Mechanical and microstructural changes of magnetron sputtered TiN films with various magnetic field configurations
Апстракт
TiN coatings were deposited in a single magnetron sputter ion plating system in balanced and unbalanced mode with a closed magnetic field configuration. The film microhardness, thickness, adhesion, microstructure, preferred orientation and topography were analyzed as a function of the substrate position inside the deposition volume. In the static deposition mode and under the limitations of the experimental set-up used, no real homogeneous deposition conditions were achieved, but a significant possibility of controlling the spatial distribution of deposition conditions was demonstrated. The variation of the coating microhardness over the target-to-substrate distance, d(S-T), ranging from about 80 to 210 mm was acceptable for practical applications, while the critical load for adhesive failure was found to decrease significantly with increasing d(S-T) in a balanced magnetron configuration. The variation of magnetic field configuration provided a relatively homogeneous distribution of th...e bias current density over the deposition volume, but the preferred orientation of the coating was changed from (200) to (111) with increasing d(S-T). The energy delivered per unit volume of growing film, S-E, and bombarding ion to deposited metal atom flux ratio j(i)/j(m) were considered. It was found that j(i)/j(m) can be used to describe qualitatively the change of preferred crystalline orientation of coatings. (C) 1998 Elsevier Science S.A.
Кључне речи:
magnetron sputtering / uniformity of deposition conditions / TiN coating / microstructural and mechanical propertiesИзвор:
Surface and Coatings Technology, 1998, 106, 2-3, 150-155
DOI: 10.1016/S0257-8972(98)00509-X
ISSN: 0257-8972
WoS: 000076027600011
Scopus: 2-s2.0-0032482828
Колекције
Институција/група
VinčaTY - JOUR AU - Zlatanovic, M AU - Belosevac, R AU - Popovic, N AU - Kunosic, A PY - 1998 UR - https://vinar.vin.bg.ac.rs/handle/123456789/2193 AB - TiN coatings were deposited in a single magnetron sputter ion plating system in balanced and unbalanced mode with a closed magnetic field configuration. The film microhardness, thickness, adhesion, microstructure, preferred orientation and topography were analyzed as a function of the substrate position inside the deposition volume. In the static deposition mode and under the limitations of the experimental set-up used, no real homogeneous deposition conditions were achieved, but a significant possibility of controlling the spatial distribution of deposition conditions was demonstrated. The variation of the coating microhardness over the target-to-substrate distance, d(S-T), ranging from about 80 to 210 mm was acceptable for practical applications, while the critical load for adhesive failure was found to decrease significantly with increasing d(S-T) in a balanced magnetron configuration. The variation of magnetic field configuration provided a relatively homogeneous distribution of the bias current density over the deposition volume, but the preferred orientation of the coating was changed from (200) to (111) with increasing d(S-T). The energy delivered per unit volume of growing film, S-E, and bombarding ion to deposited metal atom flux ratio j(i)/j(m) were considered. It was found that j(i)/j(m) can be used to describe qualitatively the change of preferred crystalline orientation of coatings. (C) 1998 Elsevier Science S.A. T2 - Surface and Coatings Technology T1 - Mechanical and microstructural changes of magnetron sputtered TiN films with various magnetic field configurations VL - 106 IS - 2-3 SP - 150 EP - 155 DO - 10.1016/S0257-8972(98)00509-X ER -
@article{ author = "Zlatanovic, M and Belosevac, R and Popovic, N and Kunosic, A", year = "1998", abstract = "TiN coatings were deposited in a single magnetron sputter ion plating system in balanced and unbalanced mode with a closed magnetic field configuration. The film microhardness, thickness, adhesion, microstructure, preferred orientation and topography were analyzed as a function of the substrate position inside the deposition volume. In the static deposition mode and under the limitations of the experimental set-up used, no real homogeneous deposition conditions were achieved, but a significant possibility of controlling the spatial distribution of deposition conditions was demonstrated. The variation of the coating microhardness over the target-to-substrate distance, d(S-T), ranging from about 80 to 210 mm was acceptable for practical applications, while the critical load for adhesive failure was found to decrease significantly with increasing d(S-T) in a balanced magnetron configuration. The variation of magnetic field configuration provided a relatively homogeneous distribution of the bias current density over the deposition volume, but the preferred orientation of the coating was changed from (200) to (111) with increasing d(S-T). The energy delivered per unit volume of growing film, S-E, and bombarding ion to deposited metal atom flux ratio j(i)/j(m) were considered. It was found that j(i)/j(m) can be used to describe qualitatively the change of preferred crystalline orientation of coatings. (C) 1998 Elsevier Science S.A.", journal = "Surface and Coatings Technology", title = "Mechanical and microstructural changes of magnetron sputtered TiN films with various magnetic field configurations", volume = "106", number = "2-3", pages = "150-155", doi = "10.1016/S0257-8972(98)00509-X" }
Zlatanovic, M., Belosevac, R., Popovic, N.,& Kunosic, A.. (1998). Mechanical and microstructural changes of magnetron sputtered TiN films with various magnetic field configurations. in Surface and Coatings Technology, 106(2-3), 150-155. https://doi.org/10.1016/S0257-8972(98)00509-X
Zlatanovic M, Belosevac R, Popovic N, Kunosic A. Mechanical and microstructural changes of magnetron sputtered TiN films with various magnetic field configurations. in Surface and Coatings Technology. 1998;106(2-3):150-155. doi:10.1016/S0257-8972(98)00509-X .
Zlatanovic, M, Belosevac, R, Popovic, N, Kunosic, A, "Mechanical and microstructural changes of magnetron sputtered TiN films with various magnetic field configurations" in Surface and Coatings Technology, 106, no. 2-3 (1998):150-155, https://doi.org/10.1016/S0257-8972(98)00509-X . .