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dc.creatorPopović, Maja
dc.creatorNovaković, Mirjana M.
dc.creatorMitrić, Miodrag
dc.creatorZhang, Kun
dc.creatorBibić, Nataša M.
dc.date.accessioned2018-03-01T15:48:36Z
dc.date.available2018-03-01T15:48:36Z
dc.date.issued2015
dc.identifier.issn0263-4368 (print)
dc.identifier.urihttp://vinar.vin.bg.ac.rs/handle/123456789/344
dc.description.abstractModification in structural, optical and electrical properties of titanium nitride (TiN) thin films induced by argon ion irradiation and thermal annealings was studied using various experimental techniques. TiN thin films deposited by dc reactive sputtering on Si substrate were implanted with argon ions at 200 key. As-implanted samples were annealed before or after ion irradiation at 600 degrees C and 700 degrees C, respectively. Rutherford bacicscattering spectrometry, X-ray diffraction, cross-sectional (high-resolution) transmission electron microscopy, spectroscopic ellipsometry and electrical measurements were carried out in order to study structural, optical and electrical properties of TiN/Si samples. After irradiation with 200 keV Ar ions the columnar microstructure of TiN was changed and the presence of smaller crystalline grains was observed. Partial Loss of columnar structure observed in implanted samples was completely recovered after annealing at 700 degrees C. Observed changes in microstructure induced by ion irradiation and annealings were correlated with the variation in optical parameters obtained by spectroscopic ellipsometry. It was found that both refractive index and extinction coefficient are strongly dependent on the defects concentration and size of the crystalline grains in TiN layers. (C) 2014 Elsevier Ltd. All rights reserved.en
dc.relationinfo:eu-repo/grantAgreement/MESTD/Integrated and Interdisciplinary Research (IIR or III)/45005/RS//
dc.relationDeutsche Forschungsgemeinschaft [436 SER 113/2]
dc.rightsrestrictedAccessen
dc.sourceInternational Journal of Refractory Metals and Hard Materialsen
dc.subjectTitanium nitrideen
dc.subjectAnnealingen
dc.subjectIon irradiationen
dc.subjectTEMen
dc.subjectEllipsometryen
dc.subjectXRDen
dc.titleStructural, optical and electrical properties of argon implanted TiN thin filmsen
dc.typearticleen
dcterms.abstractНоваковић Мирјана; Митрић Миодраг; Зханг, К.; Бибиц, Н.; Поповић Маја;
dc.citation.volume48
dc.citation.spage318
dc.citation.epage323
dc.identifier.wos000347586400045
dc.identifier.doi10.1016/j.ijrmhm.2014.09.026
dc.citation.rankM21a
dc.identifier.scopus2-s2.0-84907790130


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