Effect of thickness on optical properties of nickel vertical posts deposited by GLAD technique
Samo za registrovane korisnike
2016
Članak u časopisu (Objavljena verzija)
,
© 2016 Elsevier B.V.
Metapodaci
Prikaz svih podataka o dokumentuApstrakt
Nickel (Ni) thin films of different thicknesses (25 nm to 150 nm) were deposited on glass substrates using Glancing Angle Deposition technique. Characterization of obtained Ni films was performed by scanning electron microscopy, atomic force microscopy, X-ray photoelectron spectroscopy, spectroscopic ellipsometry and by four-point probe method. Variations in optical parameters with thickness correlated with structural, chemical and electrical properties of nanostructured nickel thin films were studied. The results showed that deposit is porous and consists of nano-scaled columns, which grow perpendicular to the substrate. It was found that the size of the columns and the surface roughness change with film thickness. Spectroscopic ellipsometry revealed that the refractive index and extinction coefficient varied with thickness, which can be correlated with changes in microstructure of Ni films. Additionally, the relationship between the film microstructure and its resistivity was also an...alyzed. It was found that the variations in Ni films resistivity could be attributed to the changes in the width of the columns. The increasing of layer thickness leads to overall decrease of optical resistivity of nickel thin films. (C) 2016 Elsevier B.V. All rights reserved.
Ključne reči:
Nickel thin films / Nanostructures / Optical properties / Spectroscopic ellipsometry / ResistivityIzvor:
Optical Materials, 2016, 62, 146-151Finansiranje / projekti:
- Funkcionalni, funkcionalizovani i usavršeni nano materijali (RS-MESTD-Integrated and Interdisciplinary Research (IIR or III)-45005)
DOI: 10.1016/j.optmat.2016.09.064
ISSN: 0925-3467; 1873-1252
WoS: 000390735400021
Scopus: 2-s2.0-84989181017
Kolekcije
Institucija/grupa
VinčaTY - JOUR AU - Potočnik, Jelena AU - Nenadović, Miloš AU - Bundaleski, Nenad AU - Popović, Maja AU - Rakočević, Zlatko Lj. PY - 2016 UR - https://vinar.vin.bg.ac.rs/handle/123456789/1351 AB - Nickel (Ni) thin films of different thicknesses (25 nm to 150 nm) were deposited on glass substrates using Glancing Angle Deposition technique. Characterization of obtained Ni films was performed by scanning electron microscopy, atomic force microscopy, X-ray photoelectron spectroscopy, spectroscopic ellipsometry and by four-point probe method. Variations in optical parameters with thickness correlated with structural, chemical and electrical properties of nanostructured nickel thin films were studied. The results showed that deposit is porous and consists of nano-scaled columns, which grow perpendicular to the substrate. It was found that the size of the columns and the surface roughness change with film thickness. Spectroscopic ellipsometry revealed that the refractive index and extinction coefficient varied with thickness, which can be correlated with changes in microstructure of Ni films. Additionally, the relationship between the film microstructure and its resistivity was also analyzed. It was found that the variations in Ni films resistivity could be attributed to the changes in the width of the columns. The increasing of layer thickness leads to overall decrease of optical resistivity of nickel thin films. (C) 2016 Elsevier B.V. All rights reserved. T2 - Optical Materials T1 - Effect of thickness on optical properties of nickel vertical posts deposited by GLAD technique VL - 62 SP - 146 EP - 151 DO - 10.1016/j.optmat.2016.09.064 ER -
@article{ author = "Potočnik, Jelena and Nenadović, Miloš and Bundaleski, Nenad and Popović, Maja and Rakočević, Zlatko Lj.", year = "2016", abstract = "Nickel (Ni) thin films of different thicknesses (25 nm to 150 nm) were deposited on glass substrates using Glancing Angle Deposition technique. Characterization of obtained Ni films was performed by scanning electron microscopy, atomic force microscopy, X-ray photoelectron spectroscopy, spectroscopic ellipsometry and by four-point probe method. Variations in optical parameters with thickness correlated with structural, chemical and electrical properties of nanostructured nickel thin films were studied. The results showed that deposit is porous and consists of nano-scaled columns, which grow perpendicular to the substrate. It was found that the size of the columns and the surface roughness change with film thickness. Spectroscopic ellipsometry revealed that the refractive index and extinction coefficient varied with thickness, which can be correlated with changes in microstructure of Ni films. Additionally, the relationship between the film microstructure and its resistivity was also analyzed. It was found that the variations in Ni films resistivity could be attributed to the changes in the width of the columns. The increasing of layer thickness leads to overall decrease of optical resistivity of nickel thin films. (C) 2016 Elsevier B.V. All rights reserved.", journal = "Optical Materials", title = "Effect of thickness on optical properties of nickel vertical posts deposited by GLAD technique", volume = "62", pages = "146-151", doi = "10.1016/j.optmat.2016.09.064" }
Potočnik, J., Nenadović, M., Bundaleski, N., Popović, M.,& Rakočević, Z. Lj.. (2016). Effect of thickness on optical properties of nickel vertical posts deposited by GLAD technique. in Optical Materials, 62, 146-151. https://doi.org/10.1016/j.optmat.2016.09.064
Potočnik J, Nenadović M, Bundaleski N, Popović M, Rakočević ZL. Effect of thickness on optical properties of nickel vertical posts deposited by GLAD technique. in Optical Materials. 2016;62:146-151. doi:10.1016/j.optmat.2016.09.064 .
Potočnik, Jelena, Nenadović, Miloš, Bundaleski, Nenad, Popović, Maja, Rakočević, Zlatko Lj., "Effect of thickness on optical properties of nickel vertical posts deposited by GLAD technique" in Optical Materials, 62 (2016):146-151, https://doi.org/10.1016/j.optmat.2016.09.064 . .