Argon Irradiation Effects on the Structural and Optical Properties of Reactively Sputtered CrN Films
Апстракт
The present study deals with CrN films irradiated at room temperature (RT) with 200 keV Ar+ ions. The CrN layers were deposited by d.c. reactive sputtering on Si (100) wafers, at nitrogen partial pressure of 5x10(-4) mbar, to a total thickness of 280 nm. The substrates were held at 150 degrees C during deposition. After deposition the CrN layers were irradiated with 200 keV Ar+ ions to the fluences of 5x10(15) - 2x10(16) ions/cm(2). Structural characterization was performed with Rutherford backscattering spectroscopy (RBS), cross-sectional transmission electron microscopy (XTEM) and X-ray diffraction (XRD). Spectroscopic ellipsometry measurements were carried out in order to study optical properties of the samples. The irradiations caused the microstructrual changes in CrN layers, but no amorphization even at the highest argon fluence of 2x10(16) ions/cm(2). Observed changes in microstructure were correlated with the variation in optical parameters. It was found that both refractive in...dex and extinction coefficient are strongly dependent on the defect concentration in CrN layers.
Кључне речи:
CrN films / Ion Irradiation / TEM / RBS / XRD / EllipsometryИзвор:
Science of Sintering, 2015, 47, 2, 187-194Финансирање / пројекти:
- Функционални, функционализовани и усавршени нано материјали (RS-45005)
- Deutsche Forschungsgemeinschaft [436 SER 113/2]
DOI: 10.2298/SOS1502187N
ISSN: 0350-820X
WoS: 000361042100007
Scopus: 2-s2.0-84938390989
Колекције
Институција/група
VinčaTY - JOUR AU - Novaković, Mirjana M. AU - Popović, Maja AU - Bibić, Nataša M. PY - 2015 UR - https://vinar.vin.bg.ac.rs/handle/123456789/728 AB - The present study deals with CrN films irradiated at room temperature (RT) with 200 keV Ar+ ions. The CrN layers were deposited by d.c. reactive sputtering on Si (100) wafers, at nitrogen partial pressure of 5x10(-4) mbar, to a total thickness of 280 nm. The substrates were held at 150 degrees C during deposition. After deposition the CrN layers were irradiated with 200 keV Ar+ ions to the fluences of 5x10(15) - 2x10(16) ions/cm(2). Structural characterization was performed with Rutherford backscattering spectroscopy (RBS), cross-sectional transmission electron microscopy (XTEM) and X-ray diffraction (XRD). Spectroscopic ellipsometry measurements were carried out in order to study optical properties of the samples. The irradiations caused the microstructrual changes in CrN layers, but no amorphization even at the highest argon fluence of 2x10(16) ions/cm(2). Observed changes in microstructure were correlated with the variation in optical parameters. It was found that both refractive index and extinction coefficient are strongly dependent on the defect concentration in CrN layers. T2 - Science of Sintering T1 - Argon Irradiation Effects on the Structural and Optical Properties of Reactively Sputtered CrN Films VL - 47 IS - 2 SP - 187 EP - 194 DO - 10.2298/SOS1502187N ER -
@article{ author = "Novaković, Mirjana M. and Popović, Maja and Bibić, Nataša M.", year = "2015", abstract = "The present study deals with CrN films irradiated at room temperature (RT) with 200 keV Ar+ ions. The CrN layers were deposited by d.c. reactive sputtering on Si (100) wafers, at nitrogen partial pressure of 5x10(-4) mbar, to a total thickness of 280 nm. The substrates were held at 150 degrees C during deposition. After deposition the CrN layers were irradiated with 200 keV Ar+ ions to the fluences of 5x10(15) - 2x10(16) ions/cm(2). Structural characterization was performed with Rutherford backscattering spectroscopy (RBS), cross-sectional transmission electron microscopy (XTEM) and X-ray diffraction (XRD). Spectroscopic ellipsometry measurements were carried out in order to study optical properties of the samples. The irradiations caused the microstructrual changes in CrN layers, but no amorphization even at the highest argon fluence of 2x10(16) ions/cm(2). Observed changes in microstructure were correlated with the variation in optical parameters. It was found that both refractive index and extinction coefficient are strongly dependent on the defect concentration in CrN layers.", journal = "Science of Sintering", title = "Argon Irradiation Effects on the Structural and Optical Properties of Reactively Sputtered CrN Films", volume = "47", number = "2", pages = "187-194", doi = "10.2298/SOS1502187N" }
Novaković, M. M., Popović, M.,& Bibić, N. M.. (2015). Argon Irradiation Effects on the Structural and Optical Properties of Reactively Sputtered CrN Films. in Science of Sintering, 47(2), 187-194. https://doi.org/10.2298/SOS1502187N
Novaković MM, Popović M, Bibić NM. Argon Irradiation Effects on the Structural and Optical Properties of Reactively Sputtered CrN Films. in Science of Sintering. 2015;47(2):187-194. doi:10.2298/SOS1502187N .
Novaković, Mirjana M., Popović, Maja, Bibić, Nataša M., "Argon Irradiation Effects on the Structural and Optical Properties of Reactively Sputtered CrN Films" in Science of Sintering, 47, no. 2 (2015):187-194, https://doi.org/10.2298/SOS1502187N . .