Surface resistivity estimation by scanning surface potential microscopy
Apstrakt
Nickel was sputter deposited on a glass with a thin film thickness of 600 nm under either in an argon atmosphere or under a partial pressure of nitrogen of either 1.3x10(-4) or 4x10(-4) mbar. Atomic force microscopy and scanning surface potential microscopy (SSPM) were used to study the morphology and to estimate the surface resistivity of the obtained Ni thin films taking into account surface-roughness effects. For the three samples investigated, the surface resistivity values as estimated using SSPM were in good agreement with the results obtained by standard four-point probe measurements. (c) 2008 American Institute of Physics.
Izvor:
Review of Scientific Instruments, 2008, 79, 6
DOI: 10.1063/1.2937647
ISSN: 0034-6748
PubMed: 18601437
WoS: 000257283700048
Scopus: 2-s2.0-46449112477
Kolekcije
Institucija/grupa
VinčaTY - JOUR AU - Rakočević, Zlatko Lj. AU - Popovic, N. AU - Bogdanov, Žarko AU - Goncić, Bratislav AU - Štrbac, Svetlana PY - 2008 UR - https://vinar.vin.bg.ac.rs/handle/123456789/3480 AB - Nickel was sputter deposited on a glass with a thin film thickness of 600 nm under either in an argon atmosphere or under a partial pressure of nitrogen of either 1.3x10(-4) or 4x10(-4) mbar. Atomic force microscopy and scanning surface potential microscopy (SSPM) were used to study the morphology and to estimate the surface resistivity of the obtained Ni thin films taking into account surface-roughness effects. For the three samples investigated, the surface resistivity values as estimated using SSPM were in good agreement with the results obtained by standard four-point probe measurements. (c) 2008 American Institute of Physics. T2 - Review of Scientific Instruments T1 - Surface resistivity estimation by scanning surface potential microscopy VL - 79 IS - 6 DO - 10.1063/1.2937647 ER -
@article{ author = "Rakočević, Zlatko Lj. and Popovic, N. and Bogdanov, Žarko and Goncić, Bratislav and Štrbac, Svetlana", year = "2008", abstract = "Nickel was sputter deposited on a glass with a thin film thickness of 600 nm under either in an argon atmosphere or under a partial pressure of nitrogen of either 1.3x10(-4) or 4x10(-4) mbar. Atomic force microscopy and scanning surface potential microscopy (SSPM) were used to study the morphology and to estimate the surface resistivity of the obtained Ni thin films taking into account surface-roughness effects. For the three samples investigated, the surface resistivity values as estimated using SSPM were in good agreement with the results obtained by standard four-point probe measurements. (c) 2008 American Institute of Physics.", journal = "Review of Scientific Instruments", title = "Surface resistivity estimation by scanning surface potential microscopy", volume = "79", number = "6", doi = "10.1063/1.2937647" }
Rakočević, Z. Lj., Popovic, N., Bogdanov, Ž., Goncić, B.,& Štrbac, S.. (2008). Surface resistivity estimation by scanning surface potential microscopy. in Review of Scientific Instruments, 79(6). https://doi.org/10.1063/1.2937647
Rakočević ZL, Popovic N, Bogdanov Ž, Goncić B, Štrbac S. Surface resistivity estimation by scanning surface potential microscopy. in Review of Scientific Instruments. 2008;79(6). doi:10.1063/1.2937647 .
Rakočević, Zlatko Lj., Popovic, N., Bogdanov, Žarko, Goncić, Bratislav, Štrbac, Svetlana, "Surface resistivity estimation by scanning surface potential microscopy" in Review of Scientific Instruments, 79, no. 6 (2008), https://doi.org/10.1063/1.2937647 . .