Electrodeposited hydroxyapatite thin films modified by ion beam irradiation
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Djosic, M. S.Bibić, Nataša M.
Mitrić, Miodrag
Šiljegović, Milorad
Stojanovic, J. N.
Jokić, Bojan M.
Janaćković, Đorđe T.
Mišković-Stanković, Vesna B.
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Surface modification of hydroxyapatite (HA) thin films electrodeposited on titanium was conducted by ion implantation, using nitrogen and argon ions at different constant fluences of 1x10(15), 1x10(16) and 1x10(17) ions/cm(2). SEM and XRD analysis, as well as SRIM calculation, were used to monitor the changes induced by ion bombardment. In the case of HA film implanted with N(4+) ions, the unit cell parameters and unit cell volume increase with increasing nitrogen ion fluences. Similarly, the unit cell parameters and unit cell volume increase after Ar(6+) ions irradiation to a 1x10(15) ions/cm(2). At higher fluences, the unit cell parameters and unit cell volume decrease when argon ion fluences increase to 1x10(16) and 1x10(17) ions/cm(2). These structural changes are consequence of different mechanism of energy transfer of nitrogen and argon ions to HA film. For nitrogen ion irradiation electron energy loss is predominant, while for argon ion irradiation nuclear energy transfer to HA ...film prevails.
Keywords:
Films / Surfaces / Hydroxyapatite / Ion implantationSource:
Journal of Optoelectronics and Advanced Materials, 2009, 11, 11, 1848-1854Funding / projects:
- Ministry of Science and Technological Development, Republic of Serbia [142061, 142070]
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VinčaTY - JOUR AU - Djosic, M. S. AU - Bibić, Nataša M. AU - Mitrić, Miodrag AU - Šiljegović, Milorad AU - Stojanovic, J. N. AU - Jokić, Bojan M. AU - Janaćković, Đorđe T. AU - Mišković-Stanković, Vesna B. PY - 2009 UR - https://vinar.vin.bg.ac.rs/handle/123456789/3872 AB - Surface modification of hydroxyapatite (HA) thin films electrodeposited on titanium was conducted by ion implantation, using nitrogen and argon ions at different constant fluences of 1x10(15), 1x10(16) and 1x10(17) ions/cm(2). SEM and XRD analysis, as well as SRIM calculation, were used to monitor the changes induced by ion bombardment. In the case of HA film implanted with N(4+) ions, the unit cell parameters and unit cell volume increase with increasing nitrogen ion fluences. Similarly, the unit cell parameters and unit cell volume increase after Ar(6+) ions irradiation to a 1x10(15) ions/cm(2). At higher fluences, the unit cell parameters and unit cell volume decrease when argon ion fluences increase to 1x10(16) and 1x10(17) ions/cm(2). These structural changes are consequence of different mechanism of energy transfer of nitrogen and argon ions to HA film. For nitrogen ion irradiation electron energy loss is predominant, while for argon ion irradiation nuclear energy transfer to HA film prevails. T2 - Journal of Optoelectronics and Advanced Materials T1 - Electrodeposited hydroxyapatite thin films modified by ion beam irradiation VL - 11 IS - 11 SP - 1848 EP - 1854 UR - https://hdl.handle.net/21.15107/rcub_vinar_3872 ER -
@article{ author = "Djosic, M. S. and Bibić, Nataša M. and Mitrić, Miodrag and Šiljegović, Milorad and Stojanovic, J. N. and Jokić, Bojan M. and Janaćković, Đorđe T. and Mišković-Stanković, Vesna B.", year = "2009", abstract = "Surface modification of hydroxyapatite (HA) thin films electrodeposited on titanium was conducted by ion implantation, using nitrogen and argon ions at different constant fluences of 1x10(15), 1x10(16) and 1x10(17) ions/cm(2). SEM and XRD analysis, as well as SRIM calculation, were used to monitor the changes induced by ion bombardment. In the case of HA film implanted with N(4+) ions, the unit cell parameters and unit cell volume increase with increasing nitrogen ion fluences. Similarly, the unit cell parameters and unit cell volume increase after Ar(6+) ions irradiation to a 1x10(15) ions/cm(2). At higher fluences, the unit cell parameters and unit cell volume decrease when argon ion fluences increase to 1x10(16) and 1x10(17) ions/cm(2). These structural changes are consequence of different mechanism of energy transfer of nitrogen and argon ions to HA film. For nitrogen ion irradiation electron energy loss is predominant, while for argon ion irradiation nuclear energy transfer to HA film prevails.", journal = "Journal of Optoelectronics and Advanced Materials", title = "Electrodeposited hydroxyapatite thin films modified by ion beam irradiation", volume = "11", number = "11", pages = "1848-1854", url = "https://hdl.handle.net/21.15107/rcub_vinar_3872" }
Djosic, M. S., Bibić, N. M., Mitrić, M., Šiljegović, M., Stojanovic, J. N., Jokić, B. M., Janaćković, Đ. T.,& Mišković-Stanković, V. B.. (2009). Electrodeposited hydroxyapatite thin films modified by ion beam irradiation. in Journal of Optoelectronics and Advanced Materials, 11(11), 1848-1854. https://hdl.handle.net/21.15107/rcub_vinar_3872
Djosic MS, Bibić NM, Mitrić M, Šiljegović M, Stojanovic JN, Jokić BM, Janaćković ĐT, Mišković-Stanković VB. Electrodeposited hydroxyapatite thin films modified by ion beam irradiation. in Journal of Optoelectronics and Advanced Materials. 2009;11(11):1848-1854. https://hdl.handle.net/21.15107/rcub_vinar_3872 .
Djosic, M. S., Bibić, Nataša M., Mitrić, Miodrag, Šiljegović, Milorad, Stojanovic, J. N., Jokić, Bojan M., Janaćković, Đorđe T., Mišković-Stanković, Vesna B., "Electrodeposited hydroxyapatite thin films modified by ion beam irradiation" in Journal of Optoelectronics and Advanced Materials, 11, no. 11 (2009):1848-1854, https://hdl.handle.net/21.15107/rcub_vinar_3872 .