Irradiation induced formation of VN in CrN thin films
Апстракт
Reactively sputtered CrN layer, deposited on Si(100) wafer, was implanted at room temperature with 80-keV V+. ions to the fluence of 2 x 10(17) ions/cm(2). After implantation the sample was annealed in a vacuum, for 2 h at 700 degrees C. The microstructure and chemical composition of CrN films was investigated using Rutherford backscattering spectroscopy, X-ray photoelectron spectroscopy, X-ray diffraction and cross-sectional transmission electron microscopy (conventional and high-resolution), together with fast Fourier transformation analyses. It was found that vanadium atoms are distributed in the sub-surface region of CrN layer, with the maximum concentration at similar to 20 nm. After annealing the formation of VN nanoparticles was observed. The nanoparticles are spherical shaped with a size of 8-20 nm in diameter. (C) 2015 Elsevier B.V. All rights reserved.
Кључне речи:
Chromium-nitride / Vanadium ion implantation / Nanoparticles / TEM / XPSИзвор:
Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms, 2015, 358, 206-209Финансирање / пројекти:
- Функционални, функционализовани и усавршени нано материјали (RS-MESTD-Integrated and Interdisciplinary Research (IIR or III)-45005)
- Deutsche Forschungsgemeinschaft [436 SER 113/2]
DOI: 10.1016/j.nimb.2015.06.036
ISSN: 0168-583X; 1872-9584
WoS: 000359170800033
Scopus: 2-s2.0-84936753616
Колекције
Институција/група
VinčaTY - JOUR AU - Novaković, Mirjana M. AU - Popović, Maja AU - Zhang, Kun AU - Mitrić, Miodrag AU - Bibić, Nataša M. PY - 2015 UR - https://vinar.vin.bg.ac.rs/handle/123456789/691 AB - Reactively sputtered CrN layer, deposited on Si(100) wafer, was implanted at room temperature with 80-keV V+. ions to the fluence of 2 x 10(17) ions/cm(2). After implantation the sample was annealed in a vacuum, for 2 h at 700 degrees C. The microstructure and chemical composition of CrN films was investigated using Rutherford backscattering spectroscopy, X-ray photoelectron spectroscopy, X-ray diffraction and cross-sectional transmission electron microscopy (conventional and high-resolution), together with fast Fourier transformation analyses. It was found that vanadium atoms are distributed in the sub-surface region of CrN layer, with the maximum concentration at similar to 20 nm. After annealing the formation of VN nanoparticles was observed. The nanoparticles are spherical shaped with a size of 8-20 nm in diameter. (C) 2015 Elsevier B.V. All rights reserved. T2 - Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms T1 - Irradiation induced formation of VN in CrN thin films VL - 358 SP - 206 EP - 209 DO - 10.1016/j.nimb.2015.06.036 ER -
@article{ author = "Novaković, Mirjana M. and Popović, Maja and Zhang, Kun and Mitrić, Miodrag and Bibić, Nataša M.", year = "2015", abstract = "Reactively sputtered CrN layer, deposited on Si(100) wafer, was implanted at room temperature with 80-keV V+. ions to the fluence of 2 x 10(17) ions/cm(2). After implantation the sample was annealed in a vacuum, for 2 h at 700 degrees C. The microstructure and chemical composition of CrN films was investigated using Rutherford backscattering spectroscopy, X-ray photoelectron spectroscopy, X-ray diffraction and cross-sectional transmission electron microscopy (conventional and high-resolution), together with fast Fourier transformation analyses. It was found that vanadium atoms are distributed in the sub-surface region of CrN layer, with the maximum concentration at similar to 20 nm. After annealing the formation of VN nanoparticles was observed. The nanoparticles are spherical shaped with a size of 8-20 nm in diameter. (C) 2015 Elsevier B.V. All rights reserved.", journal = "Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms", title = "Irradiation induced formation of VN in CrN thin films", volume = "358", pages = "206-209", doi = "10.1016/j.nimb.2015.06.036" }
Novaković, M. M., Popović, M., Zhang, K., Mitrić, M.,& Bibić, N. M.. (2015). Irradiation induced formation of VN in CrN thin films. in Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms, 358, 206-209. https://doi.org/10.1016/j.nimb.2015.06.036
Novaković MM, Popović M, Zhang K, Mitrić M, Bibić NM. Irradiation induced formation of VN in CrN thin films. in Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms. 2015;358:206-209. doi:10.1016/j.nimb.2015.06.036 .
Novaković, Mirjana M., Popović, Maja, Zhang, Kun, Mitrić, Miodrag, Bibić, Nataša M., "Irradiation induced formation of VN in CrN thin films" in Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms, 358 (2015):206-209, https://doi.org/10.1016/j.nimb.2015.06.036 . .