Xenon implantation effects on the structural and optical properties of reactively sputtered titanium nitride thin films
Samo za registrovane korisnike
2017
Autori
Popović, MajaNovaković, Mirjana M.
Mitrić, Miodrag
Zhang, Kun
Rakočević, Zlatko Lj.
Bibić, Nataša M.
Članak u časopisu (Objavljena verzija)
Metapodaci
Prikaz svih podataka o dokumentuApstrakt
The present study deals with irradiation effects induced by xenon ions (Xe+ on titanium nitride (TiN) thin films. TiN films thickness of 260 urn obtained by using dc reactive sputtering were irradiated with 400 keV Xe ions. The irradiation doses were 5 x 10(15), 10 x 10(15), 15 x 10(15) and 20 x 10(15) ions/cm(2). The properties of irradiated films varying with ion fluence are investigated by means of Rutherford backscattering spectrometry, X-ray diffraction, transmission electron microscopy and spectroscopic ellipsometry. It was found that the Xe ions induce contraction and rhombohedral distortion of TiN lattice. The columnar structure was partially destroyed after irradiation, which introduce up to 1.5 at.% of Xe within the structure mostly concentrated around the projected ion range. The generation of defects due to the presence of heavy ions changes the optical constants of implanted films. It was found that the optical band gap of TiN films was reduced after xenon ion implantation.... (C) 2017 Elsevier Ltd. All rights reserved.
Ključne reči:
Nitrides / Thin films / Optical properties / X-ray diffraction / Transmission electron microscopy (TEM)Izvor:
Materials Research Bulletin, 2017, 91, 36-41Finansiranje / projekti:
- Funkcionalni, funkcionalizovani i usavršeni nano materijali (RS-MESTD-Integrated and Interdisciplinary Research (IIR or III)-45005)
DOI: 10.1016/j.materresbull.2017.03.031
ISSN: 0025-5408; 1873-4227
WoS: 000401388800006
Scopus: 2-s2.0-85016026232
Kolekcije
Institucija/grupa
VinčaTY - JOUR AU - Popović, Maja AU - Novaković, Mirjana M. AU - Mitrić, Miodrag AU - Zhang, Kun AU - Rakočević, Zlatko Lj. AU - Bibić, Nataša M. PY - 2017 UR - https://vinar.vin.bg.ac.rs/handle/123456789/1577 AB - The present study deals with irradiation effects induced by xenon ions (Xe+ on titanium nitride (TiN) thin films. TiN films thickness of 260 urn obtained by using dc reactive sputtering were irradiated with 400 keV Xe ions. The irradiation doses were 5 x 10(15), 10 x 10(15), 15 x 10(15) and 20 x 10(15) ions/cm(2). The properties of irradiated films varying with ion fluence are investigated by means of Rutherford backscattering spectrometry, X-ray diffraction, transmission electron microscopy and spectroscopic ellipsometry. It was found that the Xe ions induce contraction and rhombohedral distortion of TiN lattice. The columnar structure was partially destroyed after irradiation, which introduce up to 1.5 at.% of Xe within the structure mostly concentrated around the projected ion range. The generation of defects due to the presence of heavy ions changes the optical constants of implanted films. It was found that the optical band gap of TiN films was reduced after xenon ion implantation. (C) 2017 Elsevier Ltd. All rights reserved. T2 - Materials Research Bulletin T1 - Xenon implantation effects on the structural and optical properties of reactively sputtered titanium nitride thin films VL - 91 SP - 36 EP - 41 DO - 10.1016/j.materresbull.2017.03.031 ER -
@article{ author = "Popović, Maja and Novaković, Mirjana M. and Mitrić, Miodrag and Zhang, Kun and Rakočević, Zlatko Lj. and Bibić, Nataša M.", year = "2017", abstract = "The present study deals with irradiation effects induced by xenon ions (Xe+ on titanium nitride (TiN) thin films. TiN films thickness of 260 urn obtained by using dc reactive sputtering were irradiated with 400 keV Xe ions. The irradiation doses were 5 x 10(15), 10 x 10(15), 15 x 10(15) and 20 x 10(15) ions/cm(2). The properties of irradiated films varying with ion fluence are investigated by means of Rutherford backscattering spectrometry, X-ray diffraction, transmission electron microscopy and spectroscopic ellipsometry. It was found that the Xe ions induce contraction and rhombohedral distortion of TiN lattice. The columnar structure was partially destroyed after irradiation, which introduce up to 1.5 at.% of Xe within the structure mostly concentrated around the projected ion range. The generation of defects due to the presence of heavy ions changes the optical constants of implanted films. It was found that the optical band gap of TiN films was reduced after xenon ion implantation. (C) 2017 Elsevier Ltd. All rights reserved.", journal = "Materials Research Bulletin", title = "Xenon implantation effects on the structural and optical properties of reactively sputtered titanium nitride thin films", volume = "91", pages = "36-41", doi = "10.1016/j.materresbull.2017.03.031" }
Popović, M., Novaković, M. M., Mitrić, M., Zhang, K., Rakočević, Z. Lj.,& Bibić, N. M.. (2017). Xenon implantation effects on the structural and optical properties of reactively sputtered titanium nitride thin films. in Materials Research Bulletin, 91, 36-41. https://doi.org/10.1016/j.materresbull.2017.03.031
Popović M, Novaković MM, Mitrić M, Zhang K, Rakočević ZL, Bibić NM. Xenon implantation effects on the structural and optical properties of reactively sputtered titanium nitride thin films. in Materials Research Bulletin. 2017;91:36-41. doi:10.1016/j.materresbull.2017.03.031 .
Popović, Maja, Novaković, Mirjana M., Mitrić, Miodrag, Zhang, Kun, Rakočević, Zlatko Lj., Bibić, Nataša M., "Xenon implantation effects on the structural and optical properties of reactively sputtered titanium nitride thin films" in Materials Research Bulletin, 91 (2017):36-41, https://doi.org/10.1016/j.materresbull.2017.03.031 . .