Particle-in-cell modelling of a neutral beam source for material processing in nanoscale structures fabrication
Petrovic, Z. Lj.
МетаподациПриказ свих података о документу
Neutral beam processing has evolved into one of the most promising methods for overcoming plasma process induced damage. Surface treatment by neutrals avoids problems with surface charging effects, frequently encountered when using common ion treatment, especially for low k-materials. In this paper, the influence of various parameters on the neutralization of ion beams in Ar-CF4 mixture based on a Particle in Cell with Monte Carlo collisions (PIC/MCC) simulation is studied. The efficiency of neutralization has been treated by considering both surface neutralization of ions and collisions of ions in the gas.
Кључне речи:charging damage / etching / material processing / nanoscale structures / neutralization efficiency
Извор:Materials Science Forum, 2007, 555, 47-+
- Ministry of Science and Environmental Protection of the Republic of Serbia [OI 141013], International Atomic Energy Agency, Vienna, MNZZS 
- Research Trends in Contemporary Materials Science, 8th Conference of the Yugoslav-Materials-Research-Society (Yu-MRS), Sep 04-08, 2006, Herceg Novi, Montenegro
ISSN: 0255-5476 (print)