Microstructural studies of TiN coatings prepared by PVD and MAD
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Titanium nitride (TiN) films have been deposited by physical vapour deposition (PVD), with BALZER equipment, and ion beam assisted deposition (IBAD) process, in DANFYSIK chamber. TiN thin films were grown, during IBAD process, by evaporation of Ti in presence of N-2 and simultaneous bombarded with Ar+ ions. The evolution of the microstructure from porous and columnar grains to densel packed grains is accompanied by changes in mechanical and physical properties. (C) 2004 Elsevier B.V. All rights reserved.
Кључне речи:coatings / ion bombardment / adhesion / X-ray scattering / diffraction and reflection / scanning electron microscopy (SEM)
Извор:Surface Science, 2004, 566, 40-44
- 22nd European Conference on Surface Science (ECOSS 22), Sep 07-12, 2003, Prague, Czech Republic
ISSN: 0039-6028 (print)