Structural and magnetic properites of Xe ion irradiated Co/Si bilayers
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Polycrystalline cobalt layers, deposited on Si(110) wafers via electron beam evaporation to a thickness of 55 nm, were irradiated at room temperature with 200 keV Xe ions to fluences of up to 15 x10^15 ions/cm^2.The atomic and magnetic force microscopy (AFM and MFM) were used to investigate the changes in the roughness and magnetic properties of the Co/Si bilayers. Ion beam induced structural changes were correlated with magnetic properties.
Извор:Publications of the Astronomical Observatory of Belgrade, 2008, 84, 193-196