the terdentate ligand (arginine) that covalently binds to the surface of TiO2 and at the same time chelate metal ions at the surface of TiO2 induced reduction of copper ions to metallic copper. Optical properties of the deposited metallic film as well as the possibility to apply this simple procedure in lithography are discussed.
Ključne reči:
nanocrystalline / photoinduced metal deposition / surface modification / TiO2 filmsIzvor:
Materials Science Forum, 2000, 352, 91-95Napomena:
- Trends in Advanced Materials and Processes, 3rd Yugoslov-Materials-Research-Society Conference, Sep 20-24, 1999, Herceg Novi, Yugoslavia
Kolekcije
Institucija/grupa
VinčaTY - JOUR AU - Šaponjić, Zoran AU - Rajh, T AU - Nedeljković, Jovan AU - Thurnauer, MC PY - 2000 UR - https://vinar.vin.bg.ac.rs/handle/123456789/6302 AB - Nanocrystalline TiO2 films were prepared on glass supports by the dip coating technique using colloidal solutions consisting of 45 Angstrom particles as a precursor in order to probe the feasibility of exploiting solid state photocatalytic reactions for efficient metal deposition. Photoirradiation of nanocrystalline TiO2 films modified with the terdentate ligand (arginine) that covalently binds to the surface of TiO2 and at the same time chelate metal ions at the surface of TiO2 induced reduction of copper ions to metallic copper. Optical properties of the deposited metallic film as well as the possibility to apply this simple procedure in lithography are discussed. T2 - Materials Science Forum T1 - Photoinduced deposition of copper on nanocrystalline TiO2 films VL - 352 SP - 91 EP - 95 DO - 10.4028/www.scientific.net/MSF.352.91 ER -
@article{ author = "Šaponjić, Zoran and Rajh, T and Nedeljković, Jovan and Thurnauer, MC", year = "2000", abstract = "Nanocrystalline TiO2 films were prepared on glass supports by the dip coating technique using colloidal solutions consisting of 45 Angstrom particles as a precursor in order to probe the feasibility of exploiting solid state photocatalytic reactions for efficient metal deposition. Photoirradiation of nanocrystalline TiO2 films modified with the terdentate ligand (arginine) that covalently binds to the surface of TiO2 and at the same time chelate metal ions at the surface of TiO2 induced reduction of copper ions to metallic copper. Optical properties of the deposited metallic film as well as the possibility to apply this simple procedure in lithography are discussed.", journal = "Materials Science Forum", title = "Photoinduced deposition of copper on nanocrystalline TiO2 films", volume = "352", pages = "91-95", doi = "10.4028/www.scientific.net/MSF.352.91" }
Šaponjić, Z., Rajh, T., Nedeljković, J.,& Thurnauer, M.. (2000). Photoinduced deposition of copper on nanocrystalline TiO2 films. in Materials Science Forum, 352, 91-95. https://doi.org/10.4028/www.scientific.net/MSF.352.91
Šaponjić Z, Rajh T, Nedeljković J, Thurnauer M. Photoinduced deposition of copper on nanocrystalline TiO2 films. in Materials Science Forum. 2000;352:91-95. doi:10.4028/www.scientific.net/MSF.352.91 .
Šaponjić, Zoran, Rajh, T, Nedeljković, Jovan, Thurnauer, MC, "Photoinduced deposition of copper on nanocrystalline TiO2 films" in Materials Science Forum, 352 (2000):91-95, https://doi.org/10.4028/www.scientific.net/MSF.352.91 . .