Interface mixing in Ta/Si bilayers with Ar ions
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We report on the room-temperature synthesis of the low-resistivity TaSi2 phase using ion-beam mixing of Ta/Si bilayers with Ar ions. The formation of the silicide phase is observed for different damage energies deposited at the Tal Si interface. The variance Delta sigma(2) of the reacted (TaSi2) layer thickness varies linearly with the ion fluence Phi and the reaction rate Delta sigma(2)/Phi, is proportional to the deposited damage energy density F-D. The measured mixing/reaction efficiency, Delta sigma(2)/Phi F-D = 10 +/- 1 nm(5)/keV, is in agreement with the value calculated by the model of compound formation under local thermal spikes. (C) 2000 Elsevier Science B.V. All rights reserved.
Кључне речи:ion-beam mixing / irradiation effects in solids / ion implantation in thin films / phase transition at interface
Извор:Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms, 2000, 161, 1011-1015
- 14th International Conference on Ion Beam Analysis/6th European Conference on Accelerators in Applied Research and Technology, Jul 26-30, 1999, Dresden, Germany
ISSN: 0168-583X (print)