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dc.creatorNovaković, Mirjana M.
dc.creatorPopović, Maja
dc.creatorZhang, Kun
dc.creatorRakočević, Zlatko Lj.
dc.creatorBibić, Nataša M.
dc.date.accessioned2018-03-01T17:17:57Z
dc.date.available2018-03-01T17:17:57Z
dc.date.issued2016
dc.identifier.issn0925-3467 (print)
dc.identifier.issn1873-1252 (electronic)
dc.identifier.urihttp://vinar.vin.bg.ac.rs/handle/123456789/1350
dc.description.abstractModification in structural and optical properties of chromium-nitride (CrN) films induced by argon ion irradiation and thermal annealings were investigated using various experimental techniques. CrN films deposited by d.c. reactive sputtering on Si substrate were implanted with 200 keV argon ions, at fluences of 5-20 x 10(15) ions/cm(2). As-implanted samples were then annealed in vacuum, for 2 h at 700 degrees C. Rutherford backscattering spectrometry, X-ray diffraction, cross-sectional (high-resolution) transmission electron microscopy and spectroscopic ellipsometry (SE) measurements were carried out in order to study structural and optical properties of the layers. After irradiation with 200 keV Ar ions a damaged surface layer of nanocrystalline structure was generated, which extended beyond the implantation profile, but left an undamaged bottom zone. Partial loss of columnar structure observed in implanted samples was recovered after annealing at 700 degrees C and CrN started to decompose to Cr2N. This layer geometry determined from transmission electron microscopy was inferred in the analysis of SE data using the combined Drude and Tauc-Lorentz model, and the variation of the optical bandgap was deduced. The results are discussed on the basis of the changes induced in the microstructure. It was found that the optical properties of the layers are strongly dependent on the defects concentration of CrN. (C) 2016 Elsevier B.V. All rights reserved.en
dc.relationinfo:eu-repo/grantAgreement/MESTD/Integrated and Interdisciplinary Research (IIR or III)/45005/RS//
dc.relationDeutsche Forschungsgemeinschaft [436 SER 113/2]
dc.rightsrestrictedAccessen
dc.sourceOptical Materialsen
dc.subjectIon implantationen
dc.subjectChromium nitridesen
dc.subjectSpectroscopic ellipsometryen
dc.subjectThermal annealingen
dc.subjectOptical propertiesen
dc.titleEffects of 200 keV Ar-ions irradiation on the structural and optical properties of reactively sputtered CrN filmsen
dc.typearticleen
dcterms.abstractЗханг, К.; Новаковић Мирјана; Бибиц, Н.; Поповић Маја; Ракочевић Златко Љ.;
dc.citation.volume62
dc.citation.spage57
dc.citation.epage63
dc.identifier.wos000390735400010
dc.identifier.doi10.1016/j.optmat.2016.09.047
dc.citation.rankM22
dc.identifier.scopus2-s2.0-84988584753


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