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dc.creatorPjević, Dejan J.
dc.creatorObradović, Marko O.
dc.creatorMarinković, Tijana
dc.creatorGrce, Ana
dc.creatorMilosavljević, Momir
dc.creatorGrieseler, Rolf
dc.creatorKups, Thomas
dc.creatorWilke, Marcus
dc.creatorSchaaf, Peter
dc.date.accessioned2018-03-01T15:58:27Z
dc.date.available2018-03-01T15:58:27Z
dc.date.issued2015
dc.identifier.issn0921-4526
dc.identifier.issn1873-2135 (electronic)
dc.identifier.urihttp://vinar.vin.bg.ac.rs/handle/123456789/436
dc.description.abstractThe influence of sputtering parameters and annealing on the structure and optical properties of TiO2 thin films deposited by RF magnetron sputtering is reported. A pure TiO2 target was used to deposit the films on Si(100) and glass substrates, and Ar/O-2 gas mixture was used for sputtering. It was found that both the structure and the optical properties of the films depend on deposition parameters and annealing. In all cases the as deposited films were oxygen deficient, which could be compensated by post deposition annealing. Changes in the Ar/O-2 mass flow rate affected the films from an amorphous like structure for samples deposited without oxygen to a structure where nano crystalline Futile phase is detected in those deposited with O-2. Annealing of the samples yielded growth of both, ruffle and anatase phases, the ratio depending on the added oxygen content. Increasing mass flow rate of O-2 and annealing are responsible for lowering of the energy band gap values and the increase in refractive index of the films. The results can be interesting towards the development of TiO2 thin films with defined structure and properties. (C) 2015 Elsevier EN. All rights reserved.en
dc.relationinfo:eu-repo/grantAgreement/MESTD/Basic Research (BR or ON)/171023/RS//
dc.relationGerman-Serbian bilateral collaborative project [DAAD PPP 50752549]
dc.rightsrestrictedAccessen
dc.sourcePhysica B: Condensed Matteren
dc.subjectTiO2 thin filmen
dc.subjectRF magnetron sputteringen
dc.subjectAnnealingen
dc.subjectStructural and optical propertiesen
dc.titleProperties of sputtered TiO2 thin films as a function of deposition and annealing parametersen
dc.typearticleen
dcterms.abstractПјевић Дејан; Обрадовић Марко; Сцхааф, Петер; Милосављевић Момир; Грце Aна; Гриеселер, Ролф; Wилке, Марцус; Купс, Тхомас; Маринковиц, Тијана;
dc.citation.volume463
dc.citation.spage20
dc.citation.epage25
dc.identifier.wos000350813500004
dc.identifier.doi10.1016/j.physb.2015.01.037
dc.citation.rankM23
dc.identifier.scopus2-s2.0-84922240839


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