Application of the Laser Pulse Method of Measuring Thermal Diffusivity to Thin Alumina and Silicon Samples in a Wide Temperature Range

Abstract

Paper presents results of measuring thermal diffusivity of translucent or partially transparent thin discs of non-metals such as alumina and silicon using most widely spread experimental technique, the standard laser pulse method. Difficulties in its application to such materials are discussed. The thermal diffusivity has been measured from room temperature up to 900 degrees C for alumina, and to 1200 degrees C for silicon. Obtained results are analyzed and compared with available literature data and existing recommended functions.