Properties of sputtered TiO2 thin films as a function of deposition and annealing parameters
Само за регистроване кориснике
2015
Аутори
Pjević, Dejan J.Obradović, Marko O.
Marinković, Tijana
Grce, Ana
Milosavljević, Momir
Grieseler, Rolf
Kups, Thomas
Wilke, Marcus
Schaaf, Peter
Чланак у часопису (Објављена верзија)
Метаподаци
Приказ свих података о документуАпстракт
The influence of sputtering parameters and annealing on the structure and optical properties of TiO2 thin films deposited by RF magnetron sputtering is reported. A pure TiO2 target was used to deposit the films on Si(100) and glass substrates, and Ar/O-2 gas mixture was used for sputtering. It was found that both the structure and the optical properties of the films depend on deposition parameters and annealing. In all cases the as deposited films were oxygen deficient, which could be compensated by post deposition annealing. Changes in the Ar/O-2 mass flow rate affected the films from an amorphous like structure for samples deposited without oxygen to a structure where nano crystalline Futile phase is detected in those deposited with O-2. Annealing of the samples yielded growth of both, ruffle and anatase phases, the ratio depending on the added oxygen content. Increasing mass flow rate of O-2 and annealing are responsible for lowering of the energy band gap values and the increase in... refractive index of the films. The results can be interesting towards the development of TiO2 thin films with defined structure and properties. (C) 2015 Elsevier EN. All rights reserved.
Кључне речи:
TiO2 thin film / RF magnetron sputtering / Annealing / Structural and optical propertiesИзвор:
Physica B: Condensed Matter, 2015, 463, 20-25Финансирање / пројекти:
- Физички процеси у синтези нових наноструктурних материјала (RS-MESTD-Basic Research (BR or ON)-171023)
- German-Serbian bilateral collaborative project [DAAD PPP 50752549]
DOI: 10.1016/j.physb.2015.01.037
ISSN: 0921-4526; 1873-2135
WoS: 000350813500004
Scopus: 2-s2.0-84922240839
Колекције
Институција/група
VinčaTY - JOUR AU - Pjević, Dejan J. AU - Obradović, Marko O. AU - Marinković, Tijana AU - Grce, Ana AU - Milosavljević, Momir AU - Grieseler, Rolf AU - Kups, Thomas AU - Wilke, Marcus AU - Schaaf, Peter PY - 2015 UR - https://vinar.vin.bg.ac.rs/handle/123456789/436 AB - The influence of sputtering parameters and annealing on the structure and optical properties of TiO2 thin films deposited by RF magnetron sputtering is reported. A pure TiO2 target was used to deposit the films on Si(100) and glass substrates, and Ar/O-2 gas mixture was used for sputtering. It was found that both the structure and the optical properties of the films depend on deposition parameters and annealing. In all cases the as deposited films were oxygen deficient, which could be compensated by post deposition annealing. Changes in the Ar/O-2 mass flow rate affected the films from an amorphous like structure for samples deposited without oxygen to a structure where nano crystalline Futile phase is detected in those deposited with O-2. Annealing of the samples yielded growth of both, ruffle and anatase phases, the ratio depending on the added oxygen content. Increasing mass flow rate of O-2 and annealing are responsible for lowering of the energy band gap values and the increase in refractive index of the films. The results can be interesting towards the development of TiO2 thin films with defined structure and properties. (C) 2015 Elsevier EN. All rights reserved. T2 - Physica B: Condensed Matter T1 - Properties of sputtered TiO2 thin films as a function of deposition and annealing parameters VL - 463 SP - 20 EP - 25 DO - 10.1016/j.physb.2015.01.037 ER -
@article{ author = "Pjević, Dejan J. and Obradović, Marko O. and Marinković, Tijana and Grce, Ana and Milosavljević, Momir and Grieseler, Rolf and Kups, Thomas and Wilke, Marcus and Schaaf, Peter", year = "2015", abstract = "The influence of sputtering parameters and annealing on the structure and optical properties of TiO2 thin films deposited by RF magnetron sputtering is reported. A pure TiO2 target was used to deposit the films on Si(100) and glass substrates, and Ar/O-2 gas mixture was used for sputtering. It was found that both the structure and the optical properties of the films depend on deposition parameters and annealing. In all cases the as deposited films were oxygen deficient, which could be compensated by post deposition annealing. Changes in the Ar/O-2 mass flow rate affected the films from an amorphous like structure for samples deposited without oxygen to a structure where nano crystalline Futile phase is detected in those deposited with O-2. Annealing of the samples yielded growth of both, ruffle and anatase phases, the ratio depending on the added oxygen content. Increasing mass flow rate of O-2 and annealing are responsible for lowering of the energy band gap values and the increase in refractive index of the films. The results can be interesting towards the development of TiO2 thin films with defined structure and properties. (C) 2015 Elsevier EN. All rights reserved.", journal = "Physica B: Condensed Matter", title = "Properties of sputtered TiO2 thin films as a function of deposition and annealing parameters", volume = "463", pages = "20-25", doi = "10.1016/j.physb.2015.01.037" }
Pjević, D. J., Obradović, M. O., Marinković, T., Grce, A., Milosavljević, M., Grieseler, R., Kups, T., Wilke, M.,& Schaaf, P.. (2015). Properties of sputtered TiO2 thin films as a function of deposition and annealing parameters. in Physica B: Condensed Matter, 463, 20-25. https://doi.org/10.1016/j.physb.2015.01.037
Pjević DJ, Obradović MO, Marinković T, Grce A, Milosavljević M, Grieseler R, Kups T, Wilke M, Schaaf P. Properties of sputtered TiO2 thin films as a function of deposition and annealing parameters. in Physica B: Condensed Matter. 2015;463:20-25. doi:10.1016/j.physb.2015.01.037 .
Pjević, Dejan J., Obradović, Marko O., Marinković, Tijana, Grce, Ana, Milosavljević, Momir, Grieseler, Rolf, Kups, Thomas, Wilke, Marcus, Schaaf, Peter, "Properties of sputtered TiO2 thin films as a function of deposition and annealing parameters" in Physica B: Condensed Matter, 463 (2015):20-25, https://doi.org/10.1016/j.physb.2015.01.037 . .