Приказ основних података о документу

dc.creatorShao, G.
dc.creatorGao, Y.
dc.creatorXia, X. H.
dc.creatorMilosavljević, Momir
dc.date.accessioned2018-03-01T22:15:30Z
dc.date.available2018-03-01T22:15:30Z
dc.date.issued2011
dc.identifier.issn0040-6090
dc.identifier.urihttps://vinar.vin.bg.ac.rs/handle/123456789/4680
dc.description.abstractSilicide-based photonic materials have attracted a great deal of research interest due to their compatibility with the well-developed silicon technology. Extensive efforts have been made for the synthesis and characterisation of these materials. This paper covers some aspects of the microstructural and crystallographic characteristics of ion beam synthesised silicides such as the semiconducting iron and ruthenium silicides, using transmission electron microscopy. A previously predicted new orientation relationship has been found to exist between the Si substrate and ion beam synthesised beta FeSi2 nanocrystals, which are free of 90 degrees rotational order domain boundaries. (C) 2011 Elsevier B. V. All rights reserved.en
dc.rightsrestrictedAccessen
dc.sourceThin Solid Filmsen
dc.subjectPhotonic silicidesen
dc.subjectTransmission electron microscopyen
dc.subjectCrystallographyen
dc.subjectFeSi2en
dc.subjectRu2Si3en
dc.titleCrystallographic characteristics and fine structures of semiconducting transition metal silicidesen
dc.typearticleen
dcterms.abstractМилосављевић Момир; Гао, Y.; Схао, Г.; Xиа, X. Х.;
dc.citation.volume519
dc.citation.issue24
dc.citation.spage8446
dc.citation.epage8450
dc.identifier.wos000300181200004
dc.identifier.doi10.1016/j.tsf.2011.05.036
dc.citation.rankM21
dc.identifier.scopus2-s2.0-80053574505


Документи

ДатотекеВеличинаФорматПреглед

Уз овај запис нема датотека.

Овај документ се појављује у следећим колекцијама

Приказ основних података о документу